JPS542667A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS542667A JPS542667A JP6748577A JP6748577A JPS542667A JP S542667 A JPS542667 A JP S542667A JP 6748577 A JP6748577 A JP 6748577A JP 6748577 A JP6748577 A JP 6748577A JP S542667 A JPS542667 A JP S542667A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- protective layer
- polybutadiene resin
- insulation layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To manufacture a semiconductor device leaving polybutadiene resin, used as a resist during its manufacture, as an insulation layer and protective layer.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6748577A JPS542667A (en) | 1977-06-08 | 1977-06-08 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6748577A JPS542667A (en) | 1977-06-08 | 1977-06-08 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS542667A true JPS542667A (en) | 1979-01-10 |
Family
ID=13346318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6748577A Pending JPS542667A (en) | 1977-06-08 | 1977-06-08 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS542667A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58134159A (en) * | 1982-01-29 | 1983-08-10 | ピーピージー・インダストリーズ・インコーポレイテッド | Elastomer coating composition |
EP0502614A2 (en) * | 1991-02-07 | 1992-09-09 | Fujitsu Limited | Thin film circuit substrate and processes for its manufacture |
US6295630B1 (en) | 1998-07-28 | 2001-09-25 | Nec Corporation | Method and apparatus for measuring an overlap length of MISFET, and a recording medium and a device model each carrying an extraction program for determining the overlap length |
-
1977
- 1977-06-08 JP JP6748577A patent/JPS542667A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58134159A (en) * | 1982-01-29 | 1983-08-10 | ピーピージー・インダストリーズ・インコーポレイテッド | Elastomer coating composition |
JPH0525916B2 (en) * | 1982-01-29 | 1993-04-14 | Ppg Industries Inc | |
EP0502614A2 (en) * | 1991-02-07 | 1992-09-09 | Fujitsu Limited | Thin film circuit substrate and processes for its manufacture |
US6110568A (en) * | 1991-02-07 | 2000-08-29 | Fujitsu Limited | Thin film circuit substrate and process for the manufacture thereof |
US6295630B1 (en) | 1998-07-28 | 2001-09-25 | Nec Corporation | Method and apparatus for measuring an overlap length of MISFET, and a recording medium and a device model each carrying an extraction program for determining the overlap length |
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