JPS648616A - Lamp annealing apparatus - Google Patents
Lamp annealing apparatusInfo
- Publication number
- JPS648616A JPS648616A JP16448387A JP16448387A JPS648616A JP S648616 A JPS648616 A JP S648616A JP 16448387 A JP16448387 A JP 16448387A JP 16448387 A JP16448387 A JP 16448387A JP S648616 A JPS648616 A JP S648616A
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- melting point
- point metal
- high melting
- metal material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To improve cohesion with substrate and gas purge and also realize improvement of short period annealing effect with high thermal conductivity by using a high melting point metal material, in place of graphite, at least for the surface of lamp annealing apparatus susceptor. CONSTITUTION:A lamp 1 for annealing, a susceptor 2 and a susceptor supporting rod 4 are place within a quartz tube and a substrate 3 to be processed are housed within the susceptor 2. The entire part of susceptors 21, 21 are formed by a high melting point metal material, or the susceptor surface is coated with a high melting point metal 22 while an interior is formed by graphite 23, or the susceptor supporting rod 4 is also formed by a high melting point metal. When tungsten is used as the high melting point metal material, uniformity and reproducibility can also be improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16448387A JPS648616A (en) | 1987-06-30 | 1987-06-30 | Lamp annealing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16448387A JPS648616A (en) | 1987-06-30 | 1987-06-30 | Lamp annealing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS648616A true JPS648616A (en) | 1989-01-12 |
Family
ID=15794028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16448387A Pending JPS648616A (en) | 1987-06-30 | 1987-06-30 | Lamp annealing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS648616A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02303121A (en) * | 1989-05-01 | 1990-12-17 | American Teleph & Telegr Co <Att> | Manufacture of semicowductor device |
JPH08213337A (en) * | 1994-11-30 | 1996-08-20 | New Japan Radio Co Ltd | Heat treatment of semiconductor substrate |
-
1987
- 1987-06-30 JP JP16448387A patent/JPS648616A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02303121A (en) * | 1989-05-01 | 1990-12-17 | American Teleph & Telegr Co <Att> | Manufacture of semicowductor device |
JPH08213337A (en) * | 1994-11-30 | 1996-08-20 | New Japan Radio Co Ltd | Heat treatment of semiconductor substrate |
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