JPS5390861A - Manufacture of semiconductor element - Google Patents
Manufacture of semiconductor elementInfo
- Publication number
- JPS5390861A JPS5390861A JP598977A JP598977A JPS5390861A JP S5390861 A JPS5390861 A JP S5390861A JP 598977 A JP598977 A JP 598977A JP 598977 A JP598977 A JP 598977A JP S5390861 A JPS5390861 A JP S5390861A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- manufacture
- ion
- stoicheiometrical
- xpx
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE: To avoid the fluctuation of the stoicheiometrical composition ration and to prevent the deterioration of the element property, by performing the thermal treatment in a phosphorus atmosphere after ion injection in case the semiconductor element is manufactured by injecting ion to GaAs1-XPX.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP598977A JPS5390861A (en) | 1977-01-21 | 1977-01-21 | Manufacture of semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP598977A JPS5390861A (en) | 1977-01-21 | 1977-01-21 | Manufacture of semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5390861A true JPS5390861A (en) | 1978-08-10 |
Family
ID=11626194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP598977A Pending JPS5390861A (en) | 1977-01-21 | 1977-01-21 | Manufacture of semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5390861A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56949U (en) * | 1979-06-18 | 1981-01-07 | ||
JPS5656643A (en) * | 1979-10-13 | 1981-05-18 | Sony Corp | Treating device for semiconductor substrate |
JPS61150340A (en) * | 1984-12-25 | 1986-07-09 | Fujitsu Ltd | Manufacture of compound semiconductor device |
JPH07183306A (en) * | 1993-12-22 | 1995-07-21 | Nec Corp | Treating method of worked surface of compound semiconductor element |
-
1977
- 1977-01-21 JP JP598977A patent/JPS5390861A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56949U (en) * | 1979-06-18 | 1981-01-07 | ||
JPS5656643A (en) * | 1979-10-13 | 1981-05-18 | Sony Corp | Treating device for semiconductor substrate |
JPH0132653B2 (en) * | 1979-10-13 | 1989-07-10 | Sony Corp | |
JPS61150340A (en) * | 1984-12-25 | 1986-07-09 | Fujitsu Ltd | Manufacture of compound semiconductor device |
JPH039611B2 (en) * | 1984-12-25 | 1991-02-08 | Fujitsu Ltd | |
JPH07183306A (en) * | 1993-12-22 | 1995-07-21 | Nec Corp | Treating method of worked surface of compound semiconductor element |
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