JPS5227281A - Semiconductor manufacturing process - Google Patents

Semiconductor manufacturing process

Info

Publication number
JPS5227281A
JPS5227281A JP10358575A JP10358575A JPS5227281A JP S5227281 A JPS5227281 A JP S5227281A JP 10358575 A JP10358575 A JP 10358575A JP 10358575 A JP10358575 A JP 10358575A JP S5227281 A JPS5227281 A JP S5227281A
Authority
JP
Japan
Prior art keywords
manufacturing process
semiconductor manufacturing
simplyfing
antimony
type gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10358575A
Other languages
Japanese (ja)
Other versions
JPS5526633B2 (en
Inventor
Yoichi Akasaka
Kazuo Horie
Goro Mitarai
Hiroshi Saikai
Yoshihiko Hirose
Koji Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10358575A priority Critical patent/JPS5227281A/en
Publication of JPS5227281A publication Critical patent/JPS5227281A/en
Publication of JPS5526633B2 publication Critical patent/JPS5526633B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE: To form n+-type gate regions by using antimony or arsenic ion injection, thereby simplyfing the manufacturing process and improving semiconductor characteristics.
COPYRIGHT: (C)1977,JPO&Japio
JP10358575A 1975-08-25 1975-08-25 Semiconductor manufacturing process Granted JPS5227281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10358575A JPS5227281A (en) 1975-08-25 1975-08-25 Semiconductor manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10358575A JPS5227281A (en) 1975-08-25 1975-08-25 Semiconductor manufacturing process

Publications (2)

Publication Number Publication Date
JPS5227281A true JPS5227281A (en) 1977-03-01
JPS5526633B2 JPS5526633B2 (en) 1980-07-15

Family

ID=14357839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10358575A Granted JPS5227281A (en) 1975-08-25 1975-08-25 Semiconductor manufacturing process

Country Status (1)

Country Link
JP (1) JPS5227281A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0187224U (en) * 1987-11-30 1989-06-08
US5185271A (en) * 1990-04-03 1993-02-09 U.S. Philips Corp. Method of manufacturing a buried-channel charge-coupled image sensor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0187224U (en) * 1987-11-30 1989-06-08
JPH0447632Y2 (en) * 1987-11-30 1992-11-10
US5185271A (en) * 1990-04-03 1993-02-09 U.S. Philips Corp. Method of manufacturing a buried-channel charge-coupled image sensor

Also Published As

Publication number Publication date
JPS5526633B2 (en) 1980-07-15

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