JPH10172904A - 投影露光方法及び投影露光装置並びに投影光学系 - Google Patents

投影露光方法及び投影露光装置並びに投影光学系

Info

Publication number
JPH10172904A
JPH10172904A JP9253982A JP25398297A JPH10172904A JP H10172904 A JPH10172904 A JP H10172904A JP 9253982 A JP9253982 A JP 9253982A JP 25398297 A JP25398297 A JP 25398297A JP H10172904 A JPH10172904 A JP H10172904A
Authority
JP
Japan
Prior art keywords
optical system
projection optical
lens
change
lens group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9253982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10172904A5 (enExample
Inventor
Tomoyuki Matsuyama
知行 松山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPH10172904A publication Critical patent/JPH10172904A/ja
Publication of JPH10172904A5 publication Critical patent/JPH10172904A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9253982A 1996-09-30 1997-09-18 投影露光方法及び投影露光装置並びに投影光学系 Withdrawn JPH10172904A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/724167 1996-09-30
US08/724,167 US5852490A (en) 1996-09-30 1996-09-30 Projection exposure method and apparatus

Publications (2)

Publication Number Publication Date
JPH10172904A true JPH10172904A (ja) 1998-06-26
JPH10172904A5 JPH10172904A5 (enExample) 2005-07-28

Family

ID=24909303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9253982A Withdrawn JPH10172904A (ja) 1996-09-30 1997-09-18 投影露光方法及び投影露光装置並びに投影光学系

Country Status (3)

Country Link
US (2) US5852490A (enExample)
JP (1) JPH10172904A (enExample)
DE (1) DE19743236A1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3925576B2 (ja) 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19929403A1 (de) * 1999-06-26 2000-12-28 Zeiss Carl Fa Objektiv, insbesondere Objektiv für eine Halbleiter-Lithographie-Projektionsbelichtungsanlage und Herstellungverfahren
DE10000193B4 (de) 2000-01-05 2007-05-03 Carl Zeiss Smt Ag Optisches System
US7203007B2 (en) * 2000-05-04 2007-04-10 Carl Zeiss Smt Ag Projection exposure machine comprising a projection lens
DE10119861A1 (de) 2000-05-04 2001-11-08 Zeiss Carl Projektionsobjektiv, insbesondere für die Mikrolithographie
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
DE10221386A1 (de) * 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
TWI249082B (en) * 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
WO2005022614A1 (ja) * 2003-08-28 2005-03-10 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR101700546B1 (ko) * 2004-06-10 2017-01-26 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
US7961291B2 (en) * 2005-12-23 2011-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008016011A1 (de) 2007-03-27 2008-10-02 Carl Zeiss Smt Ag Korrektur optischer Elemente mittels flach eingestrahltem Korrekturlicht
CN102540416B (zh) * 2010-12-10 2014-09-17 上海微电子装备有限公司 大视场大工作距投影光刻物镜
CN104813214B (zh) 2012-10-31 2017-03-22 大族激光科技产业集团股份有限公司 一种近红外激光聚焦镜头及激光印刷设备
CN104808313A (zh) * 2015-05-07 2015-07-29 中国科学院光电技术研究所 一种用于光刻精密工件台的针孔检测镜头
WO2017191777A1 (ja) * 2016-05-06 2017-11-09 株式会社ニコン ビーム走査装置および描画装置
CN114859515B (zh) * 2022-05-23 2024-01-12 张家港中贺自动化科技有限公司 一种用于投影光刻的折反式物镜光学系统及投影光刻系统
CN118068543B (zh) * 2024-04-19 2024-06-25 南京信息工程大学 一种长工作距高分辨率物方远心镜头

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458250A (en) * 1965-04-22 1969-07-29 Ednalite Corp Seven-element lens system for electrophotographic reproduction of fluorescent images
US3504961A (en) * 1968-04-01 1970-04-07 Perkin Elmer Corp Modified double gauss objective
US3897138A (en) * 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
JPS5336326B2 (enExample) * 1972-12-26 1978-10-02
JPS58147708A (ja) * 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
US4666273A (en) * 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4811055A (en) * 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
US4772107A (en) * 1986-11-05 1988-09-20 The Perkin-Elmer Corporation Wide angle lens with improved flat field characteristics
JPH0812329B2 (ja) * 1986-11-06 1996-02-07 株式会社シグマ 投影レンズ
US4770477A (en) * 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
JPH01193809A (ja) * 1988-01-29 1989-08-03 Canon Inc ズームレンズ
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
US5105075A (en) * 1988-09-19 1992-04-14 Canon Kabushiki Kaisha Projection exposure apparatus
JPH02232613A (ja) * 1989-03-07 1990-09-14 Konica Corp コンパクトなズームレンズ
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JP3353902B2 (ja) * 1990-12-12 2002-12-09 オリンパス光学工業株式会社 投影レンズ系
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
US5420417A (en) * 1991-10-08 1995-05-30 Nikon Corporation Projection exposure apparatus with light distribution adjustment
JP3298131B2 (ja) * 1991-10-24 2002-07-02 株式会社ニコン 縮小投影レンズ
US5335044A (en) * 1992-02-26 1994-08-02 Nikon Corporation Projection type exposure apparatus and method of exposure
US5329336A (en) * 1992-07-06 1994-07-12 Nikon Corporation Exposure method and apparatus
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
JPH06313845A (ja) * 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系

Also Published As

Publication number Publication date
US5852490A (en) 1998-12-22
DE19743236A1 (de) 1998-04-02
US5920379A (en) 1999-07-06

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