JPS5730366A - Schottky transistor and manufacture thereof - Google Patents
Schottky transistor and manufacture thereofInfo
- Publication number
- JPS5730366A JPS5730366A JP10367180A JP10367180A JPS5730366A JP S5730366 A JPS5730366 A JP S5730366A JP 10367180 A JP10367180 A JP 10367180A JP 10367180 A JP10367180 A JP 10367180A JP S5730366 A JPS5730366 A JP S5730366A
- Authority
- JP
- Japan
- Prior art keywords
- film
- collector
- substrate
- region
- width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 238000002955 isolation Methods 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
Abstract
PURPOSE:To reduce the wiring capacity, bonding capacities between the base and the collector, and bonding capacities between the collector and the substrate of a Schottky transistor by covering a polycrystalline silion film formed on an emitter region and collector and contacting region with an oxidized film. CONSTITUTION:A semiconductor substrate 21 is formed by diffusing an N<+> type buried layer 23 in a P type silicon substrate 22 and growing a silicon epitaxial layer 24 on the substrate 22. On the surfaces are formed an isolation oxidized film 37, a collector and contacting region 37, a polycrystalline silicon film 44, an emitter regions 46 and an oxidized film 47, etc. The film 44 formed on the regions 46 and 37 is covered with a n oxided film 47. In this manner, the width of the wires formed on the region 46 and 37 can be reduced in width.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10367180A JPS5730366A (en) | 1980-07-30 | 1980-07-30 | Schottky transistor and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10367180A JPS5730366A (en) | 1980-07-30 | 1980-07-30 | Schottky transistor and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5730366A true JPS5730366A (en) | 1982-02-18 |
JPS641064B2 JPS641064B2 (en) | 1989-01-10 |
Family
ID=14360247
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10367180A Granted JPS5730366A (en) | 1980-07-30 | 1980-07-30 | Schottky transistor and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5730366A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5989248A (en) * | 1982-11-11 | 1984-05-23 | Nippon Sekisoo Kogyo Kk | Method of fabricating interior decorative board for car |
JPS59121872A (en) * | 1982-12-15 | 1984-07-14 | Fujitsu Ltd | Semiconductor device |
JPS59161060A (en) * | 1982-12-20 | 1984-09-11 | レイセオン カンパニ− | Method of producing semiconductor device |
JPS6362369A (en) * | 1986-09-03 | 1988-03-18 | Nec Corp | Semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5146869A (en) * | 1974-10-18 | 1976-04-21 | Mitsubishi Electric Corp | Handotaisochino denkyoku |
JPS55903A (en) * | 1978-05-22 | 1980-01-07 | Nippon Abionikusu Kk | Instantaneous heating system thermal pressure bonding and temperature controller of re-flow unit |
JPS5563821A (en) * | 1978-11-06 | 1980-05-14 | Nec Corp | Semiconductor device |
-
1980
- 1980-07-30 JP JP10367180A patent/JPS5730366A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5146869A (en) * | 1974-10-18 | 1976-04-21 | Mitsubishi Electric Corp | Handotaisochino denkyoku |
JPS55903A (en) * | 1978-05-22 | 1980-01-07 | Nippon Abionikusu Kk | Instantaneous heating system thermal pressure bonding and temperature controller of re-flow unit |
JPS5563821A (en) * | 1978-11-06 | 1980-05-14 | Nec Corp | Semiconductor device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5989248A (en) * | 1982-11-11 | 1984-05-23 | Nippon Sekisoo Kogyo Kk | Method of fabricating interior decorative board for car |
JPS59121872A (en) * | 1982-12-15 | 1984-07-14 | Fujitsu Ltd | Semiconductor device |
JPS59161060A (en) * | 1982-12-20 | 1984-09-11 | レイセオン カンパニ− | Method of producing semiconductor device |
JPH0510827B2 (en) * | 1982-12-20 | 1993-02-10 | Raytheon Co | |
JPS6362369A (en) * | 1986-09-03 | 1988-03-18 | Nec Corp | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS641064B2 (en) | 1989-01-10 |
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