JPS55158637A - Dissolving and removing method for resist - Google Patents

Dissolving and removing method for resist

Info

Publication number
JPS55158637A
JPS55158637A JP6658179A JP6658179A JPS55158637A JP S55158637 A JPS55158637 A JP S55158637A JP 6658179 A JP6658179 A JP 6658179A JP 6658179 A JP6658179 A JP 6658179A JP S55158637 A JPS55158637 A JP S55158637A
Authority
JP
Japan
Prior art keywords
film
films
resist
irradiated
bridged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6658179A
Other languages
English (en)
Inventor
Katsumi Mori
Masao Tajima
Katsumi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6658179A priority Critical patent/JPS55158637A/ja
Publication of JPS55158637A publication Critical patent/JPS55158637A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
JP6658179A 1979-05-29 1979-05-29 Dissolving and removing method for resist Pending JPS55158637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6658179A JPS55158637A (en) 1979-05-29 1979-05-29 Dissolving and removing method for resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6658179A JPS55158637A (en) 1979-05-29 1979-05-29 Dissolving and removing method for resist

Publications (1)

Publication Number Publication Date
JPS55158637A true JPS55158637A (en) 1980-12-10

Family

ID=13320054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6658179A Pending JPS55158637A (en) 1979-05-29 1979-05-29 Dissolving and removing method for resist

Country Status (1)

Country Link
JP (1) JPS55158637A (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424020A (en) * 1977-07-26 1979-02-23 Tokyo Ouka Kougiyou Kk Method of removing resist material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424020A (en) * 1977-07-26 1979-02-23 Tokyo Ouka Kougiyou Kk Method of removing resist material

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