JPH10173169A5 - - Google Patents

Info

Publication number
JPH10173169A5
JPH10173169A5 JP1996335709A JP33570996A JPH10173169A5 JP H10173169 A5 JPH10173169 A5 JP H10173169A5 JP 1996335709 A JP1996335709 A JP 1996335709A JP 33570996 A JP33570996 A JP 33570996A JP H10173169 A5 JPH10173169 A5 JP H10173169A5
Authority
JP
Japan
Prior art keywords
film
oxide film
metal oxide
conductive metal
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996335709A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10173169A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8335709A priority Critical patent/JPH10173169A/ja
Priority claimed from JP8335709A external-priority patent/JPH10173169A/ja
Priority to US08/988,554 priority patent/US6214724B1/en
Publication of JPH10173169A publication Critical patent/JPH10173169A/ja
Publication of JPH10173169A5 publication Critical patent/JPH10173169A5/ja
Pending legal-status Critical Current

Links

JP8335709A 1996-12-16 1996-12-16 半導体装置及びその製造方法 Pending JPH10173169A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8335709A JPH10173169A (ja) 1996-12-16 1996-12-16 半導体装置及びその製造方法
US08/988,554 US6214724B1 (en) 1996-12-16 1997-12-11 Semiconductor device and manufacturing method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8335709A JPH10173169A (ja) 1996-12-16 1996-12-16 半導体装置及びその製造方法

Publications (2)

Publication Number Publication Date
JPH10173169A JPH10173169A (ja) 1998-06-26
JPH10173169A5 true JPH10173169A5 (enExample) 2004-11-25

Family

ID=18291610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8335709A Pending JPH10173169A (ja) 1996-12-16 1996-12-16 半導体装置及びその製造方法

Country Status (2)

Country Link
US (1) US6214724B1 (enExample)
JP (1) JPH10173169A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7245018B1 (en) * 1999-06-22 2007-07-17 Semiconductor Energy Laboratory Co., Ltd. Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof
KR20010059854A (ko) * 1999-12-30 2001-07-06 박종섭 반도체장치 및 그 제조방법
JP2002260951A (ja) * 2000-12-28 2002-09-13 Denso Corp 積層型誘電素子及びその製造方法，並びに電極用ペースト材料
KR100743618B1 (ko) * 2000-12-29 2007-07-27 주식회사 하이닉스반도체 반도체 소자의 게이트 및 그 제조방법
US6762090B2 (en) * 2001-09-13 2004-07-13 Hynix Semiconductor Inc. Method for fabricating a capacitor
US7019351B2 (en) * 2003-03-12 2006-03-28 Micron Technology, Inc. Transistor devices, and methods of forming transistor devices and circuit devices
US7297602B2 (en) * 2003-09-09 2007-11-20 Sharp Laboratories Of America, Inc. Conductive metal oxide gate ferroelectric memory transistor
US7378286B2 (en) * 2004-08-20 2008-05-27 Sharp Laboratories Of America, Inc. Semiconductive metal oxide thin film ferroelectric memory transistor
US7109079B2 (en) * 2005-01-26 2006-09-19 Freescale Semiconductor, Inc. Metal gate transistor CMOS process and method for making
JP4602214B2 (ja) * 2005-10-03 2010-12-22 富士通セミコンダクター株式会社 半導体装置およびその製造方法
US8963163B2 (en) 2009-10-05 2015-02-24 Sumitomo Electric Industries, Ltd. Semiconductor device
KR20250150667A (ko) 2010-02-26 2025-10-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
US20140269046A1 (en) * 2013-03-15 2014-09-18 Micron Technology, Inc. Apparatuses and methods for use in selecting or isolating memory cells

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5358892A (en) * 1993-02-11 1994-10-25 Micron Semiconductor, Inc. Etch stop useful in avoiding substrate pitting with poly buffered locos
US5472904A (en) * 1994-03-02 1995-12-05 Micron Technology, Inc. Thermal trench isolation
KR0135691B1 (ko) * 1994-07-20 1998-04-22 김주용 트랜지스터 및 그 제조방법

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