JPS52173A - X-ray etching mask - Google Patents

X-ray etching mask

Info

Publication number
JPS52173A
JPS52173A JP7553875A JP7553875A JPS52173A JP S52173 A JPS52173 A JP S52173A JP 7553875 A JP7553875 A JP 7553875A JP 7553875 A JP7553875 A JP 7553875A JP S52173 A JPS52173 A JP S52173A
Authority
JP
Japan
Prior art keywords
etching mask
ray etching
ray
fabricate
enable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7553875A
Other languages
English (en)
Inventor
Kiyokatsu Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7553875A priority Critical patent/JPS52173A/ja
Publication of JPS52173A publication Critical patent/JPS52173A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP7553875A 1975-06-23 1975-06-23 X-ray etching mask Pending JPS52173A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7553875A JPS52173A (en) 1975-06-23 1975-06-23 X-ray etching mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7553875A JPS52173A (en) 1975-06-23 1975-06-23 X-ray etching mask

Publications (1)

Publication Number Publication Date
JPS52173A true JPS52173A (en) 1977-01-05

Family

ID=13579076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7553875A Pending JPS52173A (en) 1975-06-23 1975-06-23 X-ray etching mask

Country Status (1)

Country Link
JP (1) JPS52173A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53143171A (en) * 1977-05-20 1978-12-13 Hitachi Ltd Mask for x-ray transfer
JPS5411677A (en) * 1977-06-27 1979-01-27 Rockwell International Corp Mask used for fine line lithography and method of producing same
JPS55101945A (en) * 1979-01-31 1980-08-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask for exposure
JPS5824473U (ja) * 1981-08-10 1983-02-16 三菱電機株式会社 内燃機関点火装置
JPS59193454A (ja) * 1983-04-18 1984-11-02 Shuzo Hattori Ｘ線リソグラフイ−用マスクの製造法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53143171A (en) * 1977-05-20 1978-12-13 Hitachi Ltd Mask for x-ray transfer
JPS5637692B2 (ja) * 1977-05-20 1981-09-02
JPS5411677A (en) * 1977-06-27 1979-01-27 Rockwell International Corp Mask used for fine line lithography and method of producing same
JPS6327849B2 (ja) * 1977-06-27 1988-06-06 Rockwell International Corp
JPS55101945A (en) * 1979-01-31 1980-08-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask for exposure
JPS6054671B2 (ja) * 1979-01-31 1985-11-30 超エル・エス・アイ技術研究組合 露光用マスク
JPS5824473U (ja) * 1981-08-10 1983-02-16 三菱電機株式会社 内燃機関点火装置
JPS59193454A (ja) * 1983-04-18 1984-11-02 Shuzo Hattori Ｘ線リソグラフイ−用マスクの製造法
JPH0424854B2 (ja) * 1983-04-18 1992-04-28 Shuzo Hatsutori

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