JPS5327375A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5327375A JPS5327375A JP10231476A JP10231476A JPS5327375A JP S5327375 A JPS5327375 A JP S5327375A JP 10231476 A JP10231476 A JP 10231476A JP 10231476 A JP10231476 A JP 10231476A JP S5327375 A JPS5327375 A JP S5327375A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- impurity
- injecting
- changing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W10/0126—
-
- H10W10/13—
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10231476A JPS5327375A (en) | 1976-08-26 | 1976-08-26 | Production of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10231476A JPS5327375A (en) | 1976-08-26 | 1976-08-26 | Production of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5327375A true JPS5327375A (en) | 1978-03-14 |
| JPS5436077B2 JPS5436077B2 (cg-RX-API-DMAC10.html) | 1979-11-07 |
Family
ID=14324122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10231476A Granted JPS5327375A (en) | 1976-08-26 | 1976-08-26 | Production of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5327375A (cg-RX-API-DMAC10.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2496983A1 (fr) * | 1980-12-23 | 1982-06-25 | Philips Nv | Procede de fabrication par auto-alignement d'un dispositif semiconducteur comportant un igfet de dimension tres faible |
| JPS5843563A (ja) * | 1981-08-27 | 1983-03-14 | シ−メンス・アクチエンゲゼルシヤフト | 高度集積cmos電界効果トランジスタ回路の製造方法 |
-
1976
- 1976-08-26 JP JP10231476A patent/JPS5327375A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2496983A1 (fr) * | 1980-12-23 | 1982-06-25 | Philips Nv | Procede de fabrication par auto-alignement d'un dispositif semiconducteur comportant un igfet de dimension tres faible |
| JPS5843563A (ja) * | 1981-08-27 | 1983-03-14 | シ−メンス・アクチエンゲゼルシヤフト | 高度集積cmos電界効果トランジスタ回路の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5436077B2 (cg-RX-API-DMAC10.html) | 1979-11-07 |
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