JPS5563821A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5563821A JPS5563821A JP13656878A JP13656878A JPS5563821A JP S5563821 A JPS5563821 A JP S5563821A JP 13656878 A JP13656878 A JP 13656878A JP 13656878 A JP13656878 A JP 13656878A JP S5563821 A JPS5563821 A JP S5563821A
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline
- thin film
- metal
- exposed
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP13656878A JPS5563821A (en) | 1978-11-06 | 1978-11-06 | Semiconductor device | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP13656878A JPS5563821A (en) | 1978-11-06 | 1978-11-06 | Semiconductor device | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS5563821A true JPS5563821A (en) | 1980-05-14 | 
| JPS6256670B2 JPS6256670B2 (OSRAM) | 1987-11-26 | 
Family
ID=15178287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP13656878A Granted JPS5563821A (en) | 1978-11-06 | 1978-11-06 | Semiconductor device | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS5563821A (OSRAM) | 
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS56153757A (en) * | 1980-04-30 | 1981-11-27 | Nec Corp | Semiconductor device | 
| JPS5730366A (en) * | 1980-07-30 | 1982-02-18 | Oki Electric Ind Co Ltd | Schottky transistor and manufacture thereof | 
| JPS59112655A (ja) * | 1982-12-18 | 1984-06-29 | Mitsubishi Electric Corp | 半導体装置の製造方法 | 
| JPS59161060A (ja) * | 1982-12-20 | 1984-09-11 | レイセオン カンパニ− | 半導体デバイスの製造方法 | 
| JPS6037787A (ja) * | 1983-08-11 | 1985-02-27 | Nec Corp | 半導体装置 | 
| JPS6037774A (ja) * | 1983-08-10 | 1985-02-27 | Mitsubishi Electric Corp | 半導体装置の製造方法 | 
| JPS60207375A (ja) * | 1984-03-30 | 1985-10-18 | Mitsubishi Electric Corp | 半導体装置の製造方法 | 
| JPS61160972A (ja) * | 1985-01-08 | 1986-07-21 | Nippon Gakki Seizo Kk | 半導体装置の製法 | 
| JPS6252965A (ja) * | 1985-09-02 | 1987-03-07 | Toshiba Corp | 半導体装置の製造方法 | 
| JPS62113465A (ja) * | 1985-10-16 | 1987-05-25 | テキサス インスツルメンツ インコ−ポレイテツド | シヨツトキ−・ダイオ−ドとその製法 | 
| JPS62113470A (ja) * | 1985-10-16 | 1987-05-25 | テキサス インスツルメンツ インコ−ポレイテツド | 半導体層内に形成された装置に対する端子を作る方法 | 
| JPS62183178A (ja) * | 1985-11-18 | 1987-08-11 | テキサス インスツルメンツ インコ−ポレイテツド | トランジスタ | 
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS5272586A (en) * | 1975-12-15 | 1977-06-17 | Fujitsu Ltd | Production of semiconductor device | 
| JPS5310979A (en) * | 1976-07-16 | 1978-01-31 | Mitsubishi Electric Corp | Semiconductor device and its production | 
| JPS5382275A (en) * | 1976-12-28 | 1978-07-20 | Fujitsu Ltd | Production of semiconductor device | 
- 
        1978
        - 1978-11-06 JP JP13656878A patent/JPS5563821A/ja active Granted
 
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS5272586A (en) * | 1975-12-15 | 1977-06-17 | Fujitsu Ltd | Production of semiconductor device | 
| JPS5310979A (en) * | 1976-07-16 | 1978-01-31 | Mitsubishi Electric Corp | Semiconductor device and its production | 
| JPS5382275A (en) * | 1976-12-28 | 1978-07-20 | Fujitsu Ltd | Production of semiconductor device | 
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS56153757A (en) * | 1980-04-30 | 1981-11-27 | Nec Corp | Semiconductor device | 
| JPS5730366A (en) * | 1980-07-30 | 1982-02-18 | Oki Electric Ind Co Ltd | Schottky transistor and manufacture thereof | 
| JPS59112655A (ja) * | 1982-12-18 | 1984-06-29 | Mitsubishi Electric Corp | 半導体装置の製造方法 | 
| JPS59161060A (ja) * | 1982-12-20 | 1984-09-11 | レイセオン カンパニ− | 半導体デバイスの製造方法 | 
| JPS6037774A (ja) * | 1983-08-10 | 1985-02-27 | Mitsubishi Electric Corp | 半導体装置の製造方法 | 
| JPS6037787A (ja) * | 1983-08-11 | 1985-02-27 | Nec Corp | 半導体装置 | 
| JPS60207375A (ja) * | 1984-03-30 | 1985-10-18 | Mitsubishi Electric Corp | 半導体装置の製造方法 | 
| JPS61160972A (ja) * | 1985-01-08 | 1986-07-21 | Nippon Gakki Seizo Kk | 半導体装置の製法 | 
| JPS6252965A (ja) * | 1985-09-02 | 1987-03-07 | Toshiba Corp | 半導体装置の製造方法 | 
| JPS62113465A (ja) * | 1985-10-16 | 1987-05-25 | テキサス インスツルメンツ インコ−ポレイテツド | シヨツトキ−・ダイオ−ドとその製法 | 
| JPS62113470A (ja) * | 1985-10-16 | 1987-05-25 | テキサス インスツルメンツ インコ−ポレイテツド | 半導体層内に形成された装置に対する端子を作る方法 | 
| JPS62183178A (ja) * | 1985-11-18 | 1987-08-11 | テキサス インスツルメンツ インコ−ポレイテツド | トランジスタ | 
| JPH08102469A (ja) * | 1985-11-18 | 1996-04-16 | Texas Instr Inc <Ti> | バイポーラ・トランジスタ | 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS6256670B2 (OSRAM) | 1987-11-26 | 
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