JPH1097073A - ポリマー組成物及びそのポリマーの製造方法 - Google Patents

ポリマー組成物及びそのポリマーの製造方法

Info

Publication number
JPH1097073A
JPH1097073A JP9233820A JP23382097A JPH1097073A JP H1097073 A JPH1097073 A JP H1097073A JP 9233820 A JP9233820 A JP 9233820A JP 23382097 A JP23382097 A JP 23382097A JP H1097073 A JPH1097073 A JP H1097073A
Authority
JP
Japan
Prior art keywords
polymer
group
groups
carbon atoms
grams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9233820A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1097073A5 (enExample
Inventor
Thomas W Smith
ダブリュー．スミス トーマス
J Fuller Timothy
ジェイ．フラー ティモシー
S Naran Ram
エス．ナラン ラム
David J Luca
ジェイ．ルカ デイビッド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Publication of JPH1097073A publication Critical patent/JPH1097073A/ja
Publication of JPH1097073A5 publication Critical patent/JPH1097073A5/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14016—Structure of bubble jet print heads
    • B41J2/14032—Structure of the pressure chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14016—Structure of bubble jet print heads
    • B41J2/14088—Structure of heating means
    • B41J2/14112—Resistive element
    • B41J2/14129—Layer structure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/03—Specific materials used
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP9233820A 1996-08-29 1997-08-29 ポリマー組成物及びそのポリマーの製造方法 Pending JPH1097073A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/705,488 US6124372A (en) 1996-08-29 1996-08-29 High performance polymer compositions having photosensitivity-imparting substituents and thermal sensitivity-imparting substituents
US705488 1996-08-29

Publications (2)

Publication Number Publication Date
JPH1097073A true JPH1097073A (ja) 1998-04-14
JPH1097073A5 JPH1097073A5 (enExample) 2005-06-16

Family

ID=24833695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9233820A Pending JPH1097073A (ja) 1996-08-29 1997-08-29 ポリマー組成物及びそのポリマーの製造方法

Country Status (3)

Country Link
US (3) US6124372A (enExample)
EP (1) EP0827029A3 (enExample)
JP (1) JPH1097073A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6716956B2 (en) 2002-01-09 2004-04-06 Xerox Corporation Process for preparing polyarylene ethers
JP2009244801A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 感光性樹脂組成物、高分子化合物、パターンの製造法および電子デバイス
JP2010067621A (ja) * 2007-09-11 2010-03-25 Fujifilm Corp ナノインプリント用硬化性組成物、硬化物およびその製造方法
JP2010067935A (ja) * 2007-11-02 2010-03-25 Fujifilm Corp ナノインプリント用硬化性組成物、硬化物およびその製造方法

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5820771A (en) * 1996-09-12 1998-10-13 Xerox Corporation Method and materials, including polybenzoxazole, for fabricating an ink-jet printhead
US6273985B1 (en) 1998-06-26 2001-08-14 Xerox Corporation Bonding process
US6260956B1 (en) * 1998-07-23 2001-07-17 Xerox Corporation Thermal ink jet printhead and process for the preparation thereof
US6139920A (en) * 1998-12-21 2000-10-31 Xerox Corporation Photoresist compositions
US6177238B1 (en) * 1999-06-04 2001-01-23 Xerox Corporation Ink jet printheads containing arylene ether alcohol polymers and processes for their formation
US6294317B1 (en) * 1999-07-14 2001-09-25 Xerox Corporation Patterned photoresist structures having features with high aspect ratios and method of forming such structures
US6686124B1 (en) * 2000-03-14 2004-02-03 International Business Machines Corporation Multifunctional polymeric materials and use thereof
US6409316B1 (en) 2000-03-28 2002-06-25 Xerox Corporation Thermal ink jet printhead with crosslinked polymer layer
JP2002138248A (ja) * 2000-11-01 2002-05-14 Fujitsu Ltd 絶縁性樹脂膜形成性組成物および絶縁性樹脂膜
US6364469B1 (en) * 2000-12-06 2002-04-02 Eastman Kodak Company Continuous ink jet printing process
US6520628B2 (en) * 2001-01-30 2003-02-18 Hewlett-Packard Company Fluid ejection device with substrate having a fluid firing device and a fluid reservoir on a first surface thereof
CN100433310C (zh) 2001-04-23 2008-11-12 信越化学工业株式会社 散热元件
DE10137375A1 (de) * 2001-07-31 2003-02-27 Infineon Technologies Ag Verwendung von Polybenzoxazolen (PBO) zum Kleben
KR100511100B1 (ko) * 2002-07-12 2005-08-31 김미화 퍼플루오로스티렌 화합물, 이를 이용한 코팅액 및광도파로형 광소자
DE10242708A1 (de) * 2002-09-13 2004-05-19 Celanese Ventures Gmbh Protonenleitende Membranen und deren Verwendung
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
US6927273B2 (en) 2002-12-17 2005-08-09 Xerox Corporation Process for preparing substituted polyarylene ethers
TWI262041B (en) * 2003-11-14 2006-09-11 Hitachi Chemical Co Ltd Formation method of metal layer on resin layer, printed wiring board, and production method thereof
US7001978B2 (en) * 2003-11-19 2006-02-21 Xerox Corporation Unsaturated ester substituted polymers with reduced halogen content
US7067608B2 (en) * 2003-11-25 2006-06-27 Xerox Corporation Process for preparing branched polyarylene ethers
US7396895B2 (en) * 2003-11-25 2008-07-08 Xerox Corporation Branched polyarylene ethers and processes for the preparation thereof
US20050126697A1 (en) * 2003-12-11 2005-06-16 International Business Machines Corporation Photochemically and thermally curable adhesive formulations
JP5165829B2 (ja) * 2004-02-26 2013-03-21 日東電工株式会社 ロール状ウエハ加工用粘着シート
US7135122B2 (en) * 2004-03-31 2006-11-14 Freudenberg-Nok General Partnership Polytetrafluoroethylene composites
US7259230B2 (en) * 2004-06-07 2007-08-21 Battelle Energy Alliance, Llc Polybenzimidazole compounds, polymeric media, and methods of post-polymerization modifications
US7309758B2 (en) * 2004-06-07 2007-12-18 Battelle Energy Alliance, Llc Polybenzimidazole compounds, polymeric media, and methods of post-polymerization modifications
US7452577B2 (en) * 2004-06-30 2008-11-18 Freudenberg-Nok General Partnership Electron beam curing of fabricated polymeric structures
US7521508B2 (en) * 2004-06-30 2009-04-21 Freudenberg-Nok General Partnership Electron beam inter-curing of plastic and elastomer blends
US7342072B2 (en) 2004-06-30 2008-03-11 Freudenberg-Nok General Partnership Bimodal compounds having an elastomeric moiety
US7244329B2 (en) * 2004-06-30 2007-07-17 Freudenberg-Nok General Partnership Electron beam curing in a composite having a flow resistant adhesive layer
US7230038B2 (en) * 2004-06-30 2007-06-12 Freudenberg-Nok General Partnership Branched chain fluoropolymers
US20060000801A1 (en) * 2004-06-30 2006-01-05 Park Edward H Surface bonding in halogenated polymeric components
US7204574B2 (en) * 2004-06-30 2007-04-17 Lexmark International, Inc. Polyimide thickfilm flow feature photoresist and method of applying same
US20060100368A1 (en) * 2004-11-08 2006-05-11 Park Edward H Elastomer gum polymer systems
US7381765B2 (en) * 2004-11-08 2008-06-03 Freudenberg-Nok General Partnership Electrostatically dissipative fluoropolymers
US20060099368A1 (en) * 2004-11-08 2006-05-11 Park Edward H Fuel hose with a fluoropolymer inner layer
US20060221115A1 (en) * 2005-04-01 2006-10-05 Lexmark International, Inc. Methods for bonding radiation curable compositions to a substrate
US20070237925A1 (en) * 2006-04-07 2007-10-11 Castle Scott R Radiation cured coatings
JP2010513573A (ja) 2006-07-28 2010-04-30 ロード・コーポレーション デュアル硬化接着剤配合物
US7863365B2 (en) 2006-12-20 2011-01-04 Freudenberg-Nok General Partnership Robust magnetizable elastomeric thermoplastic blends
US8017192B2 (en) * 2007-07-17 2011-09-13 Lexmark International, Inc. Radiation cured coatings for image forming device components
US20090084574A1 (en) * 2007-09-28 2009-04-02 Kim Gene Balfour Poly(arylene ether) composition and its use in the fabrication of extruded articles and coated wire
US20090111050A1 (en) * 2007-10-16 2009-04-30 Naiini Ahmad A Novel Photosensitive Resin Compositions
JP5388817B2 (ja) * 2008-12-12 2014-01-15 キヤノン株式会社 液体吐出ヘッドの製造方法
US8218291B2 (en) * 2010-03-31 2012-07-10 General Electric Company Monomers for preparing polycarbonate resins, methods of preparing the monomers, polycarbonate resins prepared with the monomers, and capacitors comprising the polycarbonate resins
US8541517B2 (en) 2011-03-10 2013-09-24 Battelle Energy Alliance, Llc Polymer compositions, polymer films and methods and precursors for forming same
CN102520584B (zh) * 2011-09-13 2014-05-07 复旦大学 光敏苯并环丁烯树脂组合物及制备方法以及其图案化方法
JP5834251B2 (ja) * 2011-11-22 2015-12-16 パナソニックＩｐマネジメント株式会社 フレキシブル金属張基材、フレキシブル金属張基材の製造方法、プリント配線板、多層フレキシブルプリント配線板、及びフレックスリジッドプリント配線板
US9801277B1 (en) 2013-08-27 2017-10-24 Flextronics Ap, Llc Bellows interconnect
US9719979B2 (en) * 2013-11-15 2017-08-01 Sabic Global Technologies B.V. Methods of identifying crosslinking molecules for polymers
US10466118B1 (en) 2015-08-28 2019-11-05 Multek Technologies, Ltd. Stretchable flexible durable pressure sensor
EP3439856B1 (en) * 2016-04-08 2020-02-19 Solvay Specialty Polymers USA, LLC Photocurable polymers, photocurable polymer compositions and lithographic processes including the same
US10881001B2 (en) * 2017-03-02 2020-12-29 Flex Ltd. Micro conductive thread interconnect component to make an interconnect between conductive threads in fabrics to PCB, FPC, and rigid-flex circuits
US10426029B1 (en) 2018-01-18 2019-09-24 Flex Ltd. Micro-pad array to thread flexible attachment
US10687421B1 (en) 2018-04-04 2020-06-16 Flex Ltd. Fabric with woven wire braid
US10575381B1 (en) 2018-06-01 2020-02-25 Flex Ltd. Electroluminescent display on smart textile and interconnect methods
WO2021030902A1 (en) 2019-08-21 2021-02-25 Acuva Technologies Inc. Ultraviolet light emitter
CN113042073B (zh) * 2021-03-24 2023-03-03 石河子大学 一种用于乙炔二聚反应的催化剂及其应用

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2125968A (en) * 1935-08-21 1938-08-09 Ernst T Theimer Manufacture of aromatic alcohols
US3367914A (en) * 1964-06-29 1968-02-06 Dow Chemical Co Poly(aminomethyl)diphenyl ether-aldehyde thermoset resin and process of making same
US3455868A (en) * 1964-11-24 1969-07-15 Union Carbide Corp Friction composition and friction element thereof
US3914194A (en) * 1973-04-02 1975-10-21 Dow Chemical Co Unsaturated formaldehyde copolymer resins derived from diaryl oxides, sulfides, dibenzofuran or dibenzothiophene
US4086209A (en) * 1974-02-21 1978-04-25 Teijin Limited Novel nitrogen-containing aromatic polymers and process for their preparation
US4110279A (en) * 1974-02-25 1978-08-29 The Dow Chemical Company High temperature polymers from methoxy functional ether aromatic monomers
JPS5379A (en) 1976-06-23 1978-01-05 Mitsubishi Electric Corp Manufacture of mos semiconductor device
JPS6026130B2 (ja) * 1976-12-24 1985-06-21 株式会社クラレ 新規重合体の製造法
JPS5657A (en) 1979-06-12 1981-01-06 Omron Tateisi Electronics Co Tape carrying unit
JPS606024B2 (ja) 1979-06-14 1985-02-15 ソニー株式会社 テ−プレコ−ダのモ−ド切換機構
JPS5650929A (en) * 1979-10-03 1981-05-08 Teijin Ltd Polysulfone having carbon-carbon double bond on its side chain and its manufacture
JPS5650928A (en) * 1979-10-03 1981-05-08 Teijin Ltd Polysulfone having (meth)acrylate group on its side chain and its manufacture
JPS5657826A (en) * 1979-10-18 1981-05-20 Teijin Ltd Polyether sulfone containing azido group and its preparation
US4506004A (en) * 1982-04-01 1985-03-19 Sullivan Donald F Printed wiring board
GB2104452B (en) * 1981-06-29 1985-07-31 Canon Kk Liquid jet recording head
US4435496A (en) * 1982-09-22 1984-03-06 American Hoechst Corporation Photopolymer cleavage imaging system
GB8331151D0 (en) * 1982-12-06 1983-12-29 Ici Plc Aromatic oligomers and resins
DE3563057D1 (en) * 1984-03-07 1988-07-07 Ciba Geigy Ag Crosslinkable linear polyether resins
JPS6180242A (ja) * 1984-09-28 1986-04-23 Matsushita Electric Ind Co Ltd 放射線硬化型のレジスト材料
DE3500180A1 (de) * 1985-01-04 1986-07-10 Ernst Prof. Dr. 7400 Tübingen Bayer Pfropfcopolymerisate aus vernetzten polymeren und polyoxyethylen, verfahren zu ihrer herstellung und ihre verwendung
US4623558A (en) * 1985-05-29 1986-11-18 W. R. Grace & Co. Reactive plastisol dispersion
EP0281808B1 (de) * 1987-03-12 1994-07-20 Siemens Aktiengesellschaft Strahlungsvernetzbares Polymersystem zur Anwendung als Photoresist und Dielektrikum für Mikroverdrahtungen
US4835553A (en) * 1988-08-25 1989-05-30 Xerox Corporation Thermal ink jet printhead with increased drop generation rate
JPH0813286B2 (ja) 1989-05-28 1996-02-14 コクヨ株式会社 ワゴン
JPH0311350A (ja) * 1989-06-09 1991-01-18 Tosoh Corp ネガ型感光性塗膜材
US5091287A (en) * 1990-04-10 1992-02-25 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
US5132707A (en) * 1990-12-24 1992-07-21 Xerox Corporation Ink jet printhead
JPH04294148A (ja) * 1991-03-25 1992-10-19 Canon Inc 液体噴射記録ヘッド
US5336720A (en) * 1991-06-05 1994-08-09 Rohm And Haas Company Impact resistant polymers
JP3011350B2 (ja) 1992-06-11 2000-02-21 株式会社竹中工務店 機器・配管類の取付方法およびそれに用いる吊上げ型揚重機
DE59309908D1 (de) * 1992-06-13 2000-01-27 Aventis Res & Tech Gmbh & Co Polymerelektrolyt-Membran und Verfahren zu ihrer Herstellung
US5268444A (en) * 1993-04-02 1993-12-07 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Phenylethynyl-terminated poly(arylene ethers)
JP3281473B2 (ja) * 1994-01-17 2002-05-13 日本化薬株式会社 フレキシブルプリント配線板用レジストインキ組成物及びその硬化物
US5607824A (en) * 1994-07-27 1997-03-04 International Business Machines Corporation Antireflective coating for microlithography
TW318857B (enExample) * 1995-01-20 1997-11-01 Sumitomo Chemical Co
US5783799A (en) * 1996-01-11 1998-07-21 Illinois Tool Works Inc. Series resonant converter, and method and apparatus for control thereof
US5994425A (en) * 1996-08-29 1999-11-30 Xerox Corporation Curable compositions containing photosensitive high performance aromatic ether polymers
US5761809A (en) * 1996-08-29 1998-06-09 Xerox Corporation Process for substituting haloalkylated polymers with unsaturated ester, ether, and alkylcarboxymethylene groups
US5739254A (en) * 1996-08-29 1998-04-14 Xerox Corporation Process for haloalkylation of high performance polymers
US5945253A (en) * 1996-08-29 1999-08-31 Xerox Corporation High performance curable polymers and processes for the preparation thereof
US5849809A (en) * 1996-08-29 1998-12-15 Xerox Corporation Hydroxyalkylated high performance curable polymers
US5958995A (en) * 1996-08-29 1999-09-28 Xerox Corporation Blends containing photosensitive high performance aromatic ether curable polymers
US5820771A (en) * 1996-09-12 1998-10-13 Xerox Corporation Method and materials, including polybenzoxazole, for fabricating an ink-jet printhead
US5907333A (en) * 1997-03-28 1999-05-25 Lexmark International, Inc. Ink jet print head containing a radiation curable resin layer
US6117967A (en) * 1999-06-04 2000-09-12 Xerox Corporation Arylene ether alcohol polymers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6716956B2 (en) 2002-01-09 2004-04-06 Xerox Corporation Process for preparing polyarylene ethers
JP2010067621A (ja) * 2007-09-11 2010-03-25 Fujifilm Corp ナノインプリント用硬化性組成物、硬化物およびその製造方法
JP2010067935A (ja) * 2007-11-02 2010-03-25 Fujifilm Corp ナノインプリント用硬化性組成物、硬化物およびその製造方法
JP2009244801A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 感光性樹脂組成物、高分子化合物、パターンの製造法および電子デバイス

Also Published As

Publication number Publication date
US6323301B1 (en) 2001-11-27
EP0827029A3 (en) 1998-06-17
US6124372A (en) 2000-09-26
US6151042A (en) 2000-11-21
EP0827029A2 (en) 1998-03-04

Similar Documents

Publication Publication Date Title
JPH1097073A (ja) ポリマー組成物及びそのポリマーの製造方法
JP4180135B2 (ja) ポリマーの製造方法
JP4138050B2 (ja) ポリマー組成物及びそのポリマーの製造方法
JPH10120743A (ja) 組成物及びポリマーの架橋又は鎖延長方法
JPH1097073A5 (enExample)
JP4116115B2 (ja) ポリマー組成物、ポリマーの架橋又は鎖延長方法及び光硬化可能ポリマー組成物の製造方法
JPH1090897A (ja) ポリマー組成物及びそのポリマーの製造方法
JPH1090895A (ja) ポリマー組成物及びそのポリマーの製造方法
US6260949B1 (en) Photoresist compositions for ink jet printheads
JPH1090896A5 (enExample)
JP4262315B2 (ja) ポリマー組成物及びそのポリマーの製造方法
US5863963A (en) Halomethylated high performance curable polymers
JP4173211B2 (ja) ポリマー組成物及びそのポリマーの製造方法
US6020119A (en) Process for halomethylation of high performance polymers

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040827

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040910

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071128

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071225

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080325

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080328

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080424

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080430

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080519

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080722