JPS56129696A - Crystal growing apparatus - Google Patents

Crystal growing apparatus

Info

Publication number
JPS56129696A
JPS56129696A JP3032580A JP3032580A JPS56129696A JP S56129696 A JPS56129696 A JP S56129696A JP 3032580 A JP3032580 A JP 3032580A JP 3032580 A JP3032580 A JP 3032580A JP S56129696 A JPS56129696 A JP S56129696A
Authority
JP
Japan
Prior art keywords
crystal
growing apparatus
crystal growing
furnace
heated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3032580A
Other languages
Japanese (ja)
Inventor
Kiyoshi Hisatomi
Koji Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3032580A priority Critical patent/JPS56129696A/en
Publication of JPS56129696A publication Critical patent/JPS56129696A/en
Pending legal-status Critical Current

Links

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To obtain a crystal of high quality by coating the outer heat insulating member of the double-layered heat -insulated section of a crystal growing apparatus with silicon nitride to prevent carbon from mixing into a crystal.
CONSTITUTION: When polycrystalline silicon 10 or the like is put in quartz crucible 1 of the crystal growing apparatus and heated with heater 4, outer carbon felt member 5b of heat insulated section 5 is coated with silicon nitride to prevent carbon fine powder from scattering in the furnace. In order to carry out the coating, carbon felt molded into the predetermined form is put in a furnace in an inert atmosphere, heated to about 1,200W1,700°C, and kept for a predetermined time after feeding silane and ammonia. The thickness of the coat is suitably about 50W 100μ. Thus, a single crystal of high quality is obtd.
COPYRIGHT: (C)1981,JPO&Japio
JP3032580A 1980-03-12 1980-03-12 Crystal growing apparatus Pending JPS56129696A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3032580A JPS56129696A (en) 1980-03-12 1980-03-12 Crystal growing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3032580A JPS56129696A (en) 1980-03-12 1980-03-12 Crystal growing apparatus

Publications (1)

Publication Number Publication Date
JPS56129696A true JPS56129696A (en) 1981-10-09

Family

ID=12300648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3032580A Pending JPS56129696A (en) 1980-03-12 1980-03-12 Crystal growing apparatus

Country Status (1)

Country Link
JP (1) JPS56129696A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63166793A (en) * 1986-12-26 1988-07-09 Toshiba Ceramics Co Ltd Pulling up device for silicon single crystal
JPH0193489A (en) * 1987-10-01 1989-04-12 Kyushu Electron Metal Co Ltd Production of single crystal for semiconductor
KR20030050334A (en) * 2001-12-18 2003-06-25 주식회사 실트론 Apparatus of growing a single silicon ingot
JP2009150637A (en) * 2007-12-21 2009-07-09 Green Energy Technology Inc Crystal-growing furnace with convectional cooling structure
JP2009198155A (en) * 2008-02-19 2009-09-03 Green Energy Technology Inc Crystal-growing furnace system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63166793A (en) * 1986-12-26 1988-07-09 Toshiba Ceramics Co Ltd Pulling up device for silicon single crystal
JPH0193489A (en) * 1987-10-01 1989-04-12 Kyushu Electron Metal Co Ltd Production of single crystal for semiconductor
KR20030050334A (en) * 2001-12-18 2003-06-25 주식회사 실트론 Apparatus of growing a single silicon ingot
JP2009150637A (en) * 2007-12-21 2009-07-09 Green Energy Technology Inc Crystal-growing furnace with convectional cooling structure
JP2009198155A (en) * 2008-02-19 2009-09-03 Green Energy Technology Inc Crystal-growing furnace system

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