GB1587852A - Electron beam apparatus - Google Patents

Electron beam apparatus Download PDF

Info

Publication number
GB1587852A
GB1587852A GB2456/78A GB245678A GB1587852A GB 1587852 A GB1587852 A GB 1587852A GB 2456/78 A GB2456/78 A GB 2456/78A GB 245678 A GB245678 A GB 245678A GB 1587852 A GB1587852 A GB 1587852A
Authority
GB
United Kingdom
Prior art keywords
aperture
image
deflection
electron beam
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2456/78A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1587852A publication Critical patent/GB1587852A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
GB2456/78A 1977-02-23 1978-01-20 Electron beam apparatus Expired GB1587852A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23

Publications (1)

Publication Number Publication Date
GB1587852A true GB1587852A (en) 1981-04-08

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2456/78A Expired GB1587852A (en) 1977-02-23 1978-01-20 Electron beam apparatus

Country Status (9)

Country Link
JP (1) JPS53124078A (fr)
BR (1) BR7801031A (fr)
CA (1) CA1166766A (fr)
DE (1) DE2805371C2 (fr)
FR (1) FR2382091A1 (fr)
GB (1) GB1587852A (fr)
IT (1) IT1158434B (fr)
NL (1) NL7802010A (fr)
SE (1) SE437441B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116441562A (zh) * 2023-06-16 2023-07-18 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
EP0053225B1 (fr) * 1980-11-28 1985-03-13 International Business Machines Corporation Système à faisceau électronique et méthode d'utilisation
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (ja) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (fr) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116441562A (zh) * 2023-06-16 2023-07-18 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法
CN116441562B (zh) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Also Published As

Publication number Publication date
CA1166766A (fr) 1984-05-01
IT1158434B (it) 1987-02-18
FR2382091B1 (fr) 1982-04-09
FR2382091A1 (fr) 1978-09-22
NL7802010A (nl) 1978-08-25
JPS5424833B2 (fr) 1979-08-23
JPS53124078A (en) 1978-10-30
IT7820143A0 (it) 1978-02-10
SE7801728L (sv) 1978-08-24
DE2805371C2 (de) 1984-02-16
BR7801031A (pt) 1978-12-12
DE2805371A1 (de) 1978-08-24
SE437441B (sv) 1985-02-25

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19960120