JPS5415679A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5415679A
JPS5415679A JP8084877A JP8084877A JPS5415679A JP S5415679 A JPS5415679 A JP S5415679A JP 8084877 A JP8084877 A JP 8084877A JP 8084877 A JP8084877 A JP 8084877A JP S5415679 A JPS5415679 A JP S5415679A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
insulating film
tocontrol
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8084877A
Other languages
Japanese (ja)
Other versions
JPS571907B2 (en
Inventor
Takashi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8084877A priority Critical patent/JPS5415679A/en
Priority to GB47608/77A priority patent/GB1596184A/en
Priority to DE19772752698 priority patent/DE2752698A1/en
Priority to NL7713004A priority patent/NL7713004A/en
Publication of JPS5415679A publication Critical patent/JPS5415679A/en
Priority to US06/109,100 priority patent/US4297782A/en
Publication of JPS571907B2 publication Critical patent/JPS571907B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To form an insulating layer which features the stable and easy-tocontrol negative load by covering the insulating film to which the impurity is introduced through the recoil injection method with the second insulating film.
COPYRIGHT: (C)1979,JPO&Japio
JP8084877A 1976-11-27 1977-07-06 Manufacture of semiconductor device Granted JPS5415679A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP8084877A JPS5415679A (en) 1977-07-06 1977-07-06 Manufacture of semiconductor device
GB47608/77A GB1596184A (en) 1976-11-27 1977-11-16 Method of manufacturing semiconductor devices
DE19772752698 DE2752698A1 (en) 1976-11-27 1977-11-25 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
NL7713004A NL7713004A (en) 1976-11-27 1977-11-25 PROCESS FOR MANUFACTURING SEMI-GUIDE DEVICES.
US06/109,100 US4297782A (en) 1976-11-27 1980-01-02 Method of manufacturing semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8084877A JPS5415679A (en) 1977-07-06 1977-07-06 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5415679A true JPS5415679A (en) 1979-02-05
JPS571907B2 JPS571907B2 (en) 1982-01-13

Family

ID=13729761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8084877A Granted JPS5415679A (en) 1976-11-27 1977-07-06 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5415679A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5976213A (en) * 1982-10-25 1984-05-01 Meiji Gosei Kk Continuous intermediate member and its manufacture

Also Published As

Publication number Publication date
JPS571907B2 (en) 1982-01-13

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