JPS60213022A - Vertical supporting tool - Google Patents

Vertical supporting tool

Info

Publication number
JPS60213022A
JPS60213022A JP6900984A JP6900984A JPS60213022A JP S60213022 A JPS60213022 A JP S60213022A JP 6900984 A JP6900984 A JP 6900984A JP 6900984 A JP6900984 A JP 6900984A JP S60213022 A JPS60213022 A JP S60213022A
Authority
JP
Japan
Prior art keywords
support
holding
rod
rods
notch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6900984A
Other languages
Japanese (ja)
Inventor
Jiro Yoshida
吉田 二郎
Toyokichi Yoshioka
豊吉 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEKUNISUKO KK
Original Assignee
TEKUNISUKO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TEKUNISUKO KK filed Critical TEKUNISUKO KK
Priority to JP6900984A priority Critical patent/JPS60213022A/en
Publication of JPS60213022A publication Critical patent/JPS60213022A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To obtain a vertical supporting tool enabled to be used stably for a long period, and enabled to exchange damaged parts locally by a method wherein a wafer supporting means is incorporated into the supporting tool main body detachment freely, and moreover displacement in the vertical direction freely. CONSTITUTION:A vertical supporting tool consists of a supporting tool main body 2, and supporting rods 32a, 32b, 32c of three pieces to support a semiconductor wafer or the similar article thereof. One edge part of the supporting rod 32a is supported stably and detachment freely by a holder member 44 positioning on the upper side. Another edge part of the supporting rod 32a is supported displacement in the vertical direction freely in relation to a holder member 44 positioning on the under side, and moreover detachment freely nearly similarly with the other edge part thereof. Both the edge parts of the supporting rod 32b are incorporated into the supporting tool main body 2 displacement in the vertical direction freely through holders 52 equipped detachment freely to edge members 6a, 6b. Accordingly, thermal stress is not generated between the supporting rods and the supporting tool main body 2 even when exposed to a high temperature in a diffusion furnace, and local damage is not generated. Moreover, even when damage is generated, use can be continued by exchanging to a new parts.

Description

【発明の詳細な説明】 く技術分野〉 本発明は、半導体ウェーハ又はその類似物を支持するた
めの縦型支持具に関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a vertical support for supporting semiconductor wafers or the like.

く背景技術〉 当業者には周知の如く、半導体ウェーハの拡散処理にお
いては、複数枚の半導体ウェーハを支持具上に載置して
拡散炉内に収容している。この拡散炉としては、実質上
水平に延びる構製拡散炉がこれまで一般に使用されてき
たが、特に近時においては、尖質上鉛亘に延びる縦型拡
散炉も開発され、これに伴なって半導体ウェーハを支持
する支持具も所謂縦型のものが使用されるようになって
きた。この糧の支持具は、(a)拡散処理される半導体
9エーハに、異物の付着乃至拡散等の悪影響を与えない
ように、半導体ウェーハと実質上回−或いは半導体ウェ
ーハと実質上反応しない材料から形成されていること、
(b)拡散炉内VCTcll、Q度に副える高耐熱性を
有すること、(C)拡散処理後支持具は洗浄されて再使
用されるが、この洗浄処理の際に洗浄液によって容易V
C変質乃ヱ溶融しないこと、等の要件を満たすものであ
ることが重要である。
BACKGROUND ART As is well known to those skilled in the art, in the diffusion process of semiconductor wafers, a plurality of semiconductor wafers are placed on a support and housed in a diffusion furnace. Up until now, diffusion furnaces with a structure that extends substantially horizontally have been generally used, but in recent years, vertical diffusion furnaces that extend across the top of the lead have also been developed. Also, so-called vertical type supports have come to be used for supporting semiconductor wafers. (a) In order to prevent adverse effects such as adhesion or diffusion of foreign matter to the semiconductor 9 wafers to be subjected to the diffusion process, they are made of materials that are substantially stronger than the semiconductor wafers or that do not substantially react with the semiconductor wafers. being formed,
(b) The VCTcll in the diffusion furnace has high heat resistance that is compatible with the Q degree; (C) After the diffusion process, the support tool is cleaned and reused, but during this cleaning process, the cleaning solution can easily remove the VCTcll.
It is important that the material satisfies the requirements such as C deterioration and not melting.

かよりな要件に鑑み、上記支持具は、一般に、シリコン
或いは石英ガラスから形成されている。
In view of the strict requirements, the supports are generally made of silicon or quartz glass.

しか1.て、従来の支持具は、シリコン製の場合には、
シリコンが硬く且つ脆くしかも融着が不可能である故に
、シリコンブロック素材に切断及び溝の創設等の比較的
簡単な機械加工を加えて単一片から、或いは機械加工を
施した複数個の部品を組合せて製作していた。一方、石
英ガラスの場合には、部品と部品との融着が可能である
故に、一般に、複数個の部品を融着しニ一体にせしめて
製作していた。
Only 1. However, when conventional supports are made of silicone,
Because silicone is hard and brittle, and cannot be fused, it is possible to create a single piece or multiple machined parts by applying relatively simple machining processes such as cutting and creating grooves to the silicone block material. It was produced in combination. On the other hand, in the case of quartz glass, since it is possible to fuse parts together, it is generally manufactured by fusing a plurality of parts to form a single body.

然るに、従来のクリコン又は石英ガラス製の支持具には
、次の通りの解決すべき問題が存在する。
However, conventional supports made of cryon or quartz glass have the following problems to be solved.

特に、シリコン製支持具の場合には、第1に、7リコン
自体が相当高価な栃料でおる故に、製作コストが高くな
る。第2に、シリコンが硬く且つ脆い性質を有する故に
、衝撃等が加わるとこわれるおそれがあシ、特に半導体
ウェーハを保持した状態でこわれると保持したウェーハ
が落下17て破損する。他方、石英ガラス製支持具の場
合には、まず、融着による一体物である故に、拡散炉内
にて高温に晒されると融着部位が軟化し″C涙形するお
れがあシ、変形すると半導体ウェーハを所要の通シに保
持することが困難となる。更VC,石英ガラスは拡散処
理後の洗浄処理において洗浄液(一般に、洗浄液として
7ツ酸が使用されている)によって若干変質乃至?!¥
融し、それ故に半導体ウェーハを保持溝によシ保持する
構成のものにあっては洗浄処理時に上記保持溝の間隔が
若干大きくなり、長期間使用1.ていると半導体ウェー
ハを所要の通シに保持することが困難となシ、全体とし
て使用不能になる。
Particularly in the case of a support made of silicone, firstly, the manufacturing cost is high because the silicone silicone itself is a fairly expensive material. Second, since silicon is hard and brittle, there is a risk that it will break if subjected to impact or the like, and in particular, if it breaks while holding a semiconductor wafer, the held wafer will fall 17 and be damaged. On the other hand, in the case of a support made of quartz glass, since it is a one-piece product that is fused together, when exposed to high temperatures in a diffusion furnace, the fused portion softens and becomes teardrop-shaped and deformed. This makes it difficult to hold the semiconductor wafer in the required alignment.Furthermore, VC and quartz glass are slightly altered in quality by the cleaning solution (generally, hexachloric acid is used as the cleaning solution) during the cleaning process after the diffusion process. !¥
Therefore, in the case of a structure in which the semiconductor wafer is held by the holding grooves, the interval between the holding grooves becomes slightly larger during the cleaning process, making it difficult to use the semiconductor wafer for a long time. If this happens, it will be difficult to hold the semiconductor wafer in the required alignment, making it unusable as a whole.

そこで、上述17た不都合を解消するために、半導体ウ
ェーハを保持する保持溝が刻設されている部材をシリコ
ンから形成し、その他の部材を石英ガラスから形成1.
て両者を固定するようにして上記支持具を製作すること
も考えられる。しかし、かかる場合には、拡散炉内への
収容及びこれからの取出t、rcよってかなり大きな温
度変化に晒される故に、シリコンと石英ガラスの熱膨張
率の差(シリコンよりも石英ガラスの方が熱膨張率が小
さい)に起因して、両者の固定部が熱応力によって局部
的に損傷するおそれがある。
Therefore, in order to solve the above-mentioned 17 problems, the member in which the holding groove for holding the semiconductor wafer is carved is made of silicon, and the other members are made of quartz glass.1.
It is also conceivable to manufacture the above-mentioned support in such a way that the two are fixed together. However, in such cases, the difference in thermal expansion coefficient between silicon and quartz glass (quartz glass heats up more than silicon (low expansion coefficient), there is a risk that both fixing parts may be locally damaged by thermal stress.

〈発明の目的〉 本発明の主目的は、温度変化による損傷等を防止して長
期間安定して使用することができ、更に製作コストも安
価である、改良された縦型支持具を提供することである
<Object of the Invention> The main object of the present invention is to provide an improved vertical support that can be stably used for a long period of time by preventing damage caused by temperature changes, and is inexpensive to manufacture. That's true.

本発明の他の目的は、局部的に損傷した場合には一部の
部品を交換することによって使用を続けることができる
、改良された縦型支持具を提供することである。
Another object of the invention is to provide an improved vertical support that can be continued in use by replacing some parts in case of local damage.

〈発明の概要〉 本発明によれば、上述17た目的を達成するために、間
隔を置いて配設された2個の端部桐と該端部材間に固定
された複数本の連結ロッドとを含む支持具本体と、半導
体クエーハ又はそのbm物を支持するための支持手段と
を具備し、 該支持手段の片側が片方の該端部材に着脱自在に支持さ
れ、その他側は上下方向に変位自在である、ことを特9
とする縦型支持具が提供される。
<Summary of the Invention> According to the present invention, in order to achieve the above-mentioned 17 objects, two end paulownia parts arranged at intervals, a plurality of connecting rods fixed between the end members, and and a support means for supporting the semiconductor wafer or its bm product, one side of the support means is removably supported by one of the end members, and the other side is vertically displaced. The special point is that it is free.
A vertical support is provided.

〈発明の好適具体例〉 以下、添付図面を参照して、本発明に従って構成された
縦型支持具の具体例について説明する。
<Preferred Specific Examples of the Invention> Hereinafter, specific examples of the vertical support constructed according to the present invention will be described with reference to the accompanying drawings.

まず、第1図乃至第7図を参照して、縦型支持具の第1
の具体例について説明する。主として第1図及び第4図
を参照1.て、図示の縦型支持具は石英ガクス製の支持
具本体2と半導体ウェーハ又はその類似物を支持するた
めのシリコン製の支持手段4とを具備1.ている。
First, with reference to FIGS. 1 to 7, the first part of the vertical support
A specific example will be explained. Mainly refer to Figures 1 and 4.1. The illustrated vertical support comprises a support body 2 made of quartz gas and support means 4 made of silicon for supporting a semiconductor wafer or the like.1. ing.

支持具本体2は、上下方向に間隔を置いて配設され九2
個の端部1’5a及び6bと、この端部材6a及び6b
間に固定された複数本(具体例では4本)の連結ロッド
8a、8b、8c及び8d’t−含んでいる。端部拐6
8及び6bの各々は、適宜の形状でよいが、図示の具体
例では、第°2図乃至第4図から明らかな如く、その外
形が円形状に形成されている。端部@6a及び6bの各
々は、石英ガラスから形成された複数本のロッド状部材
を融着することによって形成されておp、環状ロッド部
10と、この環状ロッド部10の内側を間隔を置いて互
いに実質上平行に所定方向に延び且つその両端が環状ロ
ッド部10に融着されている2本のロッド部12及び1
4と、この環状ロッド部lOの内側を間隔を置いて相互
に実質上平行に上記所定方向に対して実質上垂直な方向
に延び且つその両端が環状ロッド部10に融着されてい
る3本のロッド部16.18及び20と、ロッド部18
及び20の両端部間を上記所定方向II(延びその両端
がロッド部18及び20に融着されている短ロツド部2
2及び24と、を有している。かくの通シであるので、
図示の端部材6a及び6bの各々は、格子状に構成され
ている。連結ロッド8a。
The support main bodies 2 are arranged at intervals in the vertical direction.
end portions 1'5a and 6b, and end members 6a and 6b.
It includes a plurality of (four in the specific example) connecting rods 8a, 8b, 8c and 8d't- fixed therebetween. Edge cutting 6
Each of 8 and 6b may have an appropriate shape, but in the illustrated example, as is clear from FIGS. 2 to 4, the outer shape is circular. Each of the end portions @6a and 6b is formed by fusing a plurality of rod-shaped members made of quartz glass, and is formed by fusion bonding a plurality of rod-shaped members made of quartz glass. Two rod portions 12 and 1 are arranged, extend in a predetermined direction substantially parallel to each other, and have both ends fused to the annular rod portion 10.
4, and three rods extending substantially parallel to each other at intervals on the inside of the annular rod portion lO in a direction substantially perpendicular to the predetermined direction, and having both ends fused to the annular rod portion 10. rod portions 16, 18 and 20, and rod portion 18
and 20 in the predetermined direction II (the short rod portion 2 extends and has both ends fused to the rod portions 18 and 20).
2 and 24. Since this is the general rule,
Each of the illustrated end members 6a and 6b is configured in a lattice shape. Connecting rod 8a.

8b、8c及び8dの各々も石英ガラスから形成された
ロッド状部材から構成され、各々のロッド8a、sb、
Bc及び8dの一端(上端)が上側に位置する端部材6
aの環状ロッド部101c融着され、それらの各々の他
端(下端)が下側に位置する端部材6bの環状ロッド部
lOに融着されている。この連結ロッド8a、8b、8
c及び8dは、相互に実質上平行に上下方向に延びてい
る。
Each of 8b, 8c and 8d is also composed of a rod-shaped member made of quartz glass, and each of the rods 8a, sb,
An end member 6 in which one end (upper end) of Bc and 8d is located on the upper side
The annular rod portion 101c of a is fused, and the other end (lower end) of each of them is fused to the annular rod portion 10 of the end member 6b located on the lower side. These connecting rods 8a, 8b, 8
c and 8d extend vertically substantially parallel to each other.

上述した端部材6aのほぼ中央部には、懸架手段26が
設けられている。図示の懸架手段26は略U字状の懸架
部を有する一対の石英ガラス製の懸架部材28から構成
され、この懸架部材28の各々の一端が端部材6aのロ
ッド部12及び14に融着嘔れている。この一対の懸架
部材28間には、補助ロッド部材30が融着されている
、次に、支持手段1cついて説明すると、図示の支持手
段4は3本の保持ロッド32a、32b及び34cを含
んでいる。シリコンから形成された3本の保持ロッド3
2a、32b及び32cは、円形、多角形等の適宜の横
断面形状を有するものでよいが、製作の容易性等の見地
から見て、短形特に図示する如く正方形の横断面形状を
有するものであるのが好ましい。保持ロッド32a、3
2b及び32cの各々の一端部ICは係止切欠きが形成
され、それらの各々の他端には案内切欠きが形成されて
いる。IIJ1図と共に第4図及び第5図を参照して説
明すると、保持ロッド32aの一端部(上端部)には、
対角線方向に対向する2個の角部、即ち第1図及び第4
図において紙面に垂直な方向両側に位置する2個の角部
に、角部を切欠いて対角線に実質上垂直な平面にせしめ
た2個の係止切欠き34aが形成されている(第5図も
参照嘔れたい)。また、保持ロッド32aの他端(下端
)にも、対角線方向に対向する2個の角部、即ち上記係
止切欠き34aが形成された2個の角部に、角部を切欠
いて対角線に実質上垂直な平面にせしめた2個の案内切
欠き36aが形成されている(第4図において片方のみ
示す)。また、保持ロッド32b及び32cの各々の一
端部には、対角線方向に対向する2個の角部、即ち、第
1図及び第4図において左右方向両側に位置する2個の
角部に、角部を切欠いて保止切欠き34aと実質上同様
の係止切欠き34b及び34cが形成され、それらの各
々の他端には、対角線方向に対向する2個の角部、即ち
上記係止切欠き34b及び34cが形成された2個の角
部に、角部を切欠いて案内切欠き36aと実質上同様の
案内・切欠き36b及び36cが形成されている。この
保持ロッド32a 、32b及び32cの各々には、更
に、その主部に長苧方向に間隔を置いてV数個の保持溝
38が形成されている(保持ロッド32bに形成された
保持溝は図示していない)。第1図及び第4図から理解
される如く、各保持ロッド32a。
Suspension means 26 is provided approximately at the center of the end member 6a described above. The illustrated suspension means 26 is composed of a pair of suspension members 28 made of quartz glass having a substantially U-shaped suspension portion, and one end of each suspension member 28 is fused to the rod portions 12 and 14 of the end member 6a. It is. An auxiliary rod member 30 is fused between the pair of suspension members 28.Next, the support means 1c will be explained.The illustrated support means 4 includes three holding rods 32a, 32b and 34c. There is. Three retaining rods 3 made of silicone
2a, 32b, and 32c may have an appropriate cross-sectional shape such as circular or polygonal, but from the viewpoint of ease of manufacture, rectangular shapes, especially those having a square cross-sectional shape as shown in the figure are preferred. It is preferable that Holding rod 32a, 3
A locking notch is formed in one end IC of each of 2b and 32c, and a guide notch is formed in the other end of each of them. Referring to FIG. 4 and FIG. 5 together with FIG. IIJ1, one end (upper end) of the holding rod 32a includes:
Two diagonally opposite corners, namely FIGS. 1 and 4.
In the figure, two locking notches 34a are formed at two corners located on both sides in the direction perpendicular to the plane of the drawing. (See also I want to vomit). In addition, the other end (lower end) of the holding rod 32a is also provided with two diagonally opposite corners, that is, the two corners where the locking notches 34a are formed, and the corners are cut out so that the corners are diagonally opposite each other. Two guide notches 36a are formed in substantially perpendicular planes (only one is shown in FIG. 4). Further, one end of each of the holding rods 32b and 32c has two corner portions diagonally opposite to each other, that is, two corner portions located on both sides in the left and right direction in FIGS. Locking notches 34b and 34c, which are substantially similar to the locking notch 34a, are formed by cutting out the locking notch 34a, and the other end of each of them has two diagonally opposite corners, i.e., the locking notch 34a. At the two corners where the notches 34b and 34c are formed, guide/notches 36b and 36c, which are substantially similar to the guide notch 36a, are formed by cutting out the corners. Each of the holding rods 32a, 32b and 32c is further formed with several V holding grooves 38 at intervals in the longitudinal direction (the holding grooves formed on the holding rod 32b are (not shown). As can be seen from FIGS. 1 and 4, each retaining rod 32a.

32b及び32cにおいては、支持具本体2に組伺けら
れた状態において内側に位置する角!IS(即ち、第1
図及び第4図において、保持ロッド32aにおいては右
側に位置する角部、保持ロッド32bにおいては紙面に
垂厘な方向後側に位置する角部、保持ロッド32clC
おいては紙面に垂厘な方向前側に位置する角部)に保持
溝38が刻設されている。具体例においては、11図か
ら容易に理解される如く、3本の保持ロッド32a、3
2b及び32cを支持具本体2に組付けた時に、保持ロ
ッド32bの保持溝38と保持ロッド32cの保持#1
38とが横方向に整合して位置し、保持ロッド32aの
保持溝38が保持ロッド32b及び32cの保持WII
38より上下本向若干下方に位置するようになっている
。これに代えて、支持具本体2に組付けられた時に、保
持ロッド32aの保持$38、保持ロッド32bの保持
WII38及び保持ロッド32cの保持#138が夫々
横方向に整合するように構成してもよい。1(かかる場
合ICハ、後の記載から容易に理解される如(、半導体
ウェーハ又はその類似vlJFi実質上水平に保持され
る)上述1.九通りの3本の保持ロッド32a m 3
2b及び32cは、第1図及び第4図から明らかな如く
、保持ロッド32aが矢印40(第1図)で示す牛導体
りエーハ又はその類似物の装置方向に見て他の保持ロッ
ド32b及び32cよりも後方に位置するように、支持
具本体2に着脱自在に組付けられる。
In 32b and 32c, the corners located inside when assembled into the support main body 2! IS (i.e. 1st
In the drawings and FIG. 4, the corner of the holding rod 32a is located on the right side, the corner of the holding rod 32b is located on the rear side in the direction perpendicular to the paper, and the holding rod 32clC
In the figure, a holding groove 38 is carved in a corner located on the front side in the direction perpendicular to the plane of the paper. In the specific example, as can be easily understood from FIG. 11, three holding rods 32a, 3
2b and 32c are assembled to the support main body 2, the holding groove 38 of the holding rod 32b and the holding #1 of the holding rod 32c
38 are located in laterally aligned position, and the retaining groove 38 of the retaining rod 32a is located in horizontal alignment with the retaining groove 38 of the retaining rods 32b and 32c.
It is located slightly below 38 in the vertical direction. Instead, when assembled to the support main body 2, the holding rod 32a, the holding WII 38 of the holding rod 32b, and the holding rod 32c holding #138 are configured to be aligned in the lateral direction. Good too. 1 (In such case, the IC is held substantially horizontally, as will be easily understood from the description below), as described above 1. Three holding rods 32a m 3 in nine ways
2b and 32c, as seen in FIGS. 1 and 4, the retaining rod 32a is connected to the other retaining rods 32b and 32c when viewed in the direction of the apparatus of the conductor or the like as indicated by arrow 40 (FIG. 1). It is detachably assembled to the support main body 2 so as to be located rearward than 32c.

次いで、主として第2図乃至第4図と共に第6図を参照
1.て、上記保持ロッド32a 、32b及び32cの
支持具本体2への組付様式について説明する。保持ロッ
ド32aの両端部は端部材6a及び6bに着脱自在に装
着される第1のホルダを介して支持具本体2に組付けら
れる。第6−A図を参照して、図示の第1のホルダ42
は、シリコンから形成された略矩形状のホルダ部材44
から構成され、このホルダ部材44の長手方向略中央部
には内側に延びる中央切欠き46が形成されている。こ
の中央切欠き460幅は、保持ロッド32aの係止切欠
き34aが形成された部分の幅、即ち2個の係止切欠き
34c間の残留厚さr+ (第5図)と、案内切欠き3
6aが形成された部分の幅、即ち2個の係止切欠き36
c間の残留厚さと実質上回−又はそれらより若干大きい
。このホルダ部材44の上面の横方向略中火部には、上
記中央切欠き46に対して実質上垂直に延びてこの中央
切欠き46と交差するチャンネル48が形成されておシ
、チャンネル48の底面48aは保持ロッド32aの一
端部を支持するための肩部を規定する。
Next, please mainly refer to FIG. 6 along with FIGS. 2 to 4. 1. Now, a method of assembling the holding rods 32a, 32b, and 32c to the support main body 2 will be explained. Both ends of the holding rod 32a are assembled to the support main body 2 via first holders that are detachably attached to the end members 6a and 6b. Referring to FIG. 6-A, the illustrated first holder 42
is a substantially rectangular holder member 44 made of silicon.
A central notch 46 extending inward is formed at approximately the center of the holder member 44 in the longitudinal direction. The width of this central notch 460 is the width of the portion of the holding rod 32a where the locking notch 34a is formed, that is, the residual thickness r+ (FIG. 5) between the two locking notches 34c, and the guide notch. 3
The width of the part where 6a is formed, that is, the two locking notches 36
- or slightly larger than the residual thickness between c and c. A channel 48 that extends substantially perpendicularly to the central notch 46 and intersects with the central notch 46 is formed in the upper surface of the holder member 44 in the horizontally medium-sized portion. Bottom surface 48a defines a shoulder for supporting one end of retaining rod 32a.

また、このホルダ部材44の底面中央部には、略矩形状
の突起50が設けられている。上記保持ロッド32aは
、次の通りにして支持具本体2に組付けられる。即ち、
まずホルダ部材44を端部材6bの環状ロッド部lO並
びにロッド部12.14及び16によって規定される空
間部に上方から装着する。かく装着すると、第3図に示
す如(、ホルダ部材44の底面周縁部が上記環状ロッド
部10並びにロッド部12.14及び16上に載置され
Furthermore, a substantially rectangular protrusion 50 is provided at the center of the bottom surface of the holder member 44 . The holding rod 32a is assembled to the support main body 2 in the following manner. That is,
First, the holder member 44 is mounted from above into the space defined by the annular rod portion IO and the rod portions 12, 14 and 16 of the end member 6b. When mounted in this manner, the bottom peripheral edge of the holder member 44 rests on the annular rod portion 10 and rod portions 12, 14 and 16, as shown in FIG.

ホルダ部材44の突起50が上記空間内に位置付けられ
、かくてホルダ部材44は所要の通りに着脱自在に組伺
けられる。次いで、保持ロッド32aの一端部を端部材
6aの環状ロッド部lO並びにロッド部12,14及び
16によって規定される空間を通l、て上方に突出させ
、その一端部に形成された係止切欠き34aに他方のホ
ルダ部材44の中央切欠き46を位[イ=Jけ、しかる
後に保持ロッド32aの他端を端部4ttibに装着さ
れたホルダ部材44の中央切欠き46とチャンネル48
の交差部に位置付けて上方のホルダ部材44t一端部材
6aの上記空間部に上方から装着する。かく装着すると
、第2図に示す如く、ホルダ部材44の底面周縁部が上
記端部材6aの環状ロッド部10並びにロッド部12,
14及び16上に載置され、ホルダ部材44の突起50
が上記空間内に位置付けられ、かくして他方のホルダ部
材44も所要の通りに着脱自在に組付けられる。更に、
かく装着すると、保持ロッド32aの一端部においては
、係止切欠き34aが形成された切欠き部は、第7−A
図に示す如く、係止切欠き34&がホルダ部材44の中
央切欠き46の側面に対向するようにその中央切欠き4
6内に位置付けられ、上記切欠き部に隣接I2てそのす
ぐ外側に存在する非切欠き部は、第7−8図に示す如く
、その係止切欠き34aに隣接してその外側圧存在する
角部がチャンネル48内に位置するようにチャンネル4
8と中央切欠き46の交差部に位置付けられる。そして
、上部非切欠き部の係止切欠き34aに隣接12てその
外側に存在する角部が、チャンネル48の底面48aに
よって規定された肩部上に載置される。
The protrusion 50 of the holder member 44 is positioned within the space, so that the holder member 44 can be removably assembled as desired. Next, one end of the holding rod 32a is caused to protrude upward through the space defined by the annular rod portion IO of the end member 6a and the rod portions 12, 14, and 16, and the locking notch formed at the one end is Place the center notch 46 of the other holder member 44 in the notch 34a, and then insert the other end of the holding rod 32a into the center notch 46 of the holder member 44 attached to the end 4ttib and the channel 48.
The upper holder member 44t is positioned at the intersection of the upper holder member 44t and mounted in the space of the one end member 6a from above. When mounted in this manner, as shown in FIG.
14 and 16 and the protrusion 50 of the holder member 44
is positioned within the space, and thus the other holder member 44 is also detachably assembled as required. Furthermore,
When mounted in this manner, the notch in which the locking notch 34a is formed is located at the one end of the holding rod 32a.
As shown in the figure, the central notch 46 of the holder member 44 is arranged such that the locking notch 34& is opposite to the side surface of the central notch 46 of the holder member 44.
The non-notched portion located within I2 and located immediately outside the notched portion I2 is located adjacent to the locking notch 34a and located immediately outside of the notched portion 34a, as shown in FIGS. 7-8. channel 4 so that the corner is located within channel 48.
8 and the central notch 46. The corner portion of the upper non-cutout portion adjacent 12 to the outside of the locking notch 34a rests on the shoulder defined by the bottom surface 48a of the channel 48.

かくして、第7−A図及び第7−B図から理解される如
く、保持ロッド32aの一端部は、チャンネル48の肩
部によって下方への落下が阻止され、チャンネル48と
中央切欠f!46により規定される角部によって横方向
への移動が阻止され、充分安定して上側に位置するホル
ダ部材44に着脱自在に支持される。また、保持ロッド
32aの他端部においては、案内切欠き36aが形成式
れた切欠き部は、案内切欠き36aが、端部材6bに装
着されたホルダ部材44の中央切欠き46の側面に対向
するようにその他端が中央切欠き46内に位置付けられ
、上記切欠き部に隣接してそのすぐ内側に存在する非切
欠き部は−1その案内切欠き36aに隣接してその内側
に存在する角部がチャンネル48内に位置するようにそ
の端部がチャンネル48と中央切欠き46の交差部に位
ff1f刊けられる(詳しくは、第1図から理解される
如く、上記交差部の下部には上記切欠き部の上部が位置
付けられ、上記交差部の上部には上配非切欠き部の下端
部が位置付けられる)。かくの通りであるので、保持ロ
ッド32aの他端部は、その一端部と略同様にして、チ
ャンネル48と中央切欠き46により規定される角部に
よって横方向への移動が阻止され、下側に位置するホル
ダ部材44に対して上下方向に変位自在にこのホルダ部
材44に着脱自在に保持される。
Thus, as can be seen from FIGS. 7-A and 7-B, one end of the retaining rod 32a is prevented from falling downwardly by the shoulder of the channel 48 and the central notch f! Lateral movement is prevented by the corners defined by 46, and it is removably supported by the holder member 44 located on the upper side with sufficient stability. In addition, at the other end of the holding rod 32a, a notch in which a guide notch 36a is formed is formed so that the guide notch 36a is formed on the side surface of the center notch 46 of the holder member 44 attached to the end member 6b. The other end is located in the central notch 46 so as to be opposite, and the non-notched portion is located adjacent to and immediately inside the notched portion -1 and is located adjacent to and inside the guide notch 36a. The end thereof is located at the intersection of the channel 48 and the central notch 46 so that the corner thereof is located within the channel 48 (more specifically, as can be seen from FIG. The upper part of the notch is located at the upper part of the notch, and the lower end of the upper non-notched part is located at the upper part of the intersection. As such, the other end of the retaining rod 32a is prevented from moving laterally by the corner defined by the channel 48 and the central notch 46, in substantially the same manner as the one end thereof, and the lower end of the retaining rod 32a is It is detachably held by the holder member 44 so as to be freely displaceable in the vertical direction with respect to the holder member 44 located at the holder member 44 .

また、保持ロッド32bの両端部は、端部材6a及び6
bに着脱自在に装着される第2のホルダを介して支持具
本体2に組付けられる。第6−B図を参照して、図示の
第2のホルダ52はシリコンから形成された略矩形状の
ホルダ部材54がら構成され、このホルダ部材54の長
手方向略中央部には内側に延びる中央切欠き56が形成
され工いる。この中央切欠き560幅は保持ロッド32
bの係止切欠き34bが形成された部分の幅と案内切欠
き36bが形成された部分の幅と実質上回−又はそれら
よシ若千太きい。このホルダ部材54の一角部は矩形状
に切欠かれ、その上面の横力内絡中央部には、上記中央
切欠き56に対1.て実質上垂直に延びてこの中央切欠
き56と交差するチャンネル5Bが形成されている。こ
のチャンネル58の底面58aは保持ロッド32bの一
端部を支持するための肩部を規定する。1九、ホルダ部
材54の底面中央部には、略矩形状の突起60が設けら
れている。保持ロッド32bは、次の通りに17て支持
具本体2に組付けられる。即ち、まずホルダ部材54を
端部材6b・の環状ロッド部10゜ロッド部18及び2
0、並びに短ロツド部22によって規定される空間部に
上方から装着する。かく装着すると、第3図に示す如く
、第1のホルダ42と同様K、ホルダ部材54の突起6
0が上記空間内に位置付けられ、ホルダ部材54は所要
の通りに着脱自在に組付けられる。次いで、保持ロッド
32bの一端部を端部材6bの環状ロッド部lO、ロッ
ド部18及び20、並びに短ロツド部22によシ規定さ
れる空間を通して上方に突出させ、その一端部に形成さ
れた係止切欠き34bに他方のホルダ部材54の中央切
欠き46を位4付け、しかる後に保持ロッド32bの他
端を端部材6bに装着されたホルダ部材54の中央切欠
き56とチャンネル58の交差部に位置伺けて上記ホル
ダ部材54を端部材6aの上記空間部に上方から装着す
る。かく装着すると、第2図に示す如く、第1のホルダ
42と同様に、他方のホルダ部材54の突起60が端部
材6aの上記空間内に位置付けられ、このホルダ部材5
4も所要の通りKi脱自在に組付けられる。更にかく装
着すると、保持ロッド32bの一端部においては、保持
ロンド32aの一端部と同様罠、係止切欠き34bが形
成された切欠き部はホルダ部材54の中央切欠き56内
に位置付けられ、上記切欠き部に隣接してそのすぐ外側
に存在する非切欠き部はチャンネル58と中央切欠き4
60交差部に位置付けられ、そして上記非切欠き部の保
止切欠き34bK隣接1、てその外側に存在する角部は
チャンネル58の底面58aKよって規定された肩部に
載置式れる。か<1.て、保持ロッド32bの一端部は
、チャンネル58の肩部によって下方への落下が阻止さ
れ、チャンネル58と中央切欠き56によシ規定される
角部によって横方向への移動が阻止され、充分安定して
よ側圧位置するホルダ部材54に着脱自在に支持されろ
。また保持ロッド32bの他端部においては保持ロッド
32aの他端部と同様K。
Further, both ends of the holding rod 32b are connected to end members 6a and 6.
It is assembled to the support main body 2 via a second holder that is detachably attached to the support body 2.b. Referring to FIG. 6-B, the illustrated second holder 52 is composed of a substantially rectangular holder member 54 made of silicon, and a substantially rectangular holder member 54 has a central portion extending inwardly. A notch 56 is formed and machined. The width of this central notch 560 is the width of the retaining rod 32.
The width of the portion where the locking notch 34b of b is formed is substantially greater than the width of the portion where the guide notch 36b is formed, or is slightly wider than them. One corner of this holder member 54 is cut out in a rectangular shape, and a lateral force-internal center portion of the upper surface of the holder member 54 is provided with a pair of 1. A channel 5B is formed which extends substantially vertically and intersects this central notch 56. The bottom surface 58a of this channel 58 defines a shoulder for supporting one end of the retaining rod 32b. 19. A substantially rectangular projection 60 is provided at the center of the bottom surface of the holder member 54. The holding rod 32b is assembled to the support main body 2 at 17 as follows. That is, first, the holder member 54 is attached to the annular rod portion 10° of the end member 6b and the rod portions 18 and 2.
0 and the short rod portion 22 from above. When mounted in this manner, as shown in FIG.
0 is positioned within the space, and the holder member 54 is removably assembled as required. Next, one end of the holding rod 32b is made to protrude upward through the space defined by the annular rod portion lO, the rod portions 18 and 20, and the short rod portion 22 of the end member 6b, and the engagement formed at the one end thereof is The center notch 46 of the other holder member 54 is placed in the stop notch 34b, and then the other end of the holding rod 32b is inserted into the intersection of the center notch 56 of the holder member 54 attached to the end member 6b and the channel 58. The holder member 54 is mounted in the space of the end member 6a from above. When mounted in this manner, the protrusion 60 of the other holder member 54 is positioned within the space of the end member 6a, as shown in FIG.
4 can also be removably assembled as required. Furthermore, when mounted in this manner, at one end of the holding rod 32b, the notch in which the trap and locking notch 34b are formed, similar to the one end of the holding rod 32a, is positioned within the central notch 56 of the holder member 54. The non-notched portions adjacent to and immediately outside the notched portion are the channel 58 and the central notch 4.
60 intersection, and the corner located on the outside of the retention notch 34bK of the non-notched portion 34bK rests on the shoulder defined by the bottom surface 58aK of the channel 58. Or<1. One end of the retaining rod 32b is prevented from falling downward by the shoulder of the channel 58, and is prevented from moving laterally by the corner defined by the channel 58 and the central notch 56, and is It is removably supported by a holder member 54 that is stably placed in a lateral pressure position. Also, the other end of the holding rod 32b has a K similar to the other end of the holding rod 32a.

案内切欠き36bが形成された切欠き部の一部は端部材
6blK装着されたホルダ部材54の中央切欠き56内
罠位置付けられ、上記切欠き部の残部及び上記切欠き部
に隣接してそのすぐ内[K存在する非切欠き部の端部は
チャンネル58と中央切欠き56の交差部に位置付けら
れる。かくの通シであるので、保持ロッド32bの他端
部は、チャンネル58と中央切欠156によシ規定され
る角ViA&′Cよって横方向への移動が明止され、′
F側に位置するホルダ部材54に対して上下方向に変位
自在にこのホルダ部材54に着脱自在に保持される。
A part of the notch in which the guide notch 36b is formed is positioned within the central notch 56 of the holder member 54 attached to the end member 6blK, and the remaining part of the notch and the part adjacent to the notch are The end of the non-notched portion immediately within is located at the intersection of the channel 58 and the central notch 56. With such a through hole, the other end of the holding rod 32b is prevented from moving in the lateral direction by the angle ViA&'C defined by the channel 58 and the central notch 156;
It is detachably held by the holder member 54 located on the F side so as to be freely displaceable in the vertical direction.

更に、保持ロッド32cの両端部は、14i部材6a及
び6bに着脱自在に装着される第3のボルダを介17て
支持具本体2VC組付けられる。m6−C図を参照して
、図示の第3のホルダ62はシリコンから形成された略
矩形状のホルダ部伺64から構成されている。このホル
ダ部材64は上F5ホルダ部材54と略同様の構成であ
シ、矩形状に切次がれている個所のみdJ14なる。保
持ロッド32cの組付けは、保持ロッド32bと実質上
同様圧して遂行され、下側に位置するホルダ部材64は
、端部材6bの環状ロッド部10、ロッド部18及び2
0、並びに短ロッド部24により工規定される空間部圧
着脱自在ic紹付けられ、上側に位置するホルダ部vf
64は、端部材6aの環状ロッド部10゜ロッド部1B
及び20.襲びに短ロッド部24によって規定される空
間部VC着脱自在に組付けられる。そして、所要の通シ
Vc&着すると、保持ロッド32bと実質上同様に、保
持ロッド32cの一端部においては、係止切欠き34c
が形成された切欠き部は端部材6aVCIkMされたホ
ルダ64の中央切欠き66内に位置付けられ、上記切欠
き部に瞬接17てそのすぐ外側に存在する非切欠き部は
チャンネル68と中央切欠き56の交差部に位置付けら
れ、ぞして上記非切欠き部の係止切欠き34c[ljl
接してその外側に存在する角部はチャンネル68の底面
68aKよって規定された肩部に載置される。te、保
持ロッド32cの他端部においては、案内切欠き36c
が形成もれた切欠き部の一部は端部@’6bに装着され
たボルダ部材64の中央切欠き66内に位置付けられ、
上記切欠き部の残部及び上記切欠き部に接続1.てその
すぐ内側に存在する非切欠き部の端部はチャンネル68
と中央切欠き66の交差部に位置付けられる。
Further, both ends of the holding rod 32c are assembled to the support main body 2VC via a third boulder 17 which is detachably attached to the members 14i 6a and 6b. Referring to FIG. m6-C, the illustrated third holder 62 is composed of a substantially rectangular holder portion 64 made of silicon. This holder member 64 has substantially the same structure as the upper F5 holder member 54, and only the portions cut into a rectangular shape are dJ14. The holding rod 32c is assembled with substantially the same pressure as the holding rod 32b, and the lower holder member 64 is attached to the annular rod portion 10, rod portions 18 and 2 of the end member 6b.
0, and a space defined by the short rod part 24 where a removable crimping IC is introduced and a holder part vf located on the upper side.
64 is the annular rod portion 10° rod portion 1B of the end member 6a.
and 20. The space VC defined by the short rod portion 24 is attached and detachably assembled. Then, when the required thread Vc & is attached, a locking notch 34c is formed at one end of the holding rod 32c, substantially similar to the holding rod 32b.
The notch in which is formed is positioned within the center notch 66 of the holder 64 attached to the end member 6aVCIkM, and the non-notch portion present immediately outside the instant contact 17 is connected to the channel 68 and the center notch. The locking notch 34c [ljl
The abutting and outward corner rests on the shoulder defined by the bottom surface 68aK of the channel 68. te, at the other end of the holding rod 32c, a guide notch 36c
A part of the notch formed and leaked is positioned within the central notch 66 of the boulder member 64 attached to the end @'6b,
Connect to the remaining part of the notch and the notch 1. The end of the non-notched portion just inside the lever is channel 68.
and the central notch 66.

かくの通りにし工保持ロッド32a、32b及び32c
が支持具本体HCN付けられると、第1図から容易に理
解される如く、保持ロッド32a。
As described above, the retaining rods 32a, 32b and 32c
When the support body HCN is attached, as can be easily understood from FIG. 1, the holding rod 32a.

32b及び32cは端部材6a及び6brlJ′lヲ相
互に実質上平行に上下方向VC延びる。そl−て、第2
図及び第3図から明らかな如く、保持ロッド32aは保
持ロッド321)及び32cの中間であって半導体ウェ
ーハ又はその類似物の矢印40(第1図乃至第3図)で
示す装着方向に見て保持ロンド32a及び32bよシも
後方に位置する。更K、保持ロッド32bK形成された
保持溝38と保持ロッド32cK形成された保持溝38
とが横方同圧整合1.て位置し、保持コンド32aK形
成された保持溝38は保持ロッド32b及び32cの保
持溝38より上下方向若干下方に位置する。
32b and 32c extend substantially parallel to each other in the vertical direction VC from the end members 6a and 6brlJ'l. So, the second
As is clear from the figures and FIGS. 3, the retaining rod 32a is located intermediate between the retaining rods 321) and 32c when viewed in the direction of mounting the semiconductor wafer or the like as indicated by the arrow 40 (FIGS. 1-3). Holding ronds 32a and 32b are also located at the rear. Furthermore, the holding groove 38 formed with the holding rod 32bK and the holding groove 38 formed with the holding rod 32cK
and are lateral isobaric matching 1. The holding grooves 38 formed with the holding grooves 32aK are located slightly below the holding grooves 38 of the holding rods 32b and 32c in the vertical direction.

上記縦型支持具を用いて複数枚の半導体ウェーハを拡散
処理する際には、保持ロッド32 a、32b及び32
clC形成されている保持溝38に半導体ウェーハPを
挿入する。半導体ウェーハPを保持する保持溝は、各保
持ロッド32a、32b及び32cの保持#ll38で
一組の保持溝を構成12、具体例では保持ロッド32b
及び32cの保持溝38と上記保持溝38よシ上下方向
若干下方に位置する保持ロッド32aの保持WII3 
BKより一組の保持溝を構成する。挿入する際には、半
導体ウェーハPは第1図I/Cおいて矢印40で示す方
向(詳しくは、第1図VCおいて右上方から左下方に若
干傾斜する方向)K挿入され、かく挿入されると、第1
図及び第3図に二点鎖線で示す如く、略円板状の各半導
体ウェーハPの周縁部は、周方向に内隅を置いた3個の
位置で支持される。かかる支持状態においては、各半導
体ウェーハPは、卯、1図から明らかな如く、その自由
端部(挿入側端部)が上方忙向かって傾斜する状態に保
持され、従って支持具から半導体ウェーハPが偶発的忙
脱落することが充分に防止される。
When performing a diffusion process on a plurality of semiconductor wafers using the vertical support, the holding rods 32 a, 32 b, and 32
The semiconductor wafer P is inserted into the holding groove 38 in which the ClC is formed. The holding grooves that hold the semiconductor wafer P constitute a set of holding grooves 12 with the holding rods 32a, 32b, and 32c holding #ll38, and in the specific example, the holding grooves 12 are formed by holding rods 32a, 32b, and 32c.
and the holding groove 38 of 32c and the holding WII3 of the holding rod 32a located slightly below the above-mentioned holding groove 38 in the vertical direction.
A set of holding grooves is constructed from BK. When inserting the semiconductor wafer P, the semiconductor wafer P is inserted in the direction shown by the arrow 40 in the I/C of FIG. When it is done, the first
As shown by two-dot chain lines in the drawings and FIG. 3, the peripheral edge of each substantially disk-shaped semiconductor wafer P is supported at three positions with inner corners placed in the circumferential direction. In this supported state, each semiconductor wafer P is held in such a state that its free end (insertion side end) is inclined upwardly, as is clear from FIG. Accidental omission due to busy work is sufficiently prevented.

次いで、それ自体は公知の懸架器具(図示せず)によつ
1端部材6aに設けられた懸架手段26の懸架部を係止
して支持具を吊シ上げ、かかる懸架状態のままで縦型拡
散炉内に収容する。上記拡散炉内においては、半導体ウ
ェーハル6保持する支持具は懸架状態に維持される。
Next, the suspension part of the suspension means 26 provided on the one end member 6a is locked by a suspension device (not shown) which is known per se, and the support is lifted up and vertically maintained in the suspended state. It is housed in a type diffusion furnace. Inside the diffusion furnace, the support holding the semiconductor wafer 6 is maintained in a suspended state.

拡散炉内での拡散処理が終了すると、上記支持具は拡散
炉から取出され、しかる後支持具から半導体ウェーハP
が取出される。半導体ウェーハPの取出しはその挿入方
向とは半対方向に移動せ1゜めることKよって遂行する
ことができる。
When the diffusion process in the diffusion furnace is completed, the support is taken out from the diffusion furnace, and then the semiconductor wafer P is removed from the support.
is taken out. The semiconductor wafer P can be taken out by moving the semiconductor wafer P by 1° in a direction half opposite to its insertion direction.

拡散処理後の支持具の洗浄処理或いは運搬の際には、必
要に応じて、支持具を支持具本体2と保持ロッド32a
、32b及び32cとホルダ部材44.54及び64と
に分解することができる。
When cleaning or transporting the support after the diffusion process, the support may be separated from the support main body 2 and the holding rod 32a as necessary.
, 32b and 32c and holder members 44, 54 and 64.

かかる分解は、上述した組付は手順を逆圧遂行すればよ
い。
Such disassembly can be accomplished by performing the assembly procedure described above under reverse pressure.

上述した第1の具体例の支持具においては、次の通りの
利点が得られる。まず、支持具本体2に支持手段4を構
成する保持ロッド32a、32b及び32cが着脱自在
に組付けられている故に、大きな熱変化或いは衝撃によ
って破損lまた場合にも、破損I、た部品のみを新しい
部品に交換して使用を続けることができる。また、保持
ロッド32a。
The support of the first specific example described above provides the following advantages. First, since the holding rods 32a, 32b, and 32c constituting the support means 4 are removably attached to the support body 2, even if they are damaged by a large thermal change or impact, only the damaged parts can be damaged. You can continue using the product by replacing it with a new part. Also, a holding rod 32a.

32b及び32cの一端側が片方の端部材6aK着脱自
在に支持されそれらの各他端側が他方の端部材6bK着
脱自在に且つ上下方向KK位自在に保持されている故に
、拡散炉内で高温に晒されても保持ロッド32a、32
b及び32cと支持具本体2間に熱応力が発生せず、特
に具体例のように保持ロッド32a、32b及び32c
と支持具本体2の材質が異なってその熱膨率が異なって
いてもこれによつ工局部的に破損することが防止できる
。また、具体例においては、支持具本体2が石英ガラス
から形成され、保持ロッド32 a、32b及び32c
並びにホルダ部材44.54及び64がシリコンから形
成されている故に、比較的高価なシリコンの使用量を少
くすることができ、比較的安価に製作することができる
。また、シリコンから形成された保持ロッド32a、3
2b及び32Cに保持溝38を形成している故K、洗浄
処理の際に保持#138の部分が変質乃至溶融してその
幅が拡大せしめられることがなく(シリコンは洗浄液の
主成分であるフン酸とは反応しない)、長期間安定して
使用することができる。更に、衝撃が加わシやすい支持
具本体2が石英ガラスである故に、衝撃に対17ても強
い支持具を提供することができる。
Since one end side of 32b and 32c is removably supported by one end member 6aK, and each of the other end sides thereof is held so as to be removably attached to the other end member 6bK and freely in the vertical direction KK, they are exposed to high temperatures in the diffusion furnace. Even if the holding rods 32a, 32
b and 32c and the support body 2, and especially the retaining rods 32a, 32b and 32c as in the specific example.
Even if the materials of the support main body 2 are different and have different coefficients of thermal expansion, this can prevent local damage to the workpiece. Further, in a specific example, the support main body 2 is formed of quartz glass, and the holding rods 32 a, 32 b, and 32 c
Furthermore, since the holder members 44, 54 and 64 are made of silicon, the amount of relatively expensive silicon used can be reduced, and they can be manufactured at relatively low cost. Further, holding rods 32a, 3 made of silicone
Because the holding grooves 38 are formed in 2b and 32C, the holding groove 38 is prevented from changing in quality or melting during the cleaning process and expanding its width (silicon is the main component of the cleaning solution). It does not react with acids) and can be used stably for a long period of time. Furthermore, since the support main body 2, which is easily subjected to impact, is made of quartz glass, it is possible to provide a support that is 17 resistant to impact.

以上、第1の具体例の縦型支持具につい1説明し九が、
かかる支持具においては、次の如く変形乃至修正するこ
とができる。例えば、図示の具体例においては、支持手
段4を支持具本体2に着脱自在に組付けられる3本の保
持ロッド32 a、32b及び32cから構成している
が、所望ならば、2本の保持ロンド或いは4本又はそれ
以上の保持ロッドから構成することもできる。また、図
示の具体例では、下側釦位置する端部材6bに組付けら
れる各ホルダ部材44.54及び64VC中央切き46
.56及び66並びにチャンネル48 、58及び68
t−形成1.てこの中央切欠き46.56及び66並び
に中央切欠き46.56及び66とチャンネル48.5
8及び68の交差Sに保持ロッド32a、32b及び3
2cの他端側を位置付けているが、所望ならば、これに
代えて、ホルダ部材44.54及び64に保持07ド3
2a、32b及び32cの横断面に対応する貫通孔を設
け、かかる貫通孔内に各保持ロッド32a、32b及び
32cの他端側を位置付けるようにしてもよい。
The above is a description of the vertical support of the first specific example.
Such a support can be modified or modified as follows. For example, in the illustrated embodiment, the support means 4 is composed of three retaining rods 32a, 32b and 32c that are detachably assembled to the support body 2, but if desired, two retaining rods 32a, 32b and 32c may be used. It can also consist of four or more retaining rods. In addition, in the illustrated example, each holder member 44, 54 and 64VC center cut 46 is assembled to the end member 6b where the lower button is located.
.. 56 and 66 and channels 48, 58 and 68
t-formation 1. Lever central notches 46.56 and 66 and central notches 46.56 and 66 and channel 48.5
Retaining rods 32a, 32b and 3 at the intersection S of 8 and 68
2c, but if desired, the holder members 44, 54 and 64 may alternatively hold the
Through holes corresponding to the cross sections of 2a, 32b, and 32c may be provided, and the other ends of the holding rods 32a, 32b, and 32c may be positioned within the through holes.

かかる場合には、保持ロッド32a、32b及び320
の他端の案内切欠き36a、36b及び36を省略する
ことができる。また、図示の具体例では各保持ロッド3
2a、32b及び32cの一端側(上端側)が上側に位
置する端部材6alC支持されるように構成1.ている
が、これに代えて、各保持ロッド32a、32b及び3
2cの他端側(下端側)が下側に位置する端部材6bK
着脱自在に支持され、それらの一端側(上端側)が上方
に位置する端部材68に上下方向に変位自在に保持され
るようVC構成1.てもよい。かかる場合、例えば、端
部材6blC装着されるホルダ部材44a。
In such a case, retaining rods 32a, 32b and 320
The guide notches 36a, 36b and 36 at the other end can be omitted. In addition, in the illustrated example, each holding rod 3
Configuration 1. One end side (upper end side) of 2a, 32b and 32c is supported by the end member 6alC located on the upper side. However, instead of this, each holding rod 32a, 32b and 3
End member 6bK where the other end side (lower end side) of 2c is located on the lower side
VC configuration 1. is detachably supported and one end side (upper end side) thereof is held by an end member 68 located above so as to be freely displaceable in the vertical direction. It's okay. In such a case, for example, the holder member 44a to which the end member 6blC is attached.

54a及び64aK保持ロッド32a、32b及び32
cの他端が位置付けられる凹所を形成し、他方端部材6
aK装着されるホルダ部材44.54及び64に保持0
7ド32a、32b及び32cの横断面形状に対応する
貫通孔を形成すればよい(このとき、各保持ロッド32
a 、32b及び32Cの一端側の係止切欠き34a、
34b及び34cは省略することができる)。また、図
示の具体例VCおいては、端部材6a及び6bt−略格
子状に構成し、この格子状の空間部にホルダ部材44.
54及び64を着脱自在に組付けているが、これに代え
て、端部材を円形等の適宜の形状の板状VC@成し、か
かる板状の端部材に適宜の切欠き、凹所尋を形成1.″
CC保持ランド32a、32bび32C図示の具体例に
おいては、保持ロッド32 g+32b及び32a並び
にホルダ部材44,54及び64をシリコンから形成し
ているが、これに代えて、保持ロッド32a、32b及
び32cとボルダ部材44.54及び64の双方又は片
方を石英ガラス或いはシリコンカーバイドから形成l、
てもよい。
54a and 64aK retaining rods 32a, 32b and 32
form a recess in which the other end of c is positioned, and the other end member 6
aK Holder member 44, 54 and 64 to be attached 0
It is sufficient to form through holes corresponding to the cross-sectional shapes of the seven rods 32a, 32b, and 32c (at this time, each holding rod 32
a, locking notch 34a on one end side of 32b and 32C,
34b and 34c can be omitted). Further, in the illustrated example VC, the end members 6a and 6b are configured in a substantially lattice shape, and the holder member 44.
54 and 64 are detachably assembled, but instead of this, the end member is formed into a plate-like VC@ of an appropriate shape such as a circle, and the plate-like end member is provided with appropriate notches and recesses. Form 1. ″
In the specific example shown in the drawings, the CC holding lands 32a, 32b and 32C, the holding rods 32g+32b and 32a and the holder members 44, 54 and 64 are made of silicon, but instead of this, the holding rods 32a, 32b and 32c are made of silicon. and boulder member 44. Both or one of 54 and 64 are formed from quartz glass or silicon carbide.
It's okay.

次いで、第8図及び第9図を参照して、本発明に従って
構成はれた縦型支持具の第2の具体例について説明する
。第2の具体例VCおいては、保持ロッドの一端側のみ
がホルダ部材を介1.て支持具本体に組句けられている
。以下の説明においては、第1の具体例と同一の部材は
同一の参照番号を付す。
Next, a second specific example of a vertical support constructed in accordance with the present invention will be described with reference to FIGS. 8 and 9. In the second specific example VC, only one end of the holding rod is connected to the holder member 1. It is assembled into the main body of the support. In the following description, the same members as in the first specific example are given the same reference numbers.

第8図及び第9図を#揺して、図示の縦型支持具は石英
ガラス製の支持具本体2′と3本の保持ロッド32a’
32b’及び32C′から構成された支持手段4′を具
備している。支持具本体2′は2個の端部材6a及び6
bと、この端部材6a及び6b間に固定された複数本(
具体例では4本)の連結ロッド8a、8b、8c及び8
dを含んでいる。端部材6a及び6bは適宜の形状でよ
いが、第2の具体例では円板状に形成烙れている。上側
に位置する端部材5alCは、周縁部の周方向に間隔を
置いた3個所に正方形の貫通孔80a、80b及び80
cが形成され、その上面の各貫通孔80a。
8 and 9, the illustrated vertical support includes a support main body 2' made of quartz glass and three holding rods 32a'.
It is provided with support means 4' consisting of 32b' and 32C'. The support main body 2' has two end members 6a and 6.
b, and a plurality of pieces fixed between the end members 6a and 6b (
In the specific example, there are four connecting rods 8a, 8b, 8c, and 8.
Contains d. The end members 6a and 6b may have any suitable shape, but in the second specific example, they are formed into a disk shape. The end member 5alC located on the upper side has square through holes 80a, 80b and 80 at three locations spaced apart in the circumferential direction of the periphery.
c is formed, and each through hole 80a is formed on the upper surface thereof.

80b及び80cの開口部には矩形状の凹所82a。Rectangular recesses 82a are provided at the openings of 80b and 80c.

82b及び82cが形成されている。この端部材6aの
上面略中央部には略U字状の懸架部を有する懸架部材2
8から成る懸架手段26が固定されている。また、下側
に位置する端部材6bにも、周縁部の周方向に間隔を置
いた3個所に正方形の貫通孔84 a 、 84 b及
び84cが形成されている。支持具本体2′のその他の
構成については、第1の具体例の支持具本体と実質上同
一である。
82b and 82c are formed. A suspension member 2 having a substantially U-shaped suspension portion is located approximately at the center of the upper surface of this end member 6a.
Suspension means 26 consisting of 8 are fixed. Further, the end member 6b located on the lower side is also formed with square through holes 84a, 84b, and 84c at three locations spaced apart in the circumferential direction of the peripheral edge. The rest of the structure of the support body 2' is substantially the same as the support body of the first specific example.

シリコンから形成された3本の保持ロッド32aZ32
b′及び32C′の各々は実質上同一の構成であシ、具
体例では正方形の横断面形状を有12ている。
Three holding rods 32aZ32 made of silicone
b' and 32C' are each of substantially identical construction, and in the specific example have a square cross-sectional shape.

この保持o7ド32&’#32b’及び32C′の断面
形状は端部材6aVC形成された貫通孔80 a 、8
0b及び80cの断面形状と端部材6bVC形成された
貫通孔84a、84b及び84cの断面形状とに対応し
、これらの断面形状と実質上向−又はこれらの断面形状
より若干小さい。この各保持ロッド32a’、32b’
及び32c′の一端部(は段部86a、86b及び86
cが形成され、この段部86a。
The cross-sectional shape of this holding o7 door 32&'#32b' and 32C' is the through hole 80a, 8 formed in the end member 6aVC.
It corresponds to the cross-sectional shape of 0b and 80c and the cross-sectional shape of the through holes 84a, 84b and 84c formed in the end member 6bVC, and is substantially upwardly or slightly smaller than these cross-sectional shapes. These holding rods 32a', 32b'
and one end of 32c' (steps 86a, 86b and 86
c is formed, and this stepped portion 86a.

86b及び86cは横断面形状が正方形で、保持ロッド
32a’、32b’及び32c′の中間部(主部)[4
細くなっている。この各保持ロッド32 B’132b
′及び32 c’には、その−角!R1Vc長苧方向長
間方向置いて保持婢38が形成されている(保持ロッド
3’lbK形成された保持溝は図示せず)C次いで、上
記保持ロッド32 a’l 32 b’及び32C′σ
)支持具本体2′への組付様式について駅明する。
86b and 86c have a square cross-sectional shape, and are intermediate parts (main parts) [4
It's getting thinner. Each of these holding rods 32 B'132b
' and 32 c' have the -angle! R1Vc Holding grooves 38 are formed at intervals in the longitudinal direction (the holding grooves formed in the holding rods 3'lbK are not shown).
) Explain how to assemble it to the support main body 2'.

保持ロッド32a’、 32 b’及び32C′は、端
部材6avC9Il脱自在に装着されるシリコンから形
成烙れたホルダ88を介17て支持具本体2に組付けら
れる。ボルダ88は2個のブロック状のホルダ部材90
から構成されている。各ホルダ部材90は実質上同一の
構成であり、第9図に示す如く、その−側面に7字状の
切欠き92が形成されている。
The holding rods 32a', 32b' and 32C' are assembled to the support main body 2 via a holder 88 made of silicone and removably attached to the end member 6avC9Il. The boulder 88 has two block-shaped holder members 90
It consists of Each holder member 90 has substantially the same configuration, and as shown in FIG. 9, a 7-shaped notch 92 is formed on the lower side thereof.

このホルダ部材90の厚さは各保持ロッド32a’。The thickness of this holder member 90 is equal to that of each holding rod 32a'.

32b′及び32c′に形成された段部86a、86b
及び86cの幅に対応している。そして、切欠き92が
対向するように第9図に示す如く2個のホルダ部材90
を組合せすると、2個の切欠1!92によって規定され
る開口の断面形状は、各保持ロッド32a’、32b’
及び32C′の段!B86a、86b及び86cの横断
面形状に対応し、2個ホルダ部材90から成るホルダ8
8の外形が端部材6aの凹所82a、82b及び82c
の横断面形状に対応する。保持ロッド32a′は、次の
通りにして支持具本体2′に組付けられる。即ち、まず
保持ロッド32a′の段部86aに一対のホルダ部材9
0を第9図に示す如くして位置付け、次いで保持ロッド
32a′の他端側を上方から端部材6aの貫通孔80a
を通し、更にその他端部を端部材6bの貫通孔84a内
に挿入し、しかる後にホルダ部材90を端部材6aの凹
所82a内に位置付ける。
Step portions 86a and 86b formed in 32b' and 32c'
and 86c width. Then, as shown in FIG. 9, two holder members 90 are attached so that the notches 92 face each other.
When combined, the cross-sectional shape of the opening defined by the two notches 1!92 is the same as that of each holding rod 32a', 32b'
and 32C' steps! A holder 8 consisting of two holder members 90 corresponding to the cross-sectional shapes of B86a, 86b and 86c.
8 is the recess 82a, 82b, and 82c of the end member 6a.
corresponds to the cross-sectional shape of The holding rod 32a' is assembled to the support main body 2' as follows. That is, first, a pair of holder members 9 are attached to the stepped portion 86a of the holding rod 32a'.
0 as shown in FIG. 9, and then insert the other end of the holding rod 32a' into the through hole 80a of the end member 6a from above.
is passed through, and the other end is inserted into the through hole 84a of the end member 6b, and then the holder member 90 is positioned within the recess 82a of the end member 6a.

かくすると、一対のホルダ部材90から成るホルダ88
は凹部82aの底面上VC@置され、その横方向の移動
は凹所82aの側面によって阻止され、ホルダ88は所
要の通シに端部材6alC着脱自在に組付けられる。更
に、かくすると、保持ロッド32a′の一端側において
は、段部86aKホルダ部材90が位B+jけられてい
る故に、段部86aに隣接してそのすぐ外側に存在する
部分の周縁部がホルダ部材900段部に載置されて下方
への落下が阻止され、切欠き92を規定する面によって
横方向への移動が阻止され、ホルダ88を介l、て充分
安定に端部材6aK着脱自在に支持される。
In this way, the holder 88 consisting of the pair of holder members 90
is placed on the bottom surface of the recess 82a, and its lateral movement is prevented by the side surface of the recess 82a, and the holder 88 is removably attached to the end member 6alC in a required hole. Furthermore, since the step portion 86aK holder member 90 is positioned B+j on the one end side of the holding rod 32a', the peripheral edge of the portion adjacent to and immediately outside the step portion 86a is the holder member. The end member 6aK is placed on the step 900 to prevent it from falling downward, is prevented from moving in the lateral direction by the surface defining the notch 92, and is supported in a sufficiently stable manner via the holder 88 so that the end member 6aK can be attached and detached. be done.

また、保持ロッド32aの他端側においては、その他端
部が端部材6bの貫通孔84a内に位置する故に1貫通
孔84aを規定する側面によってその横方向の移動が阻
止され、端部材6bK対I2て上下方向に変位自在に且
つ着脱自在に保持される。
Further, on the other end side of the holding rod 32a, since the other end portion is located in the through hole 84a of the end member 6b, its lateral movement is prevented by the side surface defining one through hole 84a, and the end member 6bK is prevented from moving in the lateral direction. I2 is held so as to be vertically displaceable and detachable.

保持ロッド32b′及び320′も保持ロッド32a′
と同様にして支持具本体2’[着脱自在に組付けられる
。即ち、保持ロッド32b′は、一端側か凹所82bに
装着されるホルダ88を介して端部材6aK着脱自在に
組付けられ、他端側か端部材6bの貫通孔84b内に上
ド方向に変位自在に保持され、また保持ロッド320′
も、一端側が凹所82CVc装着されるホルダ88を介
し1端部材6aに着脱自在に組付けられ、他端側か端部
材6bの貫通孔84c内に上下方向に変位自在に保持さ
れる。
Holding rods 32b' and 320' are also holding rods 32a'.
The support main body 2' is detachably assembled in the same manner. That is, the holding rod 32b' is detachably attached to the end member 6aK via the holder 88 attached to the recess 82b on one end side, and is inserted upward into the through hole 84b of the end member 6b on the other end side. The holding rod 320' is held movably.
Also, one end side is removably assembled to one end member 6a via a holder 88 which is attached to the recess 82CVc, and the other end side is held movably in the vertical direction in the through hole 84c of the end member 6b.

かくの通#)Kして保持ロッド32 a’ + 32 
b’及び32c′が支持具本体2′に組付けられると、
第8図及び第9図から容易に理解される如く、保持ロア
)”32a’、32b’及び32c′の角部に形成きれ
た保持溝38は支持具の内側に位置し、保持ロッド32
8′は矢印94(第8図)で示す半導体ウェーハ又はそ
の類似物の装着方向に見て他の保持ロッド32b′及び
320′よシも後方でしかもこの保持ロッド32b′及
び320′の中間に位置する。更に、保持口7ド32”
532b’及び320′は端部材6a及び6bを相互に
実質上平行に上下方向に延び、保持ロッド32b′の保
持溝38と保持ロッド32c′の保持溝38とが横方向
に整合して位置し、保持ロッド328′の保持#1J3
8は保持ロッド32b′及び320′の保持溝38より
上下方向若干下方に位置する。
#) K and holding rod 32 a' + 32
When b' and 32c' are assembled to the support main body 2',
As can be easily understood from FIGS. 8 and 9, the retaining grooves 38 formed at the corners of the retaining rods "32a', 32b' and 32c' are located inside the support, and the retaining rods 32
8' is located rearward of the other holding rods 32b' and 320' and intermediately between these holding rods 32b' and 320', as viewed in the direction of mounting a semiconductor wafer or the like as indicated by arrow 94 (FIG. 8). To position. Furthermore, the holding port 7 do 32"
532b' and 320' extend vertically through end members 6a and 6b substantially parallel to each other, and are positioned in lateral alignment with retaining grooves 38 of retaining rod 32b' and retaining rod 32c'. , retention rod 328' retention #1J3
8 is located slightly below the holding grooves 38 of the holding rods 32b' and 320' in the vertical direction.

上記支持具T/Cオいても半導体ウェーハPは矢印94
で示す方向(詳しくは第8図において右上方から左下方
に若干傾斜する方向)IIC挿入され、かく挿入される
と、第8図に二点鎖線で示す如く、半導体ウェーハPは
周縁部の周方向に内隅を置いた3個の位置が各保持ロッ
ド32a’、32b’及び320′の保持溝38内に支
持され工その自由端部が上方に向かって佃斜する状態に
保持される。かくの通りであるので、この第2の具体例
の支持具においても、即11の具体例の支持具と実質上
同様の効果が達成される。
Even if the support T/C is on, the semiconductor wafer P remains at the arrow 94.
The IIC is inserted in the direction shown by (specifically, the direction slightly inclined from the upper right to the lower left in FIG. 8), and when it is inserted in this way, the semiconductor wafer P moves around the periphery as shown by the two-dot chain line in FIG. Three locations with inner corners in the direction are supported within the retaining grooves 38 of each retaining rod 32a', 32b' and 320' so that the free ends of the rods are retained in an upwardly inclined position. As described above, the support of the second specific example achieves substantially the same effect as the support of the eleventh specific example.

以上、第2の具体例の縦型支持具について股引したが、
かかる具体例においても次の如く変形乃至修正すること
ができる。例えば、第2の具体例においても、支持手段
4′を支持具本体2′(着脱自在に組付けられる3本の
保持ロッド32 a’、32b’及び32c′から構成
しているが、所望ならば、2本の保持ロンド或いは4本
又はそれ以上の保持ロッドから構成することもできる。
Above, we have discussed the vertical support of the second specific example.
Such a specific example can also be modified or modified as follows. For example, in the second specific example as well, the support means 4' is composed of the support main body 2' (three holding rods 32a', 32b' and 32c' which are detachably assembled, but if desired, For example, it may consist of two holding rods or four or more holding rods.

また、第2の具体例においては、V字状の切欠き92を
有する一対のホルダ部材9oを介して各仰持ロッド32
a’。
In the second specific example, each supine rod 32 is
a'.

32b′及び320′の一端部(上端部)を端部材6&
に着脱自在に組付けているが、これに代えて、端部材6
aK適宜の切欠き、凹所等を形成し、かかる切欠き、凹
所等に着脱自在に紹付けられる適宜の形態のホルダを介
して各保持ロッド32 a’ 。
One end (upper end) of 32b' and 320' is connected to the end member 6&
However, instead of this, the end member 6
aK Each holding rod 32 a' is formed with an appropriate cutout, recess, etc., and is inserted into the cutout, recess, etc. through a holder of an appropriate form that can be detachably inserted.

32b′及び320′を端部材6aに着脱自在に組付け
ることもできる。また、第2の具体例においては、各保
持ロッド32a’、32b’及び32C′の一端側が常
時ホルダ88を介して端部材6aK支持される構成であ
るが、所望により、保持ロッド32a′のみを上下方向
に所定範囲に渡って移動自在となるように支持具本体2
′に組付け、支持具が保持台上罠載置される状態におい
ては保持ロッド32a′の他端が保持台によシ支持され
、支持具が懸架された状態におい1は保持ロッド32a
′の一端側が端部材6aに支持されるようVc嘴成する
こともできる。かかる場合、支持具が載置された状態に
おいては、各保持ロッド32a’+32b’及び32C
′の保持$138が横方向vc整合し、懸架状態におい
ては保持ロッド328′の保持IW38が保持ロッド3
2 b2び32c′の保持#I38より上下方向若干下
方に位置するようにするのが好ましい。また、第2の具
体例においては、各保持ロッド32 a’。
32b' and 320' can also be detachably assembled to the end member 6a. In the second specific example, one end side of each of the holding rods 32a', 32b', and 32C' is always supported by the end member 6aK via the holder 88, but if desired, only the holding rod 32a' may be supported. The support body 2 is configured to be movable over a predetermined range in the vertical direction.
When the support is mounted on the holding table, the other end of the holding rod 32a' is supported by the holding table, and when the support is suspended, the holding rod 32a' is attached to the holding rod 32a.
It is also possible to form a Vc beak so that one end side of ' is supported by the end member 6a. In such a case, each holding rod 32a'+32b' and 32C
'The holding IW38 of the holding rod 328' is aligned with the lateral vc in the lateral direction, and in the suspended state, the holding IW38 of the holding rod 328' is aligned with the holding rod 3
2b2 and 32c' is preferably located slightly below the holding #I38 in the vertical direction. Moreover, in the second specific example, each holding rod 32 a'.

32b′及び32C′の一端側(上端側)がホルダ88
を介して端部材6aK支持され、それらの他端−(下端
側)が端部材6b[上下方向に変位自在に保持されるよ
うICW!成しているが、これに代えて、各保持ロッド
32a’、32b’及び32c′の他端側か端部材6b
K着脱自在に支持され、それらの各一端部が端部材6a
に上下方向に変位自在に保持されるように構成17ても
よい。かかる場合、例えば、端部材6bの上面に各保持
ロッド32a’、32b′及び32C′の他端が位置付
けられる凹所を形成し、他方端部材6aに各保持ロッド
32 a’+ 32 b’及び32c′の横断面形状に
対応する貫通孔を形成すればよい(このとき、保持ロッ
ド32 a’ 、32b’及び32c′を支持するホル
ダ並びに各保持ロッド32a’、32b’及び32c′
の一端側の段N86a。
One end side (upper end side) of 32b' and 32C' is the holder 88.
The end member 6aK is supported via the end member 6aK, and the other end (lower end side) of the end member 6aK is supported by the end member 6b [ICW! However, instead of this, the other end side of each holding rod 32a', 32b' and 32c' or the end member 6b
K is detachably supported, and each one end thereof is an end member 6a.
The configuration 17 may be such that it is held movably in the vertical direction. In such a case, for example, a recess in which the other end of each of the holding rods 32a', 32b', and 32C' is positioned is formed on the upper surface of the end member 6b, and each of the holding rods 32a'+32b' and What is necessary is to form a through hole corresponding to the cross-sectional shape of 32c' (at this time, the holder supporting the holding rods 32a', 32b' and 32c' and the respective holding rods 32a', 32b' and 32c'
Step N86a on one end side.

86b及び86cは省略することができる)。また、第
2の具体例においては、保持ロッド32 a’。
86b and 86c can be omitted). Moreover, in the second specific example, the holding rod 32 a'.

32b′及び32c′並びにホルダ88をシリコンから
形成17ているが、これに代えて、保持ロッド32” 
+ 32 b’及び32C′とホルダ88の双方は片方
と石英ガラス或いはシリコンカーバイドから形成しても
よい。
32b' and 32c' and the holder 88 are made of silicone 17, but instead of this, the retaining rod 32''
+ 32b' and 32C' and holder 88 may each be formed from quartz glass or silicon carbide.

次に、第11図乃至第18図を参照して、本発明に従っ
て構成された縦型支持具の第3の具体例について説明す
る。主として第10図乃至第13図を参照l、て、図示
の縦型支持具は石英ガラス製の支持具本体!とこの支持
具本体2#に着脱自在に装着されるシリコン製の支持手
段4′を具備している。支持具本体2′は、第13図に
示す如(、間隔を置いて配設された2個の端部材6a及
び6bと、この端部材6a及び6 brsiic固定さ
れた複数体(具体例では4本)の連結ロッド8a、8b
、gc及び8dを含んでいる。端部材6a及び6bは適
宜の形状でよいが、第3の具体例では略円板状に形成さ
れている。下側に位置する端部材6bの上面には、第1
2−B図及び第13図に示す如く、−縁部、詳しくは半
導体ウェーハ又はその類似物の矢印100(第10図)
で示す装着方向に見て後方の部分に突出部102が設け
られている。この突出部102の内面略中央部には略V
字状の凹所104が形成され、凹所104の側面104
a及び104bは位置付は面を規定する。端部材6bの
上面略中央部には、更に、間隔を置いて一対の短ロツド
106a及106bが設けられている。短ロッド106
a及び106bは石英ガラスから形成され、端部材6b
の上面に融着されている。また、上側に位置する端部材
6aの下面にも、−縁部、詳l。
Next, a third specific example of the vertical support constructed according to the present invention will be described with reference to FIGS. 11 to 18. Please mainly refer to FIGS. 10 to 13. The vertical support shown in the figure is a support made of quartz glass! A support means 4' made of silicone is provided which is detachably attached to the support body 2#. As shown in FIG. 13, the support main body 2' includes two end members 6a and 6b arranged at intervals, and a plurality of end members 6a and 6 brsiic fixed to each other (in the specific example, four connecting rods 8a, 8b
, gc and 8d. The end members 6a and 6b may have any suitable shape, but in the third specific example, they are formed into a substantially disk shape. On the upper surface of the end member 6b located on the lower side, a first
As shown in FIG. 2-B and FIG.
A protrusion 102 is provided at the rear portion when viewed in the mounting direction shown by . Approximately at the center of the inner surface of this protruding portion 102
A letter-shaped recess 104 is formed, and a side surface 104 of the recess 104 is formed.
a and 104b define a positioning surface. A pair of short rods 106a and 106b are further provided at an interval from each other approximately at the center of the upper surface of the end member 6b. short rod 106
a and 106b are formed from quartz glass, and the end member 6b
is fused to the top surface of the Also, on the lower surface of the end member 6a located on the upper side, there is an edge.

くは半導体ウェーハ又はその類似物の矢印100で示す
装着方向に見て後方の部分に突出部lO8が設けられて
いる。この突出部108の内面略中央部にも、突出部1
02と同様に、略V字状の凹所(図示せず)が形成され
、凹所の側面は位置付け面を規定する。端部材6aの略
中央部には、第12−A図に示す如く、細長い長孔11
0が形成され、こり長孔110の外側には横断面形状が
コ字状の懸架手段26が固定されている。N深手段は石
英ガラスから形成された懸架部材28から構成され、I
I!!架部材架部材端8材6aの上面に融着されている
。上述した通りの支持具本体2におい一’c+’z、w
JlO図、ml1図、1llz−B図Etび71413
図から理解される如く、連結ロッド8a及び8bの一端
側(上端側)が端部材6aの突出部108の下面に融着
され、それらの他端@(下端側)が端部材6bの突出部
102の上面に融着され、また、連結ロッド8c及び8
dの一端側(上端@)が端部t14’aaの下面に融着
され、それらの他端側(下端@)が端部材6bの上面に
融着されている。
In particular, a protrusion lO8 is provided in the rear part of the semiconductor wafer or the like as seen in the mounting direction indicated by the arrow 100. The protrusion 1 is also located at the approximate center of the inner surface of the protrusion 108.
Similar to 02, a generally V-shaped recess (not shown) is formed, and the sides of the recess define positioning surfaces. As shown in FIG. 12-A, approximately in the center of the end member 6a, there is an elongated hole 11.
0 is formed, and a suspension means 26 having a U-shaped cross section is fixed to the outside of the oblong hole 110. The N depth means is composed of a suspension member 28 made of quartz glass, and the I
I! ! The frame member end 8 is fused to the upper surface of the member 6a. In the support main body 2 as described above, 1'c+'z,w
JlO diagram, ml1 diagram, 1llz-B diagram and 71413
As can be understood from the figure, one end side (upper end side) of the connecting rods 8a and 8b is fused to the lower surface of the protruding part 108 of the end member 6a, and their other ends @ (lower end side) are attached to the protruding part of the end member 6b. 102 and is also fused to the top surface of connecting rods 8c and 8.
One end side (upper end @) of d is fused to the lower surface of the end portion t14'aa, and their other end side (lower end @) is fused to the upper surface of the end member 6b.

次に、主として第10図、第11図及び第12−B図を
参照1.て、支持具本体2′に着脱自在匝装着けられる
支持手段4#について説明すると、図示の支持手段4′
は、間隔を置いて配設され7’c2個の端部支持体11
2&及び112bと、この端部支持体112a及び11
2b間に装着された3本の支持ロッド114a、114
b及び114Cから構成されている。
Next, mainly refer to FIGS. 10, 11, and 12-B.1. Now, to explain the support means 4# which is removably attached to the support main body 2', the illustrated support means 4'
7'c two end supports 11 arranged at intervals.
2& and 112b, and the end supports 112a and 11
Three support rods 114a, 114 installed between 2b
b and 114C.

端部支持体L12a及び112bは実質上同一の構成で
あり、互いに組合される第1の部材116.第2の@l
x l 8、第3の部材120及び第4の部材122を
含んでいる(下方の端部支持体112bを示す第14図
及び第16図も参照されたい)。
The end supports L12a and 112b are of substantially the same construction and are assembled together with the first member 116. Second @l
x l 8, including a third member 120 and a fourth member 122 (see also FIGS. 14 and 16, which show lower end support 112b).

主として第14図及び第16図を参照して、t41.x
の部材116には、−側面、即ち外側に位置する外側面
両端部に矩形状の切欠き124(第1の部材116の一
端側は第14図に示し、その他端側は第16図に示す)
が形成され、下面一端部に全幅に渡って切欠き124の
外側端部まで存在する凹所126が形成されている(端
部支持体112aにあっては、上記凹所は第1の部材1
16の上面一端部に形成されている)。また、第2の部
材118には、−側面、即ち外側に位置する外側面両端
部に矩形状の切欠き128(第2の部材118の一端側
は第14図に示し、その他端側は第16図に示す)が形
成され、上面一端部に全幅に渡って切欠き128の外側
端atで存在する凹所130が形成されている(端部支
持体112aKあっては、上記凹所は第2の部材11B
の下面一端部に形成されている)。この第2の部材11
8の幅は、第1の部材116に形成された凹所126の
幅と実質上等しいか又はこれよシも若干小さく、また第
2の部材118に形成された凹所130の幅は第1の部
材1160幅よシ大きくなっている。また、第3の部材
120(第16図参照)の両端角部には傾斜面が形成さ
れ、両端片側の傾斜面の各々には内側に延びる矩形状の
切欠き132が形成されている。この第3の部材120
の下面には、更に、両端部及び中央部に全幅に渡って凹
所134及び136が形成されている(端部支持体11
2aにあっては、上記凹所は第3の部材の上面の両端部
及び中央部に形成されている)。更に、第4の部材12
2には、一端部(第14図参照)K断面形状が正方形で
ある貫通孔138が形成され、下面一端部に全幅に渡つ
工凹所140が形成され、上面他端部(第16@参照)
に全幅に渡って凹所142が形成されている(端部支持
体112aにおっては、一端部の凹所は第4の部材12
2の上面に形成され、他端部の凹所は14の部材122
の下面和形成されている)。第4の部材122の幅は、
第3の部材120の中央部に形成された凹所136の幅
と実質上等しいか又はこれより若干小さく、また第4の
部材122の他端部に形成された四所142の幅は、第
3の部材120の凹所137が形成づれている中間部の
幅と実質上等しいか又はこれよりも若干太きい。この第
4の部材122の一端両角部罠は傾斜面が形成され、こ
の一端の形状は端部材6aの突出部108の凹所及び端
部材6bの突出部104の凹所104の形状に対応1゜
ている。
Mainly referring to FIGS. 14 and 16, t41. x
The member 116 has a rectangular notch 124 (one end of the first member 116 is shown in FIG. 14, and the other end is shown in FIG. 16) at both ends of the outer surface located on the outside. )
is formed, and a recess 126 is formed at one end of the lower surface, extending over the entire width to the outer end of the notch 124 (in the end support 112a, the recess 126 is located in the first member 1).
16). The second member 118 also has rectangular notches 128 (one end of the second member 118 is shown in FIG. 14, the other end is shown in FIG. 14, and the other end is shown in FIG. 16) is formed, and a recess 130 that exists at the outer end at of the notch 128 is formed over the entire width at one end of the upper surface (for the end support 112aK, the recess is 2 member 11B
(formed at one end of the bottom surface). This second member 11
8 is substantially equal to or slightly less than the width of the recess 126 formed in the first member 116, and the width of the recess 130 formed in the second member 118 is substantially equal to or slightly less than the width of the recess 126 formed in the first member 116. The width of the member 1160 is larger than that of the member 1160. Further, sloped surfaces are formed at both end corners of the third member 120 (see FIG. 16), and a rectangular notch 132 extending inward is formed in each of the sloped surfaces on one side of both ends. This third member 120
Further, recesses 134 and 136 are formed in the lower surface of the end support 11 over the entire width at both ends and the center.
2a, the recesses are formed at both ends and the center of the upper surface of the third member). Furthermore, the fourth member 12
2, a through hole 138 having a square cross section is formed at one end (see FIG. 14), a recess 140 spanning the entire width is formed at one end of the lower surface, and the other end of the upper surface (16th reference)
A recess 142 is formed over the entire width (in the end support 112a, the recess at one end is formed in the fourth member 12
14 member 122 is formed on the upper surface of 2, and the recess at the other end is 122
). The width of the fourth member 122 is
The width of the recess 136 formed at the center of the third member 120 is substantially equal to or slightly smaller than this, and the width of the four recesses 142 formed at the other end of the fourth member 122 is substantially equal to or slightly smaller than the width of the recess 136 formed at the center of the third member 120. The width is substantially equal to or slightly wider than the width of the intermediate portion of the member 120 of No. 3 in which the recess 137 is formed. Both corner traps at one end of this fourth member 122 are formed with inclined surfaces, and the shape of this one end corresponds to the shape of the recess of the protrusion 108 of the end member 6a and the recess 104 of the protrusion 104 of the end member 6b.゜It's there.

第1O図、第11図、第14図及び第16図を参照し工
、端部支持体112a及び112bに組付けられる保持
ロッド114a、1i4b及び114Cについて説明す
ると、各保持ロッド114a、114b及び114Cは
円形、多角形等の適宜の横断面形状を有するものでよい
が、図示する如く正方形の横断面形状を有するものであ
るのが好ましい。保持ロッド114a、114b及び1
14cの両端部には、係止切欠きが形成されている。ま
ず、保持ロッド114aについて説明すると、保持ロッ
ド114aの両端部には、隣接する2側面(第12−B
図、第14図及び第45図において左側に位置する2側
面)を切欠いて実質上画成な平面にせしめた係止切欠き
144が形成されている(第14図及び第15図におい
て保持ロッド114aの下端部に形成された係止切欠き
144を示す)。この停止切欠@ 144が形成された
部分の横断面形状は、第15図に示す如く、正方形であ
わ、この横断面は、第1の部材116の一端部に形成さ
れた切欠き124及び第2の部材118の一端部に形成
された切欠き128の大きさと実質上等しいか又はこれ
らより若干小さい。また保止切欠き144の長手方向の
長さは、第1の部材116の凹所126が形成され一#
:、部分と第2の部材118の凹所】30が形成された
部分と第4の部材122の凹所140が形成された部分
を重ね合わせた際のこれらの厚さと実質上等しいか又は
これらの厚さよシも若干太ききい。更に、この保持ロッ
ド114aの横断面は、wJ4の部材122に形成され
た貫通孔138の大きさと実質上等しいか又はこれより
若干小濾い。
Referring to FIGS. 1O, 11, 14, and 16, the holding rods 114a, 114b, and 114C assembled to the end supports 112a and 112b will be described. may have an appropriate cross-sectional shape such as circular or polygonal, but preferably has a square cross-sectional shape as shown. Retaining rods 114a, 114b and 1
Locking notches are formed at both ends of 14c. First, to explain the holding rod 114a, two adjacent side surfaces (the 12th-B
A locking notch 144 is formed by cutting out the two side surfaces located on the left side in FIGS. 14 and 45 to form a substantially defined plane (in FIGS. 114a). The cross-sectional shape of the portion where this stop notch @ 144 is formed is square, as shown in FIG. The size of the notch 128 formed in one end of the member 118 is substantially equal to or slightly smaller than the size of the notch 128 formed at one end of the member 118. Further, the length of the retaining notch 144 in the longitudinal direction is equal to the length of the recess 126 of the first member 116.
, the thickness of the portion where the recess 140 of the fourth member 122 is formed, or the thickness of the portion where the recess 140 of the fourth member 122 is overlapped. The thickness is also a little thick. Furthermore, the cross section of this holding rod 114a is substantially equal to or slightly smaller than the size of the through hole 138 formed in the member 122 of wJ4.

かくの通シの保持ロッド114aには、中間部の一角部
(第12−B図、第14図及び第15図に卦いて右側に
位置する角部)に長手方向に間隔を置いて複数個の保持
ll1146が形成されている。保持ロッド114bに
ついて説明すると、保持ロッド114bの両端部には、
−側面(第12−B図、第16図及び第17図において
左側に位置して内側に面する側面)を切欠いて実質上垂
直表子面にせ1、めた係止切欠き148が形成されてい
る(第16図及び第17図において保持ロッド114b
の下端部に形成された係止切欠き148を示す)。この
保止切欠き148が形成された部分の横断面形状は、第
17図に示す如く、矩形状であり、この横断面は第2の
部材118の他端部に形成された切欠き128の大きさ
と実質上等l、いか又はこれよシ若干小さい。また、係
止切欠き148の長手方向の長さは、第2の部材118
の他端部と第3の部材120の一端側の凹所134が形
成場れた部分を重ね合わせた際のこれらの厚さと実質上
等1゜いか又はこれらの厚さより若干大きい。更に、こ
の保持ロッド114b17)1辺は第3の部材120の
一端部に形成されたり欠き1320幅と実質上等しいか
又はこれより若干小さく、また切欠き132の底面まで
の深さよりも小さい。かくの通りの保持ロッド114b
にも、中間部の一角部(第12−B図及び第17図にお
い1上側に位置する角部)に長手方向に間隔を置いて複
数個の保持溝146が形成されている(第11図参照)
。更に、保持ロッド114Cについ工説明すると、保持
ロッド114Cの両端部には、−側面(第12−B図、
第16図及び第17図において左側に位1’1.て内側
に面する側面)t−切欠いて実質上垂直な平面にせしめ
た係止切欠き150が形成されている(第16図及び9
17図において保持ロッド1140の下端部に形成され
た係止切欠きl 5(l示す)。この保止り久き150
が形成された部分の横断面形状は、第18図に示す如く
、矩形状であり、この横断面は第1の部材116の他端
部に形成された切欠き124の大きさと実質上等しいか
又はこれよシ若干小さい。また、係止り欠き150の長
手方向の長さは、第1の部材116の他端部と第3の部
材120の他端側の凹所134が形成された部を重ね合
わせた際のこれらの厚さと実質上等1.いか又はこれら
の厚さより若干大きい。更に、保持ロッド114cの1
辺は第3の部材120の他端部に形成された切欠き13
2の幅と実質上等しいか又はこれより若干小さく、また
切欠き132の底面までの深さよりも小さい。かくの通
シの保持ロッド114cにも、中間部の一角l!1ll
(第12−B図及び第18図において下側に位置する角
部)に長手方向に間隔を置いて複数個の保持溝146が
形成されている(第11図参照)。
The holding rod 114a of this through hole has a plurality of rods arranged at intervals in the longitudinal direction at one corner of the intermediate part (the corner located on the right side in Figures 12-B, 14, and 15). A retainer 1146 is formed. To explain the holding rod 114b, at both ends of the holding rod 114b,
- A locking cutout 148 is formed by cutting out a side surface (the side surface located on the left side and facing inward in FIGS. 12-B, 16, and 17) to form a substantially vertical surface surface. (In FIGS. 16 and 17, the holding rod 114b
(showing a locking notch 148 formed in the lower end of the holder). The cross-sectional shape of the portion where this retaining notch 148 is formed is rectangular, as shown in FIG. It's practically the same size as the squid, but slightly smaller than the squid. Further, the length of the locking notch 148 in the longitudinal direction is the same as that of the second member 118.
The thickness is substantially equal to or slightly larger than the thickness of the other end portion of the third member 120 by 1° when the portion where the recess 134 is formed on the one end side of the third member 120 is overlapped. Further, one side of this holding rod 114b17) is substantially equal to or slightly smaller than the width of the notch 1320 formed at one end of the third member 120, and is also smaller than the depth to the bottom of the notch 132. Retaining rod 114b as shown
Also, a plurality of retaining grooves 146 are formed at intervals in the longitudinal direction at one corner of the intermediate portion (the corner located on the upper side in FIG. 12-B and FIG. 17) (FIG. 11). reference)
. Furthermore, to explain the construction of the holding rod 114C, both ends of the holding rod 114C have negative sides (Fig. 12-B,
In Figures 16 and 17, the left side is 1'1. A locking notch 150 is formed in a substantially vertical plane (see FIGS. 16 and 9).
A locking notch l5 (l shown) formed in the lower end of the retaining rod 1140 in FIG. This hold is long 150
The cross-sectional shape of the portion where is formed is rectangular, as shown in FIG. Or this one is slightly smaller. Further, the length in the longitudinal direction of the locking notch 150 is the length when the other end of the first member 116 and the part where the recess 134 is formed at the other end of the third member 120 are overlapped. Thickness and substantially equal 1. Squid or slightly larger than these. Furthermore, one of the holding rods 114c
The side is a notch 13 formed at the other end of the third member 120.
2 or slightly smaller than this, and also smaller than the depth to the bottom of the notch 132. Also in the holding rod 114c of this through hole, there is a corner l of the middle part! 1ll
A plurality of holding grooves 146 are formed at intervals in the longitudinal direction (at the lower corner in FIGS. 12-B and 18) (see FIG. 11).

上記保持ロッド114B、114b及び114ctびに
第1の部材116、第2の部材118、詑3の部材12
0及び第4の部材122は、以下の如くして着脱自在九
組立てられて支持手段4′を網成する。第12図と共に
第14図及び第16図を参照1〜で、支持手段4#の下
部側の装着様式につい1説明すると、まず、組立台(図
示せず)上に第4の部材122を載置し、この第4の部
材122の他端部に第3の部材120を第12−B図に
示す如く紹付ける。かくすると、第3のS材120の下
面に形成された凹所136がwJ4の部材122の上面
に形成された凹所142に保合し、第3の部材120は
所要の通シに組付けられる。次に、第40部材122の
一端部に形成された貫通孔138に保持ロッド114a
の下端部を挿入すると共に第3の部材120の一端部に
形成されたり欠き132に保持ロッド114bの下端部
を挿入し、しかる後保持ロッド1】4a及び114b間
VC第2の部材118を組付ける。第2の部材118の
組付けは、一端部に形成された切欠きl 28f:保持
ロッド114aの係止り欠き144が形成された部分に
係合させると共に他端部に形成された切欠き128を保
持ロッド114bの係止切欠き148が形成された部分
に併合させることによって達成される。
The holding rods 114B, 114b and 114ct, the first member 116, the second member 118, and the member 12 of the bush 3
0 and the fourth member 122 are removably assembled to form the support means 4' as follows. Referring to FIGS. 14 and 16 together with FIG. 12, to explain how to attach the lower part of the support means 4#, first, place the fourth member 122 on an assembly table (not shown). Then, the third member 120 is introduced to the other end of the fourth member 122 as shown in FIG. 12-B. In this way, the recess 136 formed on the lower surface of the third S member 120 is fitted into the recess 142 formed on the upper surface of the wJ4 member 122, and the third member 120 is assembled into the required hole. It will be done. Next, the holding rod 114a is inserted into the through hole 138 formed at one end of the 40th member 122.
At the same time, insert the lower end of the holding rod 114b into the notch 132 formed at one end of the third member 120, and then assemble the VC second member 118 between the holding rods 1/4a and 114b. wear. The second member 118 is assembled by engaging the notch 128f formed at one end with the portion of the holding rod 114a where the locking notch 144 is formed, and by engaging the notch 128 formed at the other end. This is achieved by merging the retaining rod 114b into the portion where the locking notch 148 is formed.

次いで、第3の部材の他端部に形成された切欠き132
に保持ロッド114cの下端部を挿入し、しかる後保持
ロッド114a及び114c間に第1の部材116を組
付ける。この第1の部材1160組付けは、一端部に形
成された切欠き124を保持ロッド114aの係止切欠
き144が形成された部分に係合させると共罠他端部に
形成された切欠き124を保持ロッド114cの係止り
欠き150が形成された部分に係合させることにより工
遅成され、かく組合わせすると、第1の部材115の下
面に形成された凹所126が第2の部材】18の上面に
形成された凹所130に所要の通シvr−IIU付けら
れる。
Next, a notch 132 formed at the other end of the third member
The lower end of the holding rod 114c is inserted into the holding rod 114c, and then the first member 116 is assembled between the holding rods 114a and 114c. This first member 1160 is assembled by engaging the notch 124 formed at one end with the portion of the holding rod 114a where the locking notch 144 is formed, and the notch formed at the other end of the trap. 124 is engaged with the portion of the holding rod 114c in which the locking notch 150 is formed. ] A required through hole vr-IIU is attached to a recess 130 formed on the upper surface of 18.

かくの如く組付けられると、保持ロッド114&の下端
部においては、係止切欠き144内に上側から11jに
第1の部It116、第2の部材118及び第4の部材
122が位置付けられ、係止り欠き144を規定する内
側面(上側面)と第】の1iBIJ116の上面によっ
て保持ロッド114aの下方への移動が阻止され、係止
切欠きを規定する外側面(下側面)と第4の部@122
の下面によって保持ロッド114aの上方への移動が阻
止される(かかる状態においては、保持ロッド114a
は、保止切欠き144が形成された部分の外側の2側面
、即ち係止切欠き144の底面が第4の部材1220貫
通孔138を規定する外側の2側面に当接する状態に保
持される)。また、保持ロッド114bの下端部におい
ては、係止切欠き148内に、上側から第2の部材11
8及び第3の部材120が位置付けられ、係止切欠き1
48を規定する内側面(上側面)と第2の部材118の
上面によって保持ロッド114bの下方への移動が阻止
され、係止切欠き14Bを規定する外側面(下側面)と
第3の部材120の下面によって保持ロッド114bの
上方への移動が阻止はれる(かかる状態においては、保
持ロッド114bは、係止り欠き148が形成された部
分の内側の側面、即ち係止切欠き148の底面が第3の
#AAl2O2切欠き132の底面に当接する状態に保
持される)。更に、保持ロッド114Cの下端部におい
又は、係止切欠き150内に、上側から第1の部材11
6及び第3の部材120が位置付けられ、係止切欠き1
50を規定する内側面(上側面)と第1の部材116の
上面によって保持ロッド114cの下方への移動が阻止
され、係止切欠き150を規定する外側面(下側面)と
第3の部材120の下面によって保持ロッド114Cの
上方への移動が阻止される(かかる状態におい工は、保
持ロッド114cは、係止切欠き150が形成された部
分の側面、即ち係止切欠き148の底面が第3の部材1
20の切欠き132の底面九当接する状態に保持される
)。かくして、保持ロッド114a、114b及び11
4C!の下端側は、第12−B図に示す如く、第1の部
材116、第2の部材118、#J3の都If4120
及び第4の&1115t122から成る端部支持体11
2bK所要の通シにし1着脱自在に組伺けられる。
When assembled in this way, the first part It116, the second member 118, and the fourth member 122 are positioned in the locking notch 144 from the upper side 11j at the lower end of the holding rod 114&, and are engaged. The downward movement of the holding rod 114a is prevented by the inner surface (upper surface) that defines the locking notch 144 and the upper surface of the 1iBIJ 116, and the outer surface (lower surface) that defines the locking notch and the upper surface of the fourth @122
The lower surface of the holding rod 114a prevents the holding rod 114a from moving upward (in such a state, the holding rod 114a
is held in such a state that the two outer side surfaces of the portion where the retaining notch 144 is formed, that is, the bottom surface of the retaining notch 144 are in contact with the two outer side surfaces defining the through hole 138 of the fourth member 1220. ). Further, at the lower end of the holding rod 114b, the second member 11 is inserted into the locking notch 148 from above.
8 and the third member 120 are positioned, and the locking notch 1
48 and the upper surface of the second member 118 prevent the holding rod 114b from moving downward, and the outer surface (lower surface) defining the locking notch 14B and the third member 120 prevents the holding rod 114b from moving upward (in this state, the holding rod 114b has the inner side surface of the portion where the locking notch 148 is formed, that is, the bottom surface of the locking notch 148 is held in contact with the bottom surface of the third #AAl2O2 notch 132). Furthermore, the first member 11 is inserted from above at the lower end of the holding rod 114C or into the locking notch 150.
6 and the third member 120 are positioned, and the locking notch 1
50 and the upper surface of the first member 116 prevent the holding rod 114c from moving downward, and the outer surface (lower surface) defining the locking notch 150 and the third member 120 prevents the holding rod 114C from moving upward (in such a state, the holding rod 114c has the side surface of the portion where the locking notch 150 is formed, that is, the bottom surface of the locking notch 148 Third member 1
20 of the notches 132 are held in contact with each other). Thus, retaining rods 114a, 114b and 11
4C! As shown in FIG. 12-B, the lower end side of the
and a fourth &1115t122 end support 11
2bK can be attached and detached as required.

支持手段4′の上部側の組付様式は、上述1.た下部側
の組付様式と略同様であシ、以下の如くして行うことが
できる。即ち、上述した如くして組付けられた保持ロッ
ド114b及び1】4Cの上端部間に第3の部It12
0を組付け、次いで保持ロッド114aの上端部に第4
のtiIl防1220貫通孔(図示せず)を位置付けて
その他端部を上方から第3の部材120の中央部に組イ
」ける。しかる後、保持ロッド114a及び114c間
に下側から第2の部材118を組付け、更に保持ロッド
114a及び114b間に下側から第1の部体116を
組付ける。
The manner of assembling the upper part of the support means 4' is as described in 1. above. It is almost the same as the assembly method for the lower part, and can be done as follows. That is, the third part It12 is located between the holding rod 114b assembled as described above and the upper end of 1]4C.
0, and then the fourth
Position the through hole (not shown) of the TiIl shield 1220 and assemble the other end into the center of the third member 120 from above. Thereafter, the second member 118 is assembled from below between the holding rods 114a and 114c, and the first member 116 is further assembled from below between the holding rods 114a and 114b.

かくすると、保持ロッド]14aの上端部においては、
その下端部と略同様に保持され、係止切欠き(図示せず
)内に上側から順IC第4の部材122、第2の部材1
18及び第1の部@’l16が位置付けられ、係止切欠
きを規定する外側面(上側面)と第4の部材122の上
面によって保持ロッド]14aの下方への相対的移動が
阻止され、係止切欠きを規定する内側面(下側面)と第
1のlB1116の下面によって保持ロッド114aの
上カヘの相対的移動が阻止される。また、保持ロッド1
14bの上端1fBにおいては、その下端部と・略同様
に保持され、係止切欠き(図示せず)内に上側から第3
の部材120及び第1の部材116が位置付けられ、係
止切欠き全規定する外側面(上側面)と第3の部材12
0の上面によって保持ロッド114bの下方への相対的
移動が阻止され、係止り欠きを規定する内側面(下側面
)と第1の部材116の下面(よって保持ロッド1]4
bの上方への相対的移動が阻止される。更に、保持ロッ
ド114cの上端部においては、その下端部と略同様に
保持され、係止切欠き(図示せず)内に上側から第3の
部材120及び第2のS材118が位置付けられ、・i
止切欠きを規定する外側面(上側面)と第3の部vf1
20の上面によって保持ロンド114cの下方への相対
的移動が阻止され、係止切欠きを規定する内側面(下側
面)と第2のe材118のF面によって保持ロッド11
41mの上方への相対的移動がfill止される。
Thus, at the upper end of the holding rod 14a,
The IC fourth member 122 and the second IC member 1 are held in a locking notch (not shown) in order from the upper side.
18 and the first part @'l16 are positioned, and the relative downward movement of the holding rod 14a is prevented by the outer surface (upper surface) defining the locking notch and the upper surface of the fourth member 122, The inner surface (lower surface) defining the locking notch and the lower surface of the first lB 1116 prevent the holding rod 114a from moving relative to the upper end. Also, holding rod 1
The upper end 1fB of the 14b is held in substantially the same way as the lower end thereof, and the third
member 120 and the first member 116 are positioned, and the outer surface (upper surface) defining the locking notch and the third member 12
The upper surface of the holding rod 114b prevents relative downward movement of the holding rod 114b, and the inner surface (lower surface) that defines the locking notch and the lower surface of the first member 116 (therefore, the holding rod 1]4
The relative upward movement of b is prevented. Further, at the upper end of the holding rod 114c, the third member 120 and the second S member 118 are held in substantially the same manner as the lower end thereof, and are positioned from above in a locking notch (not shown).・i
The outer surface (upper surface) defining the stop notch and the third portion vf1
The upper surface of the holding rod 114c prevents the holding rod 114c from moving relative downward, and the holding rod 11 is prevented from moving relative downwardly by the upper surface of the holding rod 114c.
Relative movement upwards of 41 m is stopped.

以上の如(組立てられた支持手段4’tCおいては、各
保持ロッド114a、114b及び114eは、端部支
持体112a及び112b間を上下刃向に互い平行VC
延び、各保持ロッド114B 、 114b及び114
(!に形成された保持#$146は内側に面するように
位置付けられる。そして、保持ロッド114b及び11
4Cに形成された保持溝146が横方向に整合して位置
し、保持ロッド114aに形成された保持#1146は
上記整合した保持111146よシ上下方向若干下方に
位置する。
As described above (in the assembled support means 4'tC, each of the holding rods 114a, 114b and 114e is parallel to each other in the upper and lower blade direction between the end supports 112a and 112b.
extending, each retaining rod 114B, 114b and 114
(!) The retaining rods 114b and 114b are positioned so as to face inward.
The retaining grooves 146 formed in 4C are aligned in the lateral direction, and the retainer #1146 formed in the retainer rod 114a is located slightly below the aligned retainer 111146 in the vertical direction.

上述した支持手段4′は、第10図乃至第12図に示す
如く、支持具本体iに着脱自在に装着される。更に説明
すると、支持手段4′を装着するには、まずこの支持手
段4′を若干傾斜させて支持具本体2′の連結ロッド8
a8b+8c及び8dによって規定される空間内に位置
付け、しかる後支持手段4′の下側の111部支持体1
12bを第12−B@に示す如く端部材6bの上面に載
置する。かく載置すると、支持手段4′の下端側におい
ては、端部支持体112bの[2のell l 8、第
3の部材120及び第4の部材122によつ工規定され
る空間内に片方の短ロッド106aが受け入れられ、第
1の部材116、第3の部材120及び第4の部材12
2によって規定される空間内に他方の短ロッド106b
が受け入れられ、かくして端部支持体112bは端部材
6b上の所定位置に載置される。
The above-described support means 4' is detachably attached to the support body i, as shown in FIGS. 10 to 12. To explain further, in order to install the support means 4', first tilt the support means 4' slightly so that the connecting rod 8 of the support body 2'
a8b+8c and 8d and then the lower 111 part support 1 of the support means 4'
12b is placed on the upper surface of the end member 6b as shown in 12th-B@. When placed in this manner, on the lower end side of the support means 4', one side is placed in the space defined by the second member 8, the third member 120, and the fourth member 122 of the end support 112b. short rod 106a is received, and the first member 116, the third member 120 and the fourth member 12
2 within the space defined by the other short rod 106b.
is received, thus placing the end support 112b in position on the end member 6b.

かかる載置状態においては、第12−B図から容易に理
解される如く、短ロッド106aKよって第2の部材1
28の外れる方向(第12−B図において右上方)への
移動が阻止され、短ロッド106bKよって第1の部材
116の外れる方向(第12−B図において左下方)へ
の移動が阻止され、端部支持体112bは上述した組付
状態に確実に保持される。また、この載置状態tCおい
ては、第4の部材122は一端面が端部材6bの突出部
102の凹所1041に規定する両側面104&及び1
04b並びに底面104(!に当接する位置に位置し、
第1の部材1164”!、−J[2>!突出部102の
凹所104の側面104&に当接する位置に位置し、第
2の部材118は一端面が突出11s102の凹所10
4の側面104bに当接する位置に位置する。次いで、
支持具本体2′の端部材6aの上方から長孔110を通
して略U字状の係止ロッド1520両端部を内側に突出
させ、その両端部を端部支持体112aの第1の部材i
16、第3の部材120及び第4の部材122によって
規定される空間と第2の部材118、第3の部1t12
0及び第4の部材122によって規定される空間内に挿
入する。かく挿入すると、下側の端部支持体1]2bと
同様に上側の端部支持体112aKおい工も、係止ロッ
ド152の一端f!llIcよって第1の部材116の
外れる方向への移動が阻止され、係止ロッド152の他
端部によって第2の部材11Bの外れる方向への移動が
阻止され、端部支持体1」2aも上述した組付状態に確
実に保持される。かかる状態においては、端部支持体1
12aKkいても、第4の部1122は一端面が端部材
6aの突出部108の凹所(図示せず)を規定する両側
面及び底面に当接位置に位置し、第2の部材118は一
端面が突出部108の凹所の片方の側面に当接する位置
に位置し、第1の81材116は一塙面が突出部108
の凹所の他方の側面に当接する位置に位置する。かくの
通シにして支持具本体2′に着脱自在に装着すると、支
持手段4′は第10図及び第11図に示す如く載置され
、その横方向への移動は、上側においては主として係止
ロッド152によって、また下側におい王は主とし−〔
短ロッド106&及び106bによって阻止され、支持
手段4′は確実に保持される。
In this placed state, as can be easily understood from FIG. 12-B, the second member 1 is moved by the short rod 106aK.
28 is prevented from moving in the direction in which it comes off (upper right in FIG. 12-B), and movement of the first member 116 in the direction in which it comes out (lower left in FIG. 12-B) is prevented by the short rod 106bK. The end support 112b is reliably held in the assembled state described above. In addition, in this mounting state tC, the fourth member 122 has one end surface defined in the recess 1041 of the protrusion 102 of the end member 6b, and both side surfaces 104 & 1
04b and the bottom surface 104 (!),
The first member 1164''!, -J[2>! is located at a position where it abuts the side surface 104& of the recess 104 of the protrusion 102, and the second member 118 has one end surface protruding from the recess 10 of the recess 102.
It is located at a position where it comes into contact with the side surface 104b of No. 4. Then,
Both ends of a substantially U-shaped locking rod 1520 protrude inward through the long hole 110 from above the end member 6a of the support main body 2', and both ends are connected to the first member i of the end support 112a.
16, the space defined by the third member 120 and the fourth member 122, the second member 118, and the third part 1t12
0 and the fourth member 122. When inserted in this manner, the upper end support 112aK as well as the lower end support 1]2b also move to one end f of the locking rod 152. llIc prevents the first member 116 from moving in the disengaged direction, and the other end of the locking rod 152 prevents the second member 11B from moving in the disengaged direction, and the end support 1'' 2a is also prevented from moving in the disengaged direction. It is reliably maintained in the assembled state. In such a state, the end support 1
12aKk, one end surface of the fourth portion 1122 is located in a contact position with both side surfaces and the bottom surface that define the recess (not shown) of the protruding portion 108 of the end member 6a, and the second member 118 is in contact with the bottom surface. The end surface of the first 81 material 116 is located at a position where it abuts one side of the recess of the protrusion 108 , and one side of the first 81 material 116 is in contact with the protrusion 108 .
It is located in a position that abuts the other side of the recess. When the support means 4' is removably attached to the support main body 2' in this way, the support means 4' is placed as shown in FIGS. By means of the stop rod 152, the king is also fixed on the lower side.
The support means 4' are held securely by the short rods 106& and 106b.

かくの如く支持手段41を装着すると、保持ロッド11
4aは矢印100(第10図)で示す半導体ウェーハ又
はその類似物の装着方向に見て他の保持ロッド114b
及び114eよシもの後方で且つこの保持ロッド114
 b及び114cの中間に位置する。
When the support means 41 is installed in this way, the holding rod 11
4a is another holding rod 114b viewed in the direction of mounting a semiconductor wafer or the like as indicated by arrow 100 (FIG. 10).
and 114e and behind this retaining rod 114.
It is located between b and 114c.

そして、半導体ウェーッ・は矢印100で示ず方向(詳
しくり、110図において右上方から左下方に若干傾斜
する方向)に挿入され、半導体ウェーハは周縁部の局方
向に間隔を置いた3個の位置が各保持ロッドLla、1
14b及び114cの保持溝146内に支持され1その
自由端部が上方に向かって傾斜する状態に保持される。
Then, the semiconductor wafer is inserted in the direction not shown by the arrow 100 (in detail, in the direction slightly inclined from the upper right to the lower left in FIG. The position of each holding rod Lla, 1
14b and 114c are supported within the retaining grooves 146, and the free ends thereof are held in an upwardly inclined state.

上述した支持具において支持具本体21から支持手段4
′を取外すには、上記装着手順を逆にすればよい。tf
t、、、支持手段4′を各隅成部品に分解するには、上
記組付は手順を逆にすればよ゛い。
In the above-mentioned support device, the support means 4 is connected from the support device main body 21.
To remove ', just reverse the installation procedure above. tf
In order to disassemble the support means 4' into its respective component parts, the assembly procedure described above can be reversed.

上述した第3の具体例においても、支持手段4′の端部
支持体112bが端部材6b上に支持され、その端部支
持体112aが上下方向に変位自在である故に、第1の
具体例及び第2の具体例と同様の作用効果が達成される
Also in the third specific example described above, the end support 112b of the support means 4' is supported on the end member 6b, and the end support 112a is vertically displaceable. And the same effects as the second specific example are achieved.

以上、第3の具体例の縦型支持具について説明したが、
この第3の具体例においても次の如く変形乃至修正する
ことが可能である。例えば、第3の具体例においては、
端部支持体112a及び112bを着脱自在に組合され
る第1のWi416、第2の部材118、第3の部材1
20及び第4の部材122から構成しているが、これに
代えて、適宜の形状の板状習材から病成することもでき
る。
The third specific example of the vertical support has been described above, but
This third specific example can also be modified or modified as follows. For example, in the third specific example,
The first Wi 416, the second member 118, and the third member 1 in which the end supports 112a and 112b are removably combined
20 and the fourth member 122, but instead of this, it can also be constructed from a plate-shaped material having an appropriate shape.

また、第3の具体例においては、支持手段4′を端部支
持体112a及び112bと3本の保持ロッド]]4a
、]14b及び1】4Cから隅成しているが、所望なら
ば、端部支持体112a及び】】2bと、この端部支持
体】】2a及び】】2b間を延びる2本の保持ロンド或
いは4本又はそれ以上の保持ロッドから隅成することも
できる。更に、第3の具体例においては、支持手段4′
、即ち端部支持体]]2a及び】】2b並びに保持o7
ドl]4a、11’!b及び1】4Cをシリコンから形
成しているが、これに代えて、端部支持体1】2a及び
112bと保持ロッド]]4a、]]4b及び】】4C
の双方は片方を石英ガラス或いはシリコンカーバイドか
ら形成してもよい。
In a third embodiment, the support means 4' are also combined with end supports 112a and 112b and three retaining rods]]4a
, ]14b and 1]]4C, but if desired, end supports 112a and ]]2b and two retaining ronds extending between the end supports ]]2a and ]]2b. Alternatively, it can also consist of four or more retaining rods. Furthermore, in the third embodiment, the support means 4'
, i.e. the end supports ]]2a and ]]2b and the holding o7
Do l] 4a, 11'! b and 1]4C are made of silicon, but instead of this, end supports 1]2a and 112b and retaining rods]]4a, ]]4b and ]]4C
One of the two may be made of quartz glass or silicon carbide.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に従って病成された縦型支持具の第1の
具体例を示す側面図。 第2図は、第1図の支持具を示す平面図。 第3図は、第1図におけるm−III線による断面図。 第4図は、第1図の支持具の支持具本体と保持ロッドを
示す分解斜視図。 第5図は、第4図におけるV−■綜による断面図。 第6−A図乃至第6−C図は、第1図の支持具の各ホル
ダを示す斜視図。 第7−A図及び第7−Bは、第6−A図のホルダに保持
ロッドの一端側を組付けた状態を示す断面図。 第8図は、本発明に従って構成された縦型支持具の第2
の具体例を示す側面図。 第9口拡、第8図の支持具を分解し工示す分解斜視図。 第10図は、本発明に従って構成された縦型支持具の第
3の具体例を示す側面図。 第1】図は、第10図の支持具を示す正面図。 第12−A図及び第12−B図は、夫々、第10図にお
けるΔ−ARKよる断面図及び第10図におけるn−n
、$Iによる断面図。 第13図は、第10図の支持具の支持具本体を示す斜視
図。 第14図は、第10図の支持具における支持手段の下端
部の一端側を分解して示す分解斜視図。 第15図は、第14図におけ、bXV−XV線による断
面図。 第16図は、第】0図の支持具における支持手段の下端
部の他端側を分解して示す分解斜視図。 第17図は、第16図における双II−XVII線によ
る断面図。 第18図は、第16図におけるXVI I I −XV
III線による断面図。 2.2′及び2′・・・支持具本体 4.4′及び4′・・・支持手段 6a及び6b・・・端部材 32 a * 32 b 132 c * 32 a’
I32 b’及び32c′・・・保持ロッド 38・・・保持溝 l】2&及び]]2b・・・端部支持体]]4a、1]
4b及び] 24 c−・・保持ロッド146・・・保
持溝 P・・・半導体ウェーハ 特許出願人 株式会社 テ り ニ ス コト゛・・ 
゛ 多1図 第7−A図 第6−C図 第7−B図 膝10図 第11図 第12−A図 第12−8図 第13図 第14図 秦15図 第17回 第旧図
FIG. 1 is a side view showing a first embodiment of a vertical support constructed according to the present invention. 2 is a plan view showing the support of FIG. 1; FIG. FIG. 3 is a sectional view taken along line m-III in FIG. 1. 4 is an exploded perspective view showing the support body and holding rod of the support shown in FIG. 1; FIG. FIG. 5 is a sectional view taken along the line V-■ in FIG. 4. 6-A to 6-C are perspective views showing each holder of the support of FIG. 1. 7-A and 7-B are sectional views showing a state in which one end side of the holding rod is assembled to the holder of FIG. 6-A. FIG. 8 shows a second vertical support constructed in accordance with the present invention.
FIG. FIG. 9 is an exploded perspective view showing the support shown in FIG. 8 in an exploded manner; FIG. 10 is a side view showing a third specific example of a vertical support constructed according to the present invention. 1] FIG. 1 is a front view showing the support shown in FIG. 10. Figure 12-A and Figure 12-B are a cross-sectional view taken along Δ-ARK in Figure 10 and n-n in Figure 10, respectively.
, $I. FIG. 13 is a perspective view showing the support main body of the support shown in FIG. 10. 14 is an exploded perspective view showing one end side of the lower end of the support means in the support tool of FIG. 10; FIG. FIG. 15 is a sectional view taken along line bXV-XV in FIG. 14. 16 is an exploded perspective view showing the other end side of the lower end of the support means in the support tool of FIG. 0; FIG. FIG. 17 is a sectional view taken along the line II-XVII in FIG. 16. Figure 18 shows the XVI I I -XV in Figure 16.
Sectional view taken along line III. 2.2' and 2'... Support main bodies 4.4' and 4'... Support means 6a and 6b... End member 32 a * 32 b 132 c * 32 a'
I32 b' and 32c'...Retaining rod 38...Retaining groove l]2&and]]2b...End support]]4a, 1]
4b and] 24 c--Retaining rod 146--Retaining groove P--Semiconductor wafer patent applicant Terinis Co., Ltd.
Figure 1 Figure 7-A Figure 6-C Figure 7-B Knee Figure 10 Figure 11 Figure 12-A Figure 12-8 Figure 13 Figure 14 Figure Qin 15 Figure 17 Old figure

Claims (1)

【特許請求の範囲】 1 間隔を置いて配設された2個の端部材と該端部材間
に固定された複数本の連結ロッドとを含む支持具本体と
、半導体ウェーッ・又はその類似物を支持するための支
持手段とを具備し、該支持手段の片側が片方の該端部材
に着脱自在に支持され、その他側は上下方向に変位自在
である、ことを特徴とする縦型支持具。 2、該支持手段は少々くとも2本の支持ロッドを含み、
該支持ロッドの各々には、その長手方向に間隔を置いて
半導体ウェーハ又はその類似物を支持する複数個の保持
溝が形成されている、特許請求の範囲第1項記載の縦型
支持具。 3、該支持手段は、相互に実質上平行に配設される少な
くとも3本の支持ロッドを含み、半導体ウェーハ又はそ
の類似物の装着方向に見て、少なくとも1本の該支持ロ
ッドは他方の該支持ロッドよりも後方に位置している、
特許請求の範囲第2項記載の縦型支持具。 4、該支持手段は該端部材間を延びる少なくとも3本の
該支持ロッドから構成され、該支持ロッドの各々の片側
は片方の該端部材に着脱自在に支持され、該支持ロッド
の各々の他側は他方の該端部材に上下方向に変位自在に
保持されている、特許請求の範囲第3項記載の縦型支持
具。 5、咳端部材の各々は格子状に構成されており、該支持
ロッドの各々の片側は片方の該端部材の格子状の空間部
に着脱自在に装着されたホルダを介して着脱自在に支持
され、それらの各々の他側は他方の該端部材の格子状の
空間部に着脱自在に装着されたホルダを介1.て上下方
向に変位自在に保持され工いる、特許請求の範囲第4項
記載の縦型支持具。 6、該支持手段は、間隔を置いて配設された2個の端部
支持体と該端部支持体間に装着された少なくとも3本の
該支持ロッドから構成され、片方の該端部支持体が片方
の該端部材に着脱自在に支持されている、特許請求の範
囲第3項記載の縦型支持具。 7、少なくとも3本の該支持ロッドの各々は、夫々、該
端部支持体に着脱自在に組合されている、特許請求の範
囲第6項記載の縦型支持具。 8、該支持具本体は石英ガラス製であシ、該支持手段は
シリコン製又はシリコンカーバイド製である、特i′f
請求の範囲第1項乃至第7項いずれかに記載の縦型支持
具。
[Claims] 1. A support body including two end members spaced apart and a plurality of connecting rods fixed between the end members, and a semiconductor wafer or its similar. 1. A vertical support, comprising: support means for supporting the support means; one side of the support means is removably supported by one of the end members, and the other side is movable in the vertical direction. 2. The support means includes at least two support rods;
2. The vertical support device of claim 1, wherein each of the support rods is formed with a plurality of holding grooves spaced apart along its length for supporting semiconductor wafers or the like. 3. The support means comprises at least three support rods arranged substantially parallel to each other, and when viewed in the direction of mounting the semiconductor wafer or the like, at least one of the support rods overlaps the other support rod. Located behind the support rod,
A vertical support according to claim 2. 4. The support means comprises at least three support rods extending between the end members, one side of each of the support rods being removably supported by one of the end members, and the other end of each of the support rods being removably supported by one of the end members. 4. The vertical support according to claim 3, wherein the side is held by the other end member so as to be vertically displaceable. 5. Each of the cough end members is configured in a lattice shape, and one side of each of the support rods is removably supported via a holder that is detachably attached to the lattice-shaped space of one of the end members. The other side of each of them is connected to the other end member through a holder detachably attached to the grid-like space of the other end member. 5. The vertical support according to claim 4, which is held movably in the vertical direction. 6. The support means comprises two end supports disposed at intervals and at least three support rods mounted between the end supports, one of the end supports 4. The vertical support according to claim 3, wherein the body is detachably supported by one of the end members. 7. The vertical support according to claim 6, wherein each of the at least three support rods is removably associated with the end support. 8. The support body is made of quartz glass, and the support means is made of silicon or silicon carbide, especially i'f
A vertical support according to any one of claims 1 to 7.
JP6900984A 1984-04-09 1984-04-09 Vertical supporting tool Pending JPS60213022A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6900984A JPS60213022A (en) 1984-04-09 1984-04-09 Vertical supporting tool

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6900984A JPS60213022A (en) 1984-04-09 1984-04-09 Vertical supporting tool

Publications (1)

Publication Number Publication Date
JPS60213022A true JPS60213022A (en) 1985-10-25

Family

ID=13390164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6900984A Pending JPS60213022A (en) 1984-04-09 1984-04-09 Vertical supporting tool

Country Status (1)

Country Link
JP (1) JPS60213022A (en)

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JPS63217622A (en) * 1987-03-06 1988-09-09 Toshiba Ceramics Co Ltd Silicon carbide jig for heat treatment of wafer
JPH01108926U (en) * 1988-01-14 1989-07-24
JPH01259528A (en) * 1988-04-08 1989-10-17 Hitachi Ltd Wafer supporting device for semiconductor wafer heat-treating apparatus, and semiconductor wafer heat-treating apparatus
JPH02288224A (en) * 1989-04-28 1990-11-28 Toshiba Ceramics Co Ltd Wafer boat
WO1997032339A1 (en) * 1996-02-29 1997-09-04 Tokyo Electron Limited Heat-treating boat for semiconductor wafer
KR100410982B1 (en) * 2001-01-18 2003-12-18 삼성전자주식회사 Boat for Semiconductor Manufacturing Apparatus

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JPS57169237A (en) * 1981-04-10 1982-10-18 Toshiba Ceramics Co Ltd Jig for heating silicon wafer
JPS5878423A (en) * 1981-10-16 1983-05-12 ヘルムト・ザイエル・ゲ−エムベ−ハ− Method of heat treating semiconductor article and device therefor

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JPS56165317A (en) * 1980-05-26 1981-12-18 Fujitsu Ltd Manufacture of semiconductor device
JPS57148344A (en) * 1981-03-10 1982-09-13 Nec Corp Manufacturing equipment for semiconductor
JPS57169237A (en) * 1981-04-10 1982-10-18 Toshiba Ceramics Co Ltd Jig for heating silicon wafer
JPS5878423A (en) * 1981-10-16 1983-05-12 ヘルムト・ザイエル・ゲ−エムベ−ハ− Method of heat treating semiconductor article and device therefor

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63217622A (en) * 1987-03-06 1988-09-09 Toshiba Ceramics Co Ltd Silicon carbide jig for heat treatment of wafer
JPH06105693B2 (en) * 1987-03-06 1994-12-21 東芝セラミックス株式会社 Silicon Carbide Jig for Wafer Heat Treatment
JPH01108926U (en) * 1988-01-14 1989-07-24
JPH01259528A (en) * 1988-04-08 1989-10-17 Hitachi Ltd Wafer supporting device for semiconductor wafer heat-treating apparatus, and semiconductor wafer heat-treating apparatus
JPH02288224A (en) * 1989-04-28 1990-11-28 Toshiba Ceramics Co Ltd Wafer boat
WO1997032339A1 (en) * 1996-02-29 1997-09-04 Tokyo Electron Limited Heat-treating boat for semiconductor wafer
US6062853A (en) * 1996-02-29 2000-05-16 Tokyo Electron Limited Heat-treating boat for semiconductor wafers
KR100410982B1 (en) * 2001-01-18 2003-12-18 삼성전자주식회사 Boat for Semiconductor Manufacturing Apparatus

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