JPS53124078A - Electron beam device - Google Patents

Electron beam device

Info

Publication number
JPS53124078A
JPS53124078A JP1548478A JP1548478A JPS53124078A JP S53124078 A JPS53124078 A JP S53124078A JP 1548478 A JP1548478 A JP 1548478A JP 1548478 A JP1548478 A JP 1548478A JP S53124078 A JPS53124078 A JP S53124078A
Authority
JP
Japan
Prior art keywords
electron beam
beam device
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1548478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5424833B2 (fr
Inventor
Shii Pufueifuaa Hansu
Emu Raian Fuiritsupu
Bui Ueebaa Edowaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS53124078A publication Critical patent/JPS53124078A/ja
Publication of JPS5424833B2 publication Critical patent/JPS5424833B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP1548478A 1977-02-23 1978-02-15 Electron beam device Granted JPS53124078A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23

Publications (2)

Publication Number Publication Date
JPS53124078A true JPS53124078A (en) 1978-10-30
JPS5424833B2 JPS5424833B2 (fr) 1979-08-23

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1548478A Granted JPS53124078A (en) 1977-02-23 1978-02-15 Electron beam device

Country Status (9)

Country Link
JP (1) JPS53124078A (fr)
BR (1) BR7801031A (fr)
CA (1) CA1166766A (fr)
DE (1) DE2805371C2 (fr)
FR (1) FR2382091A1 (fr)
GB (1) GB1587852A (fr)
IT (1) IT1158434B (fr)
NL (1) NL7802010A (fr)
SE (1) SE437441B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS5823155A (ja) * 1981-07-30 1983-02-10 インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン 荷電粒子ビ−ムの整列制御装置
JPS5928336A (ja) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
CN116441562B (zh) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS538064A (en) * 1976-05-14 1978-01-25 Thomson Csf Particle optical device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (fr) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS538064A (en) * 1976-05-14 1978-01-25 Thomson Csf Particle optical device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
JPS5415665B2 (fr) * 1977-06-09 1979-06-16
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS5823155A (ja) * 1981-07-30 1983-02-10 インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン 荷電粒子ビ−ムの整列制御装置
JPS5928336A (ja) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法

Also Published As

Publication number Publication date
GB1587852A (en) 1981-04-08
FR2382091B1 (fr) 1982-04-09
CA1166766A (fr) 1984-05-01
JPS5424833B2 (fr) 1979-08-23
NL7802010A (nl) 1978-08-25
DE2805371A1 (de) 1978-08-24
SE7801728L (sv) 1978-08-24
FR2382091A1 (fr) 1978-09-22
SE437441B (sv) 1985-02-25
IT1158434B (it) 1987-02-18
IT7820143A0 (it) 1978-02-10
DE2805371C2 (de) 1984-02-16
BR7801031A (pt) 1978-12-12

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