JPS56116620A - Fine pattern formation - Google Patents

Fine pattern formation

Info

Publication number
JPS56116620A
JPS56116620A JP1908280A JP1908280A JPS56116620A JP S56116620 A JPS56116620 A JP S56116620A JP 1908280 A JP1908280 A JP 1908280A JP 1908280 A JP1908280 A JP 1908280A JP S56116620 A JPS56116620 A JP S56116620A
Authority
JP
Japan
Prior art keywords
substrate
eaves
eave
conductive films
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1908280A
Other languages
Japanese (ja)
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1908280A priority Critical patent/JPS56116620A/en
Publication of JPS56116620A publication Critical patent/JPS56116620A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain the second fine film patterns on only the surface of a substrate under an eave by ion etching by consisting the first film having an eave as a mask wherein the second film is evaporated. CONSTITUTION:Eaves 22 are generated by stacking positive-type 2 and negative- type 3 photoresists on a substrate 1 and by successively applying exposure and development. Next, conductive films 4 are formed as far as the surface of the substrate directly below the eaves 22 by oblique evaporation. With ion etching applied vertically and the conductive films 4 on the resist 3 and the substrate 1 removed, the conductive films 44 will be left under the eaves. The remaining width is decided by the eave width l. Minute wiring patterns 44 will be completed by removing the resists 2, 3.
JP1908280A 1980-02-20 1980-02-20 Fine pattern formation Pending JPS56116620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1908280A JPS56116620A (en) 1980-02-20 1980-02-20 Fine pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1908280A JPS56116620A (en) 1980-02-20 1980-02-20 Fine pattern formation

Publications (1)

Publication Number Publication Date
JPS56116620A true JPS56116620A (en) 1981-09-12

Family

ID=11989517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1908280A Pending JPS56116620A (en) 1980-02-20 1980-02-20 Fine pattern formation

Country Status (1)

Country Link
JP (1) JPS56116620A (en)

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