JPH11294520A - 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法 - Google Patents

除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法

Info

Publication number
JPH11294520A
JPH11294520A JP10095893A JP9589398A JPH11294520A JP H11294520 A JPH11294520 A JP H11294520A JP 10095893 A JP10095893 A JP 10095893A JP 9589398 A JP9589398 A JP 9589398A JP H11294520 A JPH11294520 A JP H11294520A
Authority
JP
Japan
Prior art keywords
vibration
actuator
linear motor
force
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10095893A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11294520A5 (https=
Inventor
Takehiko Mayama
武彦 間山
Yukio Takabayashi
幸夫 高林
Shinji Wakui
伸二 涌井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10095893A priority Critical patent/JPH11294520A/ja
Priority to US09/286,438 priority patent/US6322060B1/en
Publication of JPH11294520A publication Critical patent/JPH11294520A/ja
Publication of JPH11294520A5 publication Critical patent/JPH11294520A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • F16F15/0275—Control of stiffness
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2222/00—Special physical effects, e.g. nature of damping effects
    • F16F2222/06—Magnetic or electromagnetic

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP10095893A 1998-04-08 1998-04-08 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法 Pending JPH11294520A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10095893A JPH11294520A (ja) 1998-04-08 1998-04-08 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
US09/286,438 US6322060B1 (en) 1998-04-08 1999-04-06 Anti-vibration apparatus, exposure apparatus using the same, device manufacturing method, and anti-vibration method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10095893A JPH11294520A (ja) 1998-04-08 1998-04-08 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法

Publications (2)

Publication Number Publication Date
JPH11294520A true JPH11294520A (ja) 1999-10-29
JPH11294520A5 JPH11294520A5 (https=) 2007-03-22

Family

ID=14149999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10095893A Pending JPH11294520A (ja) 1998-04-08 1998-04-08 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法

Country Status (2)

Country Link
US (1) US6322060B1 (https=)
JP (1) JPH11294520A (https=)

Cited By (23)

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WO2000014779A1 (en) * 1998-09-03 2000-03-16 Nikon Corporation Exposure apparatus and exposure method, and device and method for producing the same
US6313551B1 (en) 2000-02-04 2001-11-06 Nikon Corporation Magnet array for a shaft-type linear motor
JP2004158829A (ja) * 2002-07-11 2004-06-03 Asml Netherlands Bv リソグラフィ機器およびデバイスの製造方法
JP2005022639A (ja) * 2003-06-02 2005-01-27 Bose Corp 電磁干渉フィルタ
EP1619407A1 (en) 2004-07-20 2006-01-25 Canon Kabushiki Kaisha Exposure apparatus and semiconductor device manufacturing method
US7063192B2 (en) 2000-11-27 2006-06-20 Canon Kabushiki Kaisha Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus
JP2007071348A (ja) * 2005-09-08 2007-03-22 Unirock:Kk 防振装置
JP2007273633A (ja) * 2006-03-30 2007-10-18 Canon Inc ステージ装置及びその制御方法、露光装置及びデバイス製造方法
JP2009016402A (ja) * 2007-06-29 2009-01-22 Canon Inc 除振装置、露光装置およびデバイス製造方法
EP2098750A2 (en) 2008-03-04 2009-09-09 Canon Kabushiki Kaisha Vibration suppression apparatus, exposure apparatus, and method of manufacturing device
JP2011058629A (ja) * 2009-09-11 2011-03-24 Integrated Dynamics Engineering Gmbh 改良型能動振動絶縁システム
US7944546B2 (en) 2008-02-04 2011-05-17 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
WO2014013733A1 (ja) * 2012-07-18 2014-01-23 株式会社ニコン 支持装置、移動体装置、露光装置、及びデバイス製造方法
CN103698984A (zh) * 2013-12-17 2014-04-02 嘉兴华嶺机电设备有限公司 一种超精扫描镀膜及定位光刻设备
US20170370441A1 (en) * 2016-06-23 2017-12-28 Integrated Dynamics Engineering Gmbh Isolator for a stationary vibration isolation system
KR20180096758A (ko) * 2015-12-21 2018-08-29 에이에스엠엘 네델란즈 비.브이. 능동 베이스 프레임 지지부를 갖는 리소그래피 장치
JP2018536188A (ja) * 2015-11-23 2018-12-06 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めデバイス、リソグラフィ装置、及びデバイス製造方法
US10480609B2 (en) 2016-06-23 2019-11-19 Integrated Dynamics Engineering Gmbh Pneumatic actuator and method for operating an active vibration isolation system
JP2020186815A (ja) * 2017-03-16 2020-11-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 物体を保持し、位置付け、かつ／又は動かすための装置、及び、物体を保持し、位置付け、かつ／又は動かすための装置を動作させる方法
US10941833B2 (en) 2015-12-16 2021-03-09 Integrated Dynamics Engineering Gmbh Vibration isolator with a vertically effective pneumatic spring
CN115638208A (zh) * 2022-10-20 2023-01-24 新兴铸管股份有限公司 箱体风机减振装置
CN117222824A (zh) * 2022-02-21 2023-12-12 华为技术有限公司 空气弹簧、隔振装置、传感器总成、隔振控制方法和车辆
JP2024115687A (ja) * 2023-02-15 2024-08-27 特許機器株式会社 流体制御システム、及び、制御方法

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JP2002242983A (ja) * 2001-02-19 2002-08-28 Canon Inc 能動的除振装置
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JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
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US7061577B2 (en) 2002-03-26 2006-06-13 Nikon Corporation Image adjustor including damping assembly
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DE10249647B4 (de) * 2002-10-24 2006-03-09 Bilz Schwingungstechnik Gmbh Pneumatischer Schwingungsisolator
US20040252287A1 (en) * 2003-06-11 2004-12-16 Michael Binnard Reaction frame assembly that functions as a reaction mass
US20050077845A1 (en) * 2003-08-29 2005-04-14 Nejat Olgac Actively controlled harmonic force generator
CN100465473C (zh) * 2003-09-05 2009-03-04 皇家飞利浦电子股份有限公司 包括惯性基准质量的用于主动隔振的致动器装置
JP2005172135A (ja) * 2003-12-11 2005-06-30 Canon Inc 除振マウント装置
JP4463573B2 (ja) * 2004-01-22 2010-05-19 藤倉ゴム工業株式会社 除振装置
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JP4764615B2 (ja) * 2004-05-07 2011-09-07 富士フイルム株式会社 塗布装置、塗布方法及び塗布膜付きウエブの製造方法
US7114710B2 (en) * 2004-09-03 2006-10-03 Bilz Schwingungstechnix Gmbh Pneumatic vibration isolator
CN100435453C (zh) * 2004-09-15 2008-11-19 日产自动车株式会社 旋转电机
US7869000B2 (en) * 2004-11-02 2011-01-11 Nikon Corporation Stage assembly with lightweight fine stage and low transmissibility
US7417714B2 (en) * 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
US20080105069A1 (en) * 2004-11-04 2008-05-08 Binnard Michael B Fine Stage Z Support Apparatus
ATE396919T1 (de) * 2004-12-23 2008-06-15 Mettler Toledo Flexilab Sas Vorrichtung und verfahren zum dosieren von substanzen in behältern
US7461849B2 (en) * 2005-12-22 2008-12-09 Emiph, Llc Method and apparatus for an electronic equipment rack
US8424885B2 (en) 2005-12-22 2013-04-23 Elliptical Mobile Solutions, LLC Method and apparatus for an environmentally-protected electronic equipment enclosure
JP2006344685A (ja) * 2005-06-07 2006-12-21 Canon Inc 露光装置
US20070152409A1 (en) * 2005-12-29 2007-07-05 Emiph, Llc Method and apparatus for a low-profile suspension system
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EP1803967B1 (de) * 2005-12-30 2016-08-03 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit Störgrössenaufschaltung von vorhersehbaren Kraftstörungen
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7887033B2 (en) * 2006-06-06 2011-02-15 Deere & Company Suspension system having active compensation for vibration
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8014881B2 (en) * 2007-02-15 2011-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008227015A (ja) * 2007-03-09 2008-09-25 Canon Inc 露光装置並びにデバイス製造方法
JP2008256155A (ja) * 2007-04-06 2008-10-23 Canon Inc 除振装置、演算装置、露光装置及びデバイス製造方法
US8164737B2 (en) 2007-10-23 2012-04-24 Asml Netherlands B.V. Lithographic apparatus having an active damping subassembly
DE102008026077B4 (de) * 2008-05-30 2017-11-09 Integrated Dynamics Engineering Gmbh Lithographiesystem
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EP2759735B1 (de) * 2013-01-29 2016-06-15 Integrated Dynamics Engineering GmbH Stationäres Schwingungsisolationssystem sowie Verfahren zur Regelung eines Schwingungsisolationssystems
EP3056868B1 (en) * 2013-10-09 2023-12-20 FUJI Corporation Multiplexing communication system and working robot
WO2016056003A1 (en) * 2014-10-07 2016-04-14 Yaron Zimmerman Device and method for position control using two independently controllable electromagnetic drive arrangements
JP2017072219A (ja) * 2015-10-08 2017-04-13 キヤノン株式会社 振動制御装置、リソグラフィ装置、および物品の製造方法
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CN109253349B (zh) * 2018-10-29 2021-02-26 合肥康尔信电力系统有限公司 一种柴油机发电组安装调节机构
EP3712462A1 (de) * 2019-03-19 2020-09-23 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit einem magnetaktor
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US6538719B1 (en) 1998-09-03 2003-03-25 Nikon Corporation Exposure apparatus and exposure method, and device and method for producing the same
WO2000014779A1 (en) * 1998-09-03 2000-03-16 Nikon Corporation Exposure apparatus and exposure method, and device and method for producing the same
US6313551B1 (en) 2000-02-04 2001-11-06 Nikon Corporation Magnet array for a shaft-type linear motor
US7275627B1 (en) 2000-11-27 2007-10-02 Canon Kabushiki Kaisha Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus
US7063192B2 (en) 2000-11-27 2006-06-20 Canon Kabushiki Kaisha Active vibration suppression apparatus, control method therefor, and exposure apparatus having active vibration suppression apparatus
JP2004158829A (ja) * 2002-07-11 2004-06-03 Asml Netherlands Bv リソグラフィ機器およびデバイスの製造方法
US7554105B2 (en) 2002-07-11 2009-06-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005022639A (ja) * 2003-06-02 2005-01-27 Bose Corp 電磁干渉フィルタ
KR100662662B1 (ko) * 2004-07-20 2007-01-02 캐논 가부시끼가이샤 노광장치 및 반도체 디바이스의 제조방법
EP1619407A1 (en) 2004-07-20 2006-01-25 Canon Kabushiki Kaisha Exposure apparatus and semiconductor device manufacturing method
JP2007071348A (ja) * 2005-09-08 2007-03-22 Unirock:Kk 防振装置
JP2007273633A (ja) * 2006-03-30 2007-10-18 Canon Inc ステージ装置及びその制御方法、露光装置及びデバイス製造方法
JP2009016402A (ja) * 2007-06-29 2009-01-22 Canon Inc 除振装置、露光装置およびデバイス製造方法
US7944546B2 (en) 2008-02-04 2011-05-17 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
EP2098750A2 (en) 2008-03-04 2009-09-09 Canon Kabushiki Kaisha Vibration suppression apparatus, exposure apparatus, and method of manufacturing device
JP2009212314A (ja) * 2008-03-04 2009-09-17 Canon Inc 制振装置、露光装置及びデバイス製造方法
EP2098750A3 (en) * 2008-03-04 2010-06-23 Canon Kabushiki Kaisha Vibration suppression apparatus, exposure apparatus, and method of manufacturing device
JP2011058629A (ja) * 2009-09-11 2011-03-24 Integrated Dynamics Engineering Gmbh 改良型能動振動絶縁システム
WO2014013733A1 (ja) * 2012-07-18 2014-01-23 株式会社ニコン 支持装置、移動体装置、露光装置、及びデバイス製造方法
CN103698984A (zh) * 2013-12-17 2014-04-02 嘉兴华嶺机电设备有限公司 一种超精扫描镀膜及定位光刻设备
CN103698984B (zh) * 2013-12-17 2017-01-04 嘉兴华嶺机电设备有限公司 一种超精扫描镀膜及定位光刻设备
JP2018536188A (ja) * 2015-11-23 2018-12-06 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めデバイス、リソグラフィ装置、及びデバイス製造方法
US10941833B2 (en) 2015-12-16 2021-03-09 Integrated Dynamics Engineering Gmbh Vibration isolator with a vertically effective pneumatic spring
US10578983B2 (en) 2015-12-21 2020-03-03 Asml Netherlands B.V. Lithographic apparatus having an active base frame support
KR20180096758A (ko) * 2015-12-21 2018-08-29 에이에스엠엘 네델란즈 비.브이. 능동 베이스 프레임 지지부를 갖는 리소그래피 장치
US10480609B2 (en) 2016-06-23 2019-11-19 Integrated Dynamics Engineering Gmbh Pneumatic actuator and method for operating an active vibration isolation system
US10634210B2 (en) * 2016-06-23 2020-04-28 Integrated Dynamics Engineering Gmbh Isolator for a stationary vibration isolation system
US20170370441A1 (en) * 2016-06-23 2017-12-28 Integrated Dynamics Engineering Gmbh Isolator for a stationary vibration isolation system
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