JPS5249769A - Process for production of semiconductor device - Google Patents
Process for production of semiconductor deviceInfo
- Publication number
- JPS5249769A JPS5249769A JP12531775A JP12531775A JPS5249769A JP S5249769 A JPS5249769 A JP S5249769A JP 12531775 A JP12531775 A JP 12531775A JP 12531775 A JP12531775 A JP 12531775A JP S5249769 A JPS5249769 A JP S5249769A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- forrce
- gravty
- centrifugal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12531775A JPS5249769A (en) | 1975-10-20 | 1975-10-20 | Process for production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12531775A JPS5249769A (en) | 1975-10-20 | 1975-10-20 | Process for production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5249769A true JPS5249769A (en) | 1977-04-21 |
Family
ID=14907103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12531775A Pending JPS5249769A (en) | 1975-10-20 | 1975-10-20 | Process for production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5249769A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944846A (ja) * | 1982-09-07 | 1984-03-13 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS59152646A (ja) * | 1983-02-21 | 1984-08-31 | Toshiba Corp | 半導体装置の製造方法 |
JPH0235732A (ja) * | 1988-07-26 | 1990-02-06 | Matsushita Electric Ind Co Ltd | 金属薄膜の形成方法及び形成装置 |
JPH06224189A (ja) * | 1993-01-21 | 1994-08-12 | Handotai Process Kenkyusho:Kk | 平坦化膜の形成方法及び平坦化膜の形成装置 |
-
1975
- 1975-10-20 JP JP12531775A patent/JPS5249769A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944846A (ja) * | 1982-09-07 | 1984-03-13 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS59152646A (ja) * | 1983-02-21 | 1984-08-31 | Toshiba Corp | 半導体装置の製造方法 |
JPH0235732A (ja) * | 1988-07-26 | 1990-02-06 | Matsushita Electric Ind Co Ltd | 金属薄膜の形成方法及び形成装置 |
JPH06224189A (ja) * | 1993-01-21 | 1994-08-12 | Handotai Process Kenkyusho:Kk | 平坦化膜の形成方法及び平坦化膜の形成装置 |
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