JPS5323275A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5323275A
JPS5323275A JP9735276A JP9735276A JPS5323275A JP S5323275 A JPS5323275 A JP S5323275A JP 9735276 A JP9735276 A JP 9735276A JP 9735276 A JP9735276 A JP 9735276A JP S5323275 A JPS5323275 A JP S5323275A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
diffusing
electrodes
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9735276A
Other languages
Japanese (ja)
Inventor
Masataka Inoue
Seki Terao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9735276A priority Critical patent/JPS5323275A/en
Publication of JPS5323275A publication Critical patent/JPS5323275A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To reduce damage on a substrate by forming an electrodes with nonelectrolytic plating after removing BSG glass formed by diffusing B, with a fluoric acid etching liquid not containing nitric acid.
COPYRIGHT: (C)1978,JPO&Japio
JP9735276A 1976-08-13 1976-08-13 Production of semiconductor device Pending JPS5323275A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9735276A JPS5323275A (en) 1976-08-13 1976-08-13 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9735276A JPS5323275A (en) 1976-08-13 1976-08-13 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5323275A true JPS5323275A (en) 1978-03-03

Family

ID=14190085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9735276A Pending JPS5323275A (en) 1976-08-13 1976-08-13 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5323275A (en)

Similar Documents

Publication Publication Date Title
JPS5253668A (en) Production of semiconductor device
JPS5323275A (en) Production of semiconductor device
JPS5233490A (en) Manufacturing process of semiconductor device
JPS5333053A (en) Production of semiconductor device
JPS51134566A (en) Semiconductor unit manufacturing process
JPS52155051A (en) Production of semiconductor device
JPS5373970A (en) Manufacture for semiconductor device
JPS5258463A (en) Production of semiconductor device
JPS52155056A (en) Production of semiconductor device
JPS5382174A (en) Surface processing method for semiconductor device
JPS5339873A (en) Etching method of silicon semiconductor substrate containing gold
JPS52155055A (en) Production of semiconductor device
JPS53101975A (en) Treating method of semiconductor substrates
JPS5379469A (en) Manufacture of glass mold type semiconductor rectifying device
JPS52122479A (en) Etching solution of silicon
JPS5329673A (en) Production of semiconductor device
JPS52155054A (en) Production of semiconductor device
JPS5368070A (en) Etching method
JPS53123089A (en) Production of semiconductor device
JPS53112673A (en) Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution
JPS5428580A (en) Manufacture of semiconductor device
JPS547941A (en) Production of optical diffusive plate
JPS5254378A (en) Production of semiconductor device
JPS52155053A (en) Production of semiconductor device
JPS522175A (en) Etching process