JPS5586170A - Semiconductor light-receiving element - Google Patents

Semiconductor light-receiving element

Info

Publication number
JPS5586170A
JPS5586170A JP15848378A JP15848378A JPS5586170A JP S5586170 A JPS5586170 A JP S5586170A JP 15848378 A JP15848378 A JP 15848378A JP 15848378 A JP15848378 A JP 15848378A JP S5586170 A JPS5586170 A JP S5586170A
Authority
JP
Japan
Prior art keywords
type
grown
substrate
mesa type
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15848378A
Other languages
Japanese (ja)
Inventor
Nobuhiko Susa
Yoshihisa Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15848378A priority Critical patent/JPS5586170A/en
Publication of JPS5586170A publication Critical patent/JPS5586170A/en
Pending legal-status Critical Current

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  • Light Receiving Elements (AREA)

Abstract

PURPOSE: To obtain an element easily without using diffusion by the method wherein an oxide film is fitted on a semiconductor substrate, a mesa type, inverted mesa type or rectangular type window is opened here, inside this is grown laminated epitaxial layers of conduction types same as and opposite to that of the substrate, and a pn-junction is produced.
CONSTITUTION: SiO2 film 4 is coated on n+-substrate 1 by the CDV method, and here is formed by photoetching a mesa type, inverted mesa type or rectangular type window. This can be easily accomplished if an etching solution and etching conditions are properly selected. Next, inside this is grown n-type layer 2 in liquid phase or gaseous phase epitaxial growth method, and on top of this is grown p+- type layer 3; and pn-junction is formed on the boundary of layers 2 and 3. By this, it is possible to obtain a planer element without operating selective diffusion, and further the occurrence of edge breakdown without curdling is prevented.
COPYRIGHT: (C)1980,JPO&Japio
JP15848378A 1978-12-25 1978-12-25 Semiconductor light-receiving element Pending JPS5586170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15848378A JPS5586170A (en) 1978-12-25 1978-12-25 Semiconductor light-receiving element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15848378A JPS5586170A (en) 1978-12-25 1978-12-25 Semiconductor light-receiving element

Publications (1)

Publication Number Publication Date
JPS5586170A true JPS5586170A (en) 1980-06-28

Family

ID=15672716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15848378A Pending JPS5586170A (en) 1978-12-25 1978-12-25 Semiconductor light-receiving element

Country Status (1)

Country Link
JP (1) JPS5586170A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58197782A (en) * 1982-05-13 1983-11-17 Fujitsu Ltd Semiconductor light-receiving device
JPS6376383A (en) * 1986-09-13 1988-04-06 アルカテル・エヌ・ブイ Avalanche photodiode
JPH01226174A (en) * 1988-03-07 1989-09-08 Nec Corp Optoelectric integrated circuit
US5255225A (en) * 1989-04-05 1993-10-19 Hitachi, Ltd. Semiconductor integrated circuit device and memory consisting of semiconductor integrated circuit
JP2007292226A (en) * 2006-04-26 2007-11-08 Aisan Ind Co Ltd Fluid pressure restricting apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49111593A (en) * 1973-02-21 1974-10-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49111593A (en) * 1973-02-21 1974-10-24

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58197782A (en) * 1982-05-13 1983-11-17 Fujitsu Ltd Semiconductor light-receiving device
JPH0159747B2 (en) * 1982-05-13 1989-12-19 Fujitsu Ltd
JPS6376383A (en) * 1986-09-13 1988-04-06 アルカテル・エヌ・ブイ Avalanche photodiode
JPH01226174A (en) * 1988-03-07 1989-09-08 Nec Corp Optoelectric integrated circuit
US5255225A (en) * 1989-04-05 1993-10-19 Hitachi, Ltd. Semiconductor integrated circuit device and memory consisting of semiconductor integrated circuit
JP2007292226A (en) * 2006-04-26 2007-11-08 Aisan Ind Co Ltd Fluid pressure restricting apparatus

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