JPS5513957A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5513957A
JPS5513957A JP8735878A JP8735878A JPS5513957A JP S5513957 A JPS5513957 A JP S5513957A JP 8735878 A JP8735878 A JP 8735878A JP 8735878 A JP8735878 A JP 8735878A JP S5513957 A JPS5513957 A JP S5513957A
Authority
JP
Japan
Prior art keywords
layer
type
film
tableland
conducts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8735878A
Other languages
Japanese (ja)
Other versions
JPS6244432B2 (en
Inventor
Kenshin Taguchi
Yoshinari Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8735878A priority Critical patent/JPS5513957A/en
Publication of JPS5513957A publication Critical patent/JPS5513957A/en
Publication of JPS6244432B2 publication Critical patent/JPS6244432B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Light Receiving Elements (AREA)

Abstract

PURPOSE: To improve breakdown characteristics by providing a tableland-shaped projection at the center section of a GaAs layer which conducts in only one direction; then making an AlGaAs layer, which conducts in the same direction as the GaAs layer, over the entire surface; and by providing an area, that conducts in the opposite direction, which reaches the top of projection.
CONSTITUTION: A N+ type Al0.2G0.8As layer 12 and a N type GaAs layer 13 are laid on a GaAs substrate 11, thus obtaining a liquid phase epitaxial growth. Then the layer 13 is selectively etched to form a circular tableland-shaped layer 13' at its center. A N type Al0.2Ga0.8As layer 14 is made to grow the entire surface including the layer 13', and the both ends of the film 14 are covered with concentric circular thin films 15 made of Si3N4 etc. Then a P type region 16 is formed by means of diffusion process to the center of the layer 14 which includes the top of the tableland of the layer 13'; thus forming a PN junction 17 to the side face and another PN junction 17b to the bottom. On the film 15, a Si3N4 film 15' that is wider than the film 15 is covered. Then a P type electrode 18 is installed to an opening on the area 16, while the center section of the substrate 11 is removed from the reverse side, and a N type electrode 19 is stuck to the remaining reverse side.
COPYRIGHT: (C)1980,JPO&Japio
JP8735878A 1978-07-17 1978-07-17 Semiconductor device Granted JPS5513957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8735878A JPS5513957A (en) 1978-07-17 1978-07-17 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8735878A JPS5513957A (en) 1978-07-17 1978-07-17 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5513957A true JPS5513957A (en) 1980-01-31
JPS6244432B2 JPS6244432B2 (en) 1987-09-21

Family

ID=13912655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8735878A Granted JPS5513957A (en) 1978-07-17 1978-07-17 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5513957A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5572084A (en) * 1978-11-27 1980-05-30 Nippon Telegr & Teleph Corp <Ntt> Semiconductor photo-detector
JPS55162280A (en) * 1979-06-01 1980-12-17 Mitsubishi Electric Corp Photodiode
JPS56158488A (en) * 1980-05-12 1981-12-07 Mitsubishi Electric Corp Semiconductor device
JPS5723277A (en) * 1980-07-17 1982-02-06 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light-receiving element and manufacture thereof
US4656494A (en) * 1984-05-31 1987-04-07 Fujitsu Limited Avalanche multiplication photodiode having a buried structure
US4949144A (en) * 1985-09-24 1990-08-14 Kabushiki Kaisha Toshiba Semiconductor photo-detector having a two-stepped impurity profile

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5572084A (en) * 1978-11-27 1980-05-30 Nippon Telegr & Teleph Corp <Ntt> Semiconductor photo-detector
JPS6244431B2 (en) * 1978-11-27 1987-09-21 Nippon Telegraph & Telephone
JPS55162280A (en) * 1979-06-01 1980-12-17 Mitsubishi Electric Corp Photodiode
JPS56158488A (en) * 1980-05-12 1981-12-07 Mitsubishi Electric Corp Semiconductor device
JPS5723277A (en) * 1980-07-17 1982-02-06 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light-receiving element and manufacture thereof
US4656494A (en) * 1984-05-31 1987-04-07 Fujitsu Limited Avalanche multiplication photodiode having a buried structure
US4949144A (en) * 1985-09-24 1990-08-14 Kabushiki Kaisha Toshiba Semiconductor photo-detector having a two-stepped impurity profile

Also Published As

Publication number Publication date
JPS6244432B2 (en) 1987-09-21

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