JPS5618420A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5618420A JPS5618420A JP9341779A JP9341779A JPS5618420A JP S5618420 A JPS5618420 A JP S5618420A JP 9341779 A JP9341779 A JP 9341779A JP 9341779 A JP9341779 A JP 9341779A JP S5618420 A JPS5618420 A JP S5618420A
- Authority
- JP
- Japan
- Prior art keywords
- type photoresist
- pattern
- photoresist film
- film
- positive type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9341779A JPS5618420A (en) | 1979-07-23 | 1979-07-23 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9341779A JPS5618420A (en) | 1979-07-23 | 1979-07-23 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5618420A true JPS5618420A (en) | 1981-02-21 |
Family
ID=14081715
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9341779A Pending JPS5618420A (en) | 1979-07-23 | 1979-07-23 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5618420A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57172735A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
JPS60116132A (ja) * | 1983-11-29 | 1985-06-22 | Fujitsu Ltd | ネガ型レジストパタ−ンの形成方法 |
JPS6366939A (ja) * | 1986-03-11 | 1988-03-25 | テキサス インスツルメンツ インコ−ポレイテツド | 集積回路の製法 |
US10542337B2 (en) | 2017-07-18 | 2020-01-21 | Shure Acquisition Holdings, Inc. | Moving coil microphone transducer with secondary port |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50120826A (ja) * | 1974-03-05 | 1975-09-22 | ||
JPS5255869A (en) * | 1975-11-01 | 1977-05-07 | Fujitsu Ltd | Production of semiconductor device |
JPS5269270A (en) * | 1975-12-05 | 1977-06-08 | Matsushita Electronics Corp | Coating method of photoresist |
-
1979
- 1979-07-23 JP JP9341779A patent/JPS5618420A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50120826A (ja) * | 1974-03-05 | 1975-09-22 | ||
JPS5255869A (en) * | 1975-11-01 | 1977-05-07 | Fujitsu Ltd | Production of semiconductor device |
JPS5269270A (en) * | 1975-12-05 | 1977-06-08 | Matsushita Electronics Corp | Coating method of photoresist |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57172735A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
JPS6358367B2 (ja) * | 1981-03-30 | 1988-11-15 | Yokogawa Hyuuretsuto Patsukaado Kk | |
JPS60116132A (ja) * | 1983-11-29 | 1985-06-22 | Fujitsu Ltd | ネガ型レジストパタ−ンの形成方法 |
JPH0318179B2 (ja) * | 1983-11-29 | 1991-03-11 | Fujitsu Ltd | |
JPS6366939A (ja) * | 1986-03-11 | 1988-03-25 | テキサス インスツルメンツ インコ−ポレイテツド | 集積回路の製法 |
US10542337B2 (en) | 2017-07-18 | 2020-01-21 | Shure Acquisition Holdings, Inc. | Moving coil microphone transducer with secondary port |
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