IT7820143A0 - Apparecchiatura per formare un fascio di elettroni di dimensioni variabili. - Google Patents

Apparecchiatura per formare un fascio di elettroni di dimensioni variabili.

Info

Publication number
IT7820143A0
IT7820143A0 IT7820143A IT2014378A IT7820143A0 IT 7820143 A0 IT7820143 A0 IT 7820143A0 IT 7820143 A IT7820143 A IT 7820143A IT 2014378 A IT2014378 A IT 2014378A IT 7820143 A0 IT7820143 A0 IT 7820143A0
Authority
IT
Italy
Prior art keywords
electrons
equipment
forming
variable size
variable
Prior art date
Application number
IT7820143A
Other languages
English (en)
Other versions
IT1158434B (it
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT7820143A0 publication Critical patent/IT7820143A0/it
Application granted granted Critical
Publication of IT1158434B publication Critical patent/IT1158434B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
IT20143/78A 1977-02-23 1978-02-10 Apparecchiatura per formare un fascio di elettroni di dimensioni variabili IT1158434B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23

Publications (2)

Publication Number Publication Date
IT7820143A0 true IT7820143A0 (it) 1978-02-10
IT1158434B IT1158434B (it) 1987-02-18

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
IT20143/78A IT1158434B (it) 1977-02-23 1978-02-10 Apparecchiatura per formare un fascio di elettroni di dimensioni variabili

Country Status (9)

Country Link
JP (1) JPS53124078A (it)
BR (1) BR7801031A (it)
CA (1) CA1166766A (it)
DE (1) DE2805371C2 (it)
FR (1) FR2382091A1 (it)
GB (1) GB1587852A (it)
IT (1) IT1158434B (it)
NL (1) NL7802010A (it)
SE (1) SE437441B (it)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
DE3169257D1 (en) * 1980-11-28 1985-04-18 Ibm Electron beam system and method
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (ja) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
CN116441562B (zh) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (it) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Also Published As

Publication number Publication date
SE437441B (sv) 1985-02-25
JPS53124078A (en) 1978-10-30
BR7801031A (pt) 1978-12-12
JPS5424833B2 (it) 1979-08-23
IT1158434B (it) 1987-02-18
SE7801728L (sv) 1978-08-24
FR2382091B1 (it) 1982-04-09
NL7802010A (nl) 1978-08-25
DE2805371A1 (de) 1978-08-24
GB1587852A (en) 1981-04-08
FR2382091A1 (fr) 1978-09-22
CA1166766A (en) 1984-05-01
DE2805371C2 (de) 1984-02-16

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