JPS56165317A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56165317A
JPS56165317A JP6981780A JP6981780A JPS56165317A JP S56165317 A JPS56165317 A JP S56165317A JP 6981780 A JP6981780 A JP 6981780A JP 6981780 A JP6981780 A JP 6981780A JP S56165317 A JPS56165317 A JP S56165317A
Authority
JP
Japan
Prior art keywords
core tube
tube
substrates
processed
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6981780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6227725B2 (enrdf_load_stackoverflow
Inventor
Kiyomi Izumida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6981780A priority Critical patent/JPS56165317A/ja
Publication of JPS56165317A publication Critical patent/JPS56165317A/ja
Publication of JPS6227725B2 publication Critical patent/JPS6227725B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP6981780A 1980-05-26 1980-05-26 Manufacture of semiconductor device Granted JPS56165317A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6981780A JPS56165317A (en) 1980-05-26 1980-05-26 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6981780A JPS56165317A (en) 1980-05-26 1980-05-26 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS56165317A true JPS56165317A (en) 1981-12-18
JPS6227725B2 JPS6227725B2 (enrdf_load_stackoverflow) 1987-06-16

Family

ID=13413684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6981780A Granted JPS56165317A (en) 1980-05-26 1980-05-26 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56165317A (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58110034A (ja) * 1981-12-24 1983-06-30 Fujitsu Ltd 縦型気相エピタキシヤル装置
JPS5939341A (ja) * 1982-08-27 1984-03-03 Tokyo Denshi Kagaku Kabushiki 薄板状被処理物の加熱処理装置
JPS60140817A (ja) * 1983-12-28 1985-07-25 Fujitsu Ltd 半導体装置の製造方法
JPS60182728A (ja) * 1984-02-29 1985-09-18 Fujitsu Ltd 縦型炉
JPS60213022A (ja) * 1984-04-09 1985-10-25 Tekunisuko:Kk 縦型支持具
JPS6112024A (ja) * 1984-06-27 1986-01-20 Fujitsu Ltd 縦型加熱炉
JPS61111524A (ja) * 1984-11-06 1986-05-29 Denkoo:Kk 縦形半導体熱処理炉
JPS6278753U (enrdf_load_stackoverflow) * 1985-11-05 1987-05-20
JPS62122123A (ja) * 1985-11-21 1987-06-03 Toshiba Corp 縦型熱処理装置
JPS62130534A (ja) * 1985-12-02 1987-06-12 Deisuko Saiyaa Japan:Kk 縦型ウエ−ハ処理装置のためのウエ−ハ搬送装置
JPH0273732U (enrdf_load_stackoverflow) * 1988-11-28 1990-06-05

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58110034A (ja) * 1981-12-24 1983-06-30 Fujitsu Ltd 縦型気相エピタキシヤル装置
JPS5939341A (ja) * 1982-08-27 1984-03-03 Tokyo Denshi Kagaku Kabushiki 薄板状被処理物の加熱処理装置
JPS60140817A (ja) * 1983-12-28 1985-07-25 Fujitsu Ltd 半導体装置の製造方法
JPS60182728A (ja) * 1984-02-29 1985-09-18 Fujitsu Ltd 縦型炉
JPS60213022A (ja) * 1984-04-09 1985-10-25 Tekunisuko:Kk 縦型支持具
JPS6112024A (ja) * 1984-06-27 1986-01-20 Fujitsu Ltd 縦型加熱炉
JPS61111524A (ja) * 1984-11-06 1986-05-29 Denkoo:Kk 縦形半導体熱処理炉
JPS6278753U (enrdf_load_stackoverflow) * 1985-11-05 1987-05-20
JPS62122123A (ja) * 1985-11-21 1987-06-03 Toshiba Corp 縦型熱処理装置
JPS62130534A (ja) * 1985-12-02 1987-06-12 Deisuko Saiyaa Japan:Kk 縦型ウエ−ハ処理装置のためのウエ−ハ搬送装置
JPH0273732U (enrdf_load_stackoverflow) * 1988-11-28 1990-06-05

Also Published As

Publication number Publication date
JPS6227725B2 (enrdf_load_stackoverflow) 1987-06-16

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