JPS54145537A - Preparation of electrophotographic image forming material - Google Patents

Preparation of electrophotographic image forming material

Info

Publication number
JPS54145537A
JPS54145537A JP5360478A JP5360478A JPS54145537A JP S54145537 A JPS54145537 A JP S54145537A JP 5360478 A JP5360478 A JP 5360478A JP 5360478 A JP5360478 A JP 5360478A JP S54145537 A JPS54145537 A JP S54145537A
Authority
JP
Japan
Prior art keywords
photoconductor layer
sih4
high frequency
forming
reaction gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5360478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6212509B2 (enrdf_load_stackoverflow
Inventor
Toshiyuki Komatsu
Yutaka Hirai
Katsumi Nakagawa
Tadaharu Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5360478A priority Critical patent/JPS54145537A/ja
Publication of JPS54145537A publication Critical patent/JPS54145537A/ja
Publication of JPS6212509B2 publication Critical patent/JPS6212509B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP5360478A 1978-05-04 1978-05-04 Preparation of electrophotographic image forming material Granted JPS54145537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5360478A JPS54145537A (en) 1978-05-04 1978-05-04 Preparation of electrophotographic image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5360478A JPS54145537A (en) 1978-05-04 1978-05-04 Preparation of electrophotographic image forming material

Publications (2)

Publication Number Publication Date
JPS54145537A true JPS54145537A (en) 1979-11-13
JPS6212509B2 JPS6212509B2 (enrdf_load_stackoverflow) 1987-03-19

Family

ID=12947480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5360478A Granted JPS54145537A (en) 1978-05-04 1978-05-04 Preparation of electrophotographic image forming material

Country Status (1)

Country Link
JP (1) JPS54145537A (enrdf_load_stackoverflow)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56115573A (en) * 1980-02-15 1981-09-10 Matsushita Electric Ind Co Ltd Photoconductive element
JPS56156834A (en) * 1980-05-08 1981-12-03 Minolta Camera Co Ltd Electrophotographic receptor
JPS56161551A (en) * 1980-05-16 1981-12-11 Canon Inc Image forming member for electrophotography
WO1982001261A1 (en) * 1980-09-25 1982-04-15 Kk Canon Photoconductive member
JPS57119362A (en) * 1981-01-17 1982-07-24 Canon Inc Photoconductive member
JPS57122446A (en) * 1981-09-24 1982-07-30 Shunpei Yamazaki Copying machine
JPS57177152A (en) * 1981-04-24 1982-10-30 Canon Inc Electrophotographic image forming material
JPS57200047A (en) * 1981-06-02 1982-12-08 Nippon Telegr & Teleph Corp <Ntt> Electrophotographic photoreceptor
JPS57202546A (en) * 1981-06-08 1982-12-11 Semiconductor Energy Lab Co Ltd Electrostatic copier
JPS5837648A (ja) * 1981-07-17 1983-03-04 プラズマ・フイジクス・コ−ポレ−シヨン グロ−放電法及び装置並びにそれにより作成された感光体デバイス
JPS58145951A (ja) * 1982-02-24 1983-08-31 Stanley Electric Co Ltd アモルフアスシリコン感光体
JPS58152255A (ja) * 1982-03-05 1983-09-09 Stanley Electric Co Ltd 電子写真用感光体
JPS593018A (ja) * 1982-06-25 1984-01-09 Hitachi Ltd プラズマデポジシヨンによるシリコン系膜の製造方法
JPS5983168A (ja) * 1982-11-05 1984-05-14 Stanley Electric Co Ltd 電子写真感光体
JPS6017451A (ja) * 1984-06-25 1985-01-29 Shunpei Yamazaki 複写機の作製方法
JPS6017452A (ja) * 1984-06-25 1985-01-29 Shunpei Yamazaki 複写機の作製方法
JPS61116361A (ja) * 1984-11-10 1986-06-03 Matsushita Electric Ind Co Ltd 電子写真感光体
US5303007A (en) * 1980-06-25 1994-04-12 Semiconductor Energy Laboratory Co., Ltd. Printing apparatus for electrostatic photocopying
JPH06202360A (ja) * 1993-10-25 1994-07-22 Semiconductor Energy Lab Co Ltd 電子写真用感光体

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647427A (en) * 1969-08-27 1972-03-07 Canon Kk Germanium and silicon additives to dual-layer electrophotographic plates
US3650737A (en) * 1968-03-25 1972-03-21 Ibm Imaging method using photoconductive element having a protective coating
JPS48102623A (enrdf_load_stackoverflow) * 1972-03-07 1973-12-24
JPS49122337A (enrdf_load_stackoverflow) * 1973-03-23 1974-11-22
JPS5020728A (enrdf_load_stackoverflow) * 1973-06-20 1975-03-05
JPS5216990A (en) * 1975-07-28 1977-02-08 Rca Corp Semiconductor device
JPS52122471A (en) * 1976-03-22 1977-10-14 Rca Corp Schottky barier semiconductor device
US4064521A (en) * 1975-07-28 1977-12-20 Rca Corporation Semiconductor device having a body of amorphous silicon
JPS5342693A (en) * 1976-09-29 1978-04-18 Rca Corp Semiconductor device including amorphous silicone layer

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650737A (en) * 1968-03-25 1972-03-21 Ibm Imaging method using photoconductive element having a protective coating
US3647427A (en) * 1969-08-27 1972-03-07 Canon Kk Germanium and silicon additives to dual-layer electrophotographic plates
JPS48102623A (enrdf_load_stackoverflow) * 1972-03-07 1973-12-24
JPS49122337A (enrdf_load_stackoverflow) * 1973-03-23 1974-11-22
JPS5020728A (enrdf_load_stackoverflow) * 1973-06-20 1975-03-05
JPS5216990A (en) * 1975-07-28 1977-02-08 Rca Corp Semiconductor device
US4064521A (en) * 1975-07-28 1977-12-20 Rca Corporation Semiconductor device having a body of amorphous silicon
JPS52122471A (en) * 1976-03-22 1977-10-14 Rca Corp Schottky barier semiconductor device
JPS5342693A (en) * 1976-09-29 1978-04-18 Rca Corp Semiconductor device including amorphous silicone layer

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56115573A (en) * 1980-02-15 1981-09-10 Matsushita Electric Ind Co Ltd Photoconductive element
JPS56156834A (en) * 1980-05-08 1981-12-03 Minolta Camera Co Ltd Electrophotographic receptor
JPS56161551A (en) * 1980-05-16 1981-12-11 Canon Inc Image forming member for electrophotography
US5303007A (en) * 1980-06-25 1994-04-12 Semiconductor Energy Laboratory Co., Ltd. Printing apparatus for electrostatic photocopying
WO1982001261A1 (en) * 1980-09-25 1982-04-15 Kk Canon Photoconductive member
JPS57119362A (en) * 1981-01-17 1982-07-24 Canon Inc Photoconductive member
JPS57177152A (en) * 1981-04-24 1982-10-30 Canon Inc Electrophotographic image forming material
JPS57200047A (en) * 1981-06-02 1982-12-08 Nippon Telegr & Teleph Corp <Ntt> Electrophotographic photoreceptor
JPS57202546A (en) * 1981-06-08 1982-12-11 Semiconductor Energy Lab Co Ltd Electrostatic copier
JPS5837648A (ja) * 1981-07-17 1983-03-04 プラズマ・フイジクス・コ−ポレ−シヨン グロ−放電法及び装置並びにそれにより作成された感光体デバイス
JPS57122446A (en) * 1981-09-24 1982-07-30 Shunpei Yamazaki Copying machine
JPS58145951A (ja) * 1982-02-24 1983-08-31 Stanley Electric Co Ltd アモルフアスシリコン感光体
JPS58152255A (ja) * 1982-03-05 1983-09-09 Stanley Electric Co Ltd 電子写真用感光体
JPS593018A (ja) * 1982-06-25 1984-01-09 Hitachi Ltd プラズマデポジシヨンによるシリコン系膜の製造方法
JPS5983168A (ja) * 1982-11-05 1984-05-14 Stanley Electric Co Ltd 電子写真感光体
JPS6017451A (ja) * 1984-06-25 1985-01-29 Shunpei Yamazaki 複写機の作製方法
JPS6017452A (ja) * 1984-06-25 1985-01-29 Shunpei Yamazaki 複写機の作製方法
JPS61116361A (ja) * 1984-11-10 1986-06-03 Matsushita Electric Ind Co Ltd 電子写真感光体
JPH06202360A (ja) * 1993-10-25 1994-07-22 Semiconductor Energy Lab Co Ltd 電子写真用感光体

Also Published As

Publication number Publication date
JPS6212509B2 (enrdf_load_stackoverflow) 1987-03-19

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