Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co LtdfiledCriticalNEC Corp
Priority to JP6715577ApriorityCriticalpatent/JPS54983A/en
Publication of JPS54983ApublicationCriticalpatent/JPS54983A/en
PURPOSE: To make easy alignment and to establish fine size, by using the photo mask located at the boundary of the adjacent element for other pattern, when either one of photo etching pattern is aligned at the center part ofthe element formed on the semiconductor substrate.
COPYRIGHT: (C)1979,JPO&Japio
JP6715577A1977-06-061977-06-06Photo mask for semiconductor manufacture
PendingJPS54983A
(en)