JPS53148978A - Manufacture of semiconductor element - Google Patents

Manufacture of semiconductor element

Info

Publication number
JPS53148978A
JPS53148978A JP6335777A JP6335777A JPS53148978A JP S53148978 A JPS53148978 A JP S53148978A JP 6335777 A JP6335777 A JP 6335777A JP 6335777 A JP6335777 A JP 6335777A JP S53148978 A JPS53148978 A JP S53148978A
Authority
JP
Japan
Prior art keywords
forming
manufacture
semiconductor element
substrate
concave parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6335777A
Other languages
Japanese (ja)
Other versions
JPS5716490B2 (en
Inventor
Seiichi Takahashi
Jukichi Tsunako
Yoshiaki Sano
Katsuzo Uenishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP6335777A priority Critical patent/JPS53148978A/en
Publication of JPS53148978A publication Critical patent/JPS53148978A/en
Publication of JPS5716490B2 publication Critical patent/JPS5716490B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To reduce the mask matching frequency as well as to enhance the integral degree,, by giving an etching using the insulator film pattern provided on the semiconductor substrate as the mask, forming a concave parts on the substrate while forming an eaves at the pattern end part, and then forming both P-type and the N-type regions within the substrate positioning between the concave parts.
COPYRIGHT: (C)1978,JPO&Japio
JP6335777A 1977-06-01 1977-06-01 Manufacture of semiconductor element Granted JPS53148978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6335777A JPS53148978A (en) 1977-06-01 1977-06-01 Manufacture of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6335777A JPS53148978A (en) 1977-06-01 1977-06-01 Manufacture of semiconductor element

Publications (2)

Publication Number Publication Date
JPS53148978A true JPS53148978A (en) 1978-12-26
JPS5716490B2 JPS5716490B2 (en) 1982-04-05

Family

ID=13226908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6335777A Granted JPS53148978A (en) 1977-06-01 1977-06-01 Manufacture of semiconductor element

Country Status (1)

Country Link
JP (1) JPS53148978A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61115490U (en) * 1984-12-29 1986-07-21
JPS6359189U (en) * 1986-10-03 1988-04-20

Also Published As

Publication number Publication date
JPS5716490B2 (en) 1982-04-05

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