JPS56165317A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56165317A
JPS56165317A JP6981780A JP6981780A JPS56165317A JP S56165317 A JPS56165317 A JP S56165317A JP 6981780 A JP6981780 A JP 6981780A JP 6981780 A JP6981780 A JP 6981780A JP S56165317 A JPS56165317 A JP S56165317A
Authority
JP
Japan
Prior art keywords
core tube
tube
substrates
processed
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6981780A
Other languages
Japanese (ja)
Other versions
JPS6227725B2 (en
Inventor
Kiyomi Izumida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6981780A priority Critical patent/JPS56165317A/en
Publication of JPS56165317A publication Critical patent/JPS56165317A/en
Publication of JPS6227725B2 publication Critical patent/JPS6227725B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

PURPOSE:To elongate the life of a core tube for manufacture of the semiconductor device by a method wherein a substrate holding jig having a semiconductor substrate to be processed mounted thereon facing to the axial direction of the tube is hanged down vertically in the furnace core tube of a vertical type heating device and heated. CONSTITUTION:A substrate holder being fitted with the semiconductor substrates 3 to be processed is put on a support 7 of the substrate holding jig consisting of the support 7, a ring shaped frame 8, a centering tube 9, a substrates pressing bar 14, an exhaust tube 5, a substrates pressing bar inserting hole 12 and a cover 6 for the core tube, and the jig is hanged vertically in the core tube, and heat-treatment is performed. Accordingly, because friction between the both to be generated when the jig is taken in and out from the core tube is almost eliminated, the life of the core tube is elongated, and the generation of qeuartz powder can be eliminated to prevent contamination of the substrates to be processed.
JP6981780A 1980-05-26 1980-05-26 Manufacture of semiconductor device Granted JPS56165317A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6981780A JPS56165317A (en) 1980-05-26 1980-05-26 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6981780A JPS56165317A (en) 1980-05-26 1980-05-26 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS56165317A true JPS56165317A (en) 1981-12-18
JPS6227725B2 JPS6227725B2 (en) 1987-06-16

Family

ID=13413684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6981780A Granted JPS56165317A (en) 1980-05-26 1980-05-26 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56165317A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58110034A (en) * 1981-12-24 1983-06-30 Fujitsu Ltd Vertical vapor phase epitaxial device
JPS5939341A (en) * 1982-08-27 1984-03-03 Tokyo Denshi Kagaku Kabushiki Apparatus for heat treatment of thin plate shaped object to be treated
JPS60140817A (en) * 1983-12-28 1985-07-25 Fujitsu Ltd Manufacture of semiconductor device
JPS60182728A (en) * 1984-02-29 1985-09-18 Fujitsu Ltd Vertical type furnace
JPS60213022A (en) * 1984-04-09 1985-10-25 Tekunisuko:Kk Vertical supporting tool
JPS6112024A (en) * 1984-06-27 1986-01-20 Fujitsu Ltd Vertical type heating furnace
JPS61111524A (en) * 1984-11-06 1986-05-29 Denkoo:Kk Vertical heat-treatment furnace for semiconductor
JPS6278753U (en) * 1985-11-05 1987-05-20
JPS62122123A (en) * 1985-11-21 1987-06-03 Toshiba Corp Vertical type thermal treatment equipment
JPS62130534A (en) * 1985-12-02 1987-06-12 Deisuko Saiyaa Japan:Kk Wafer conveyor for vertical wafer processor
JPH0273732U (en) * 1988-11-28 1990-06-05

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58110034A (en) * 1981-12-24 1983-06-30 Fujitsu Ltd Vertical vapor phase epitaxial device
JPS5939341A (en) * 1982-08-27 1984-03-03 Tokyo Denshi Kagaku Kabushiki Apparatus for heat treatment of thin plate shaped object to be treated
JPS60140817A (en) * 1983-12-28 1985-07-25 Fujitsu Ltd Manufacture of semiconductor device
JPS60182728A (en) * 1984-02-29 1985-09-18 Fujitsu Ltd Vertical type furnace
JPS60213022A (en) * 1984-04-09 1985-10-25 Tekunisuko:Kk Vertical supporting tool
JPH0222535B2 (en) * 1984-06-27 1990-05-18 Fujitsu Ltd
JPS6112024A (en) * 1984-06-27 1986-01-20 Fujitsu Ltd Vertical type heating furnace
JPS61111524A (en) * 1984-11-06 1986-05-29 Denkoo:Kk Vertical heat-treatment furnace for semiconductor
JPS6278753U (en) * 1985-11-05 1987-05-20
JPH0220830Y2 (en) * 1985-11-05 1990-06-06
JPS62122123A (en) * 1985-11-21 1987-06-03 Toshiba Corp Vertical type thermal treatment equipment
JPH0315336B2 (en) * 1985-11-21 1991-02-28 Tokyo Shibaura Electric Co
JPS62130534A (en) * 1985-12-02 1987-06-12 Deisuko Saiyaa Japan:Kk Wafer conveyor for vertical wafer processor
JPH0513379B2 (en) * 1985-12-02 1993-02-22 Disco Hightech Kk
JPH0273732U (en) * 1988-11-28 1990-06-05

Also Published As

Publication number Publication date
JPS6227725B2 (en) 1987-06-16

Similar Documents

Publication Publication Date Title
JPS56165317A (en) Manufacture of semiconductor device
JPS5588323A (en) Manufacture of semiconductor device
ES536897A0 (en) A GLASS SHEET BENDING STATION
DE3663534D1 (en) Process for manufacturing a porous gas-flushing brick for metallurgical vessels
JPS6221229A (en) Treating device
EP0614216A4 (en) Apparatus for forming oxide film, heat treatment apparatus, semiconductor device, manufacturing method therefor.
JPS57107026A (en) Heating mechanic for vacuum machine
JPS5694750A (en) Heating treatment device
JPS5725647A (en) Manufacture of fluorescent lamp
JPS6466094A (en) In-pile brazing method containing no flux
JPS54125975A (en) Anti-contamination method for wafer inside reaction tube
JPS5472968A (en) Sealing jig for glass-sealed diode
JPS564233A (en) Continuous handling apparatus for wafer
JPS5671947A (en) Foiling
JPS57109344A (en) Manufacture and its apparatus for semiconductor device
JPS5613720A (en) Heat treating device
JPS5656643A (en) Treating device for semiconductor substrate
JPS57118636A (en) Manufacture of semiconductor device
JPS5681951A (en) Holder of semiconductor substrate
JPS52149969A (en) Method of putting wafers into and out from reaction tube in heat-treatment furnace
JPS5785238A (en) Reaction tube
JPS52143758A (en) Heat treatment method of semiconductor wafers
JPS5543863A (en) Manufacture of semiconductor element
JPS648616A (en) Lamp annealing apparatus
JPS57106133A (en) Heat treatment for semiconductor wafer