JPS5533031A - Light-detecting semiconductor device - Google Patents

Light-detecting semiconductor device

Info

Publication number
JPS5533031A
JPS5533031A JP10495878A JP10495878A JPS5533031A JP S5533031 A JPS5533031 A JP S5533031A JP 10495878 A JP10495878 A JP 10495878A JP 10495878 A JP10495878 A JP 10495878A JP S5533031 A JPS5533031 A JP S5533031A
Authority
JP
Japan
Prior art keywords
region
layer
impurity concentration
substrate
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10495878A
Other languages
Japanese (ja)
Other versions
JPS6222471B2 (en
Inventor
Toji Mukai
Hirobumi Ouchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10495878A priority Critical patent/JPS5533031A/en
Publication of JPS5533031A publication Critical patent/JPS5533031A/en
Publication of JPS6222471B2 publication Critical patent/JPS6222471B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Light Receiving Elements (AREA)

Abstract

PURPOSE: To improve the frequency response of light-detecting semiconductor device under a low bias voltage, by relating the thickness W(μm) of an epitaxial layer grown on a semiconductor substrate to the mean value N of impurity concentration (/cm3) in a as W≤-34.7logN+482.2.
CONSTITUTION: A π-type layer 12 is epitaxially grown at an impurity concentration of 1×1013/cm3 and a thickness of 25μm on a P-type silicon substrate 11 to which an ohmic electrode can be easily attached and whose resistivity is set at 0.01Ωcm or less so that the series resistance is reduced. An annular N-type region 131 is produced by diffusion at an impurity concentration of about 1×1019/cm3 in a prescribed part of the layer 12. An N-type region 13 having a surface impurity concentration of about 5×1019/cm3 and a smaller depth than the region 131 is produced by diffusion in a part of the layer 12 surrounded by the annular region 131. The layer 12 is then mesa-etched between the substrate 11 and both the ends of the region 131. An SiO2 film 14 is coated on the etched part. An anti-reflection film 15 is coated on the region 131. Electrodes 16 are attached to the region 131. Another electrode 17 is attached to the reverse side of the substrate 11.
COPYRIGHT: (C)1980,JPO&Japio
JP10495878A 1978-08-30 1978-08-30 Light-detecting semiconductor device Granted JPS5533031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10495878A JPS5533031A (en) 1978-08-30 1978-08-30 Light-detecting semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10495878A JPS5533031A (en) 1978-08-30 1978-08-30 Light-detecting semiconductor device

Publications (2)

Publication Number Publication Date
JPS5533031A true JPS5533031A (en) 1980-03-08
JPS6222471B2 JPS6222471B2 (en) 1987-05-18

Family

ID=14394597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10495878A Granted JPS5533031A (en) 1978-08-30 1978-08-30 Light-detecting semiconductor device

Country Status (1)

Country Link
JP (1) JPS5533031A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003023173A (en) * 2001-07-06 2003-01-24 Sumitomo Electric Ind Ltd pin TYPE LIGHT RECEIVING ELEMENT
WO2006062300A1 (en) * 2004-12-08 2006-06-15 Electronics And Telecommunications Research Institute Silicon-based light emitting diode
US7671377B2 (en) 2004-12-08 2010-03-02 Electronics And Telecommunications Research Institute Silicon based light emitting diode

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50158292A (en) * 1973-11-28 1975-12-22
JPS516494A (en) * 1974-07-05 1976-01-20 Hitachi Ltd

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50158292A (en) * 1973-11-28 1975-12-22
JPS516494A (en) * 1974-07-05 1976-01-20 Hitachi Ltd

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003023173A (en) * 2001-07-06 2003-01-24 Sumitomo Electric Ind Ltd pin TYPE LIGHT RECEIVING ELEMENT
WO2006062300A1 (en) * 2004-12-08 2006-06-15 Electronics And Telecommunications Research Institute Silicon-based light emitting diode
US7671377B2 (en) 2004-12-08 2010-03-02 Electronics And Telecommunications Research Institute Silicon based light emitting diode

Also Published As

Publication number Publication date
JPS6222471B2 (en) 1987-05-18

Similar Documents

Publication Publication Date Title
JPS5691478A (en) Manufacture of punch-through type diode
JPS5290273A (en) Semiconductor device
JPS5533031A (en) Light-detecting semiconductor device
JPS55105344A (en) Semiconductor device
JPS54155778A (en) Semiconductor device and its manufacture
JPS5473585A (en) Gate turn-off thyristor
JPS5586170A (en) Semiconductor light-receiving element
JPS5513957A (en) Semiconductor device
JPS5546555A (en) Semiconductor device
JPS5541770A (en) Zener diode
JPS5513990A (en) Semiconductor device
JPS55162263A (en) Semiconductor device
JPS5518073A (en) Manufacture of variable-capacity diode
JPS55102263A (en) Semiconductor integrated circuit
JPS56135965A (en) Semiconductor device
JPS5681984A (en) Semiconductor device
JPS55125684A (en) Semiconductor photodetector element
JPS5563879A (en) Semiconductor device
JPS5612779A (en) Zener diode
JPS55103773A (en) Semiconductor device
JPS5595374A (en) Semiconductor device
JPS55140263A (en) Surge preventive circuit for bipolar integrated circuit
JPS57206022A (en) Manufacture of semiconductor device
JPS5637622A (en) Manufacture of semiconductor device
JPS5466084A (en) Manufacture of varactor diode