JPS51147270A - Semiconductor ic device and its manufacturing process - Google Patents
Semiconductor ic device and its manufacturing processInfo
- Publication number
- JPS51147270A JPS51147270A JP50070831A JP7083175A JPS51147270A JP S51147270 A JPS51147270 A JP S51147270A JP 50070831 A JP50070831 A JP 50070831A JP 7083175 A JP7083175 A JP 7083175A JP S51147270 A JPS51147270 A JP S51147270A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- manufacturing process
- intergrating
- mists
- mis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 102100034478 Cytokine-dependent hematopoietic cell linker Human genes 0.000 abstract 1
- 101000710210 Homo sapiens Cytokine-dependent hematopoietic cell linker Proteins 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To provide improved integration in MIS IC by intergrating MISTs having different diffusion depth in the impurity diffusing layers of sources and drains, and by preventing drop in the threshold value voltage caused by short channel length.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50070831A JPS51147270A (en) | 1975-06-13 | 1975-06-13 | Semiconductor ic device and its manufacturing process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50070831A JPS51147270A (en) | 1975-06-13 | 1975-06-13 | Semiconductor ic device and its manufacturing process |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51147270A true JPS51147270A (en) | 1976-12-17 |
Family
ID=13442904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50070831A Pending JPS51147270A (en) | 1975-06-13 | 1975-06-13 | Semiconductor ic device and its manufacturing process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51147270A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54133411U (en) * | 1978-03-09 | 1979-09-17 | ||
JPS60181054U (en) * | 1985-04-18 | 1985-12-02 | 富士通株式会社 | semiconductor storage device |
-
1975
- 1975-06-13 JP JP50070831A patent/JPS51147270A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54133411U (en) * | 1978-03-09 | 1979-09-17 | ||
JPS60181054U (en) * | 1985-04-18 | 1985-12-02 | 富士通株式会社 | semiconductor storage device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1357515A (en) | Method for manufacturing an mos integrated circuit | |
JPS5232277A (en) | Insulated gate type field-effect transistor | |
JPS5226177A (en) | Semi-conductor unit | |
JPS51147270A (en) | Semiconductor ic device and its manufacturing process | |
ES402164A1 (en) | Monolithic semiconductor device | |
JPS5469388A (en) | Junction type field effect semiconductor device and its production | |
JPS53112069A (en) | Production of mis transistor | |
JPS5211880A (en) | Semiconductor integrated circuit device | |
JPS5418683A (en) | Manufacture of semiconductor device | |
JPS53142190A (en) | Semiconductor device | |
JPS5331978A (en) | Production of complementary field effect semiconductor device | |
JPS5422785A (en) | Mis-type semiconductor memory device and its manufacture | |
JPS52136582A (en) | Mos type semiconductor device | |
JPS5297680A (en) | Production of mis type semiconductor integrated circuit device | |
GB1107576A (en) | Field-effect transistor | |
JPS5283067A (en) | Production of mis type semiconductor device | |
JPS5268383A (en) | Manufacture of semiconductor device | |
JPS5237775A (en) | Complementary semiconductor device | |
JPS51147274A (en) | Manufacturing process of integrated circuit | |
JPS53129980A (en) | Production of mos semiconductor device | |
JPS5396770A (en) | Production of mis transistor | |
JPS5279785A (en) | Production of semiconductor device | |
JPS5432981A (en) | Manufacture of longitudinal mos field effect transistor | |
JPS546482A (en) | Manufacture for semiconductor resistive element | |
JPS51147267A (en) | Insulated gate type semiconductor device |