Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric CorpfiledCriticalMitsubishi Electric Corp
Priority to JP9735276ApriorityCriticalpatent/JPS5323275A/en
Publication of JPS5323275ApublicationCriticalpatent/JPS5323275A/en
PURPOSE: To reduce damage on a substrate by forming an electrodes with nonelectrolytic plating after removing BSG glass formed by diffusing B, with a fluoric acid etching liquid not containing nitric acid.
COPYRIGHT: (C)1978,JPO&Japio
JP9735276A1976-08-131976-08-13Production of semiconductor device
PendingJPS5323275A
(en)