DE19743236A1 - Projektionsbelichtungsverfahren und Vorrichtung dafür - Google Patents
Projektionsbelichtungsverfahren und Vorrichtung dafürInfo
- Publication number
- DE19743236A1 DE19743236A1 DE19743236A DE19743236A DE19743236A1 DE 19743236 A1 DE19743236 A1 DE 19743236A1 DE 19743236 A DE19743236 A DE 19743236A DE 19743236 A DE19743236 A DE 19743236A DE 19743236 A1 DE19743236 A1 DE 19743236A1
- Authority
- DE
- Germany
- Prior art keywords
- lens
- lens group
- optical system
- projection optical
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 230000003287 optical effect Effects 0.000 claims abstract description 415
- 230000008859 change Effects 0.000 claims abstract description 190
- 230000004075 alteration Effects 0.000 claims abstract description 106
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 230000005499 meniscus Effects 0.000 claims description 139
- 206010073261 Ovarian theca cell tumour Diseases 0.000 claims description 27
- 208000001644 thecoma Diseases 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 20
- 230000008602 contraction Effects 0.000 claims description 16
- 238000005286 illumination Methods 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000000059 patterning Methods 0.000 claims 2
- 206010010071 Coma Diseases 0.000 abstract description 30
- 235000012431 wafers Nutrition 0.000 description 49
- 125000006850 spacer group Chemical group 0.000 description 16
- 201000009310 astigmatism Diseases 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 230000007613 environmental effect Effects 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 238000010276 construction Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000004304 visual acuity Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 2
- 241000276498 Pollachius virens Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000029305 taxis Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/724,167 US5852490A (en) | 1996-09-30 | 1996-09-30 | Projection exposure method and apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19743236A1 true DE19743236A1 (de) | 1998-04-02 |
Family
ID=24909303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19743236A Withdrawn DE19743236A1 (de) | 1996-09-30 | 1997-09-30 | Projektionsbelichtungsverfahren und Vorrichtung dafür |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US5852490A (enExample) |
| JP (1) | JPH10172904A (enExample) |
| DE (1) | DE19743236A1 (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000033138A1 (de) * | 1998-11-30 | 2000-06-08 | Carl Zeiss | Hochaperturiges projektionsobjektiv mit minimalem blendenfehler |
| EP1006389A3 (de) * | 1998-11-30 | 2002-03-20 | Carl Zeiss | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
| EP1006387A3 (de) * | 1998-11-30 | 2002-05-02 | Carl Zeiss | Projektionsobjektiv für die Mikrolithographie |
| US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3925576B2 (ja) | 1997-07-24 | 2007-06-06 | 株式会社ニコン | 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法 |
| JPH1195095A (ja) | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| US6700645B1 (en) | 1998-01-22 | 2004-03-02 | Nikon Corporation | Projection optical system and exposure apparatus and method |
| JPH11214293A (ja) * | 1998-01-22 | 1999-08-06 | Nikon Corp | 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 |
| US5969803A (en) * | 1998-06-30 | 1999-10-19 | Nikon Corporation | Large NA projection lens for excimer laser lithographic systems |
| US6198576B1 (en) * | 1998-07-16 | 2001-03-06 | Nikon Corporation | Projection optical system and exposure apparatus |
| DE19929403A1 (de) * | 1999-06-26 | 2000-12-28 | Zeiss Carl Fa | Objektiv, insbesondere Objektiv für eine Halbleiter-Lithographie-Projektionsbelichtungsanlage und Herstellungverfahren |
| DE10000193B4 (de) | 2000-01-05 | 2007-05-03 | Carl Zeiss Smt Ag | Optisches System |
| US7203007B2 (en) * | 2000-05-04 | 2007-04-10 | Carl Zeiss Smt Ag | Projection exposure machine comprising a projection lens |
| DE10119861A1 (de) | 2000-05-04 | 2001-11-08 | Zeiss Carl | Projektionsobjektiv, insbesondere für die Mikrolithographie |
| DE10064685A1 (de) * | 2000-12-22 | 2002-07-04 | Zeiss Carl | Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft |
| JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法 |
| DE10221386A1 (de) * | 2002-05-14 | 2003-11-27 | Zeiss Carl Smt Ag | Projektionsbelichtungssystem |
| TWI249082B (en) * | 2002-08-23 | 2006-02-11 | Nikon Corp | Projection optical system and method for photolithography and exposure apparatus and method using same |
| US7348575B2 (en) | 2003-05-06 | 2008-03-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| SG10201405231YA (en) | 2003-05-06 | 2014-09-26 | Nippon Kogaku Kk | Projection optical system, exposure apparatus, and exposure method |
| WO2005022614A1 (ja) * | 2003-08-28 | 2005-03-10 | Nikon Corporation | 露光方法及び装置、並びにデバイス製造方法 |
| KR101700546B1 (ko) * | 2004-06-10 | 2017-01-26 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법, 및 디바이스 제조 방법 |
| US7961291B2 (en) * | 2005-12-23 | 2011-06-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102008016011A1 (de) | 2007-03-27 | 2008-10-02 | Carl Zeiss Smt Ag | Korrektur optischer Elemente mittels flach eingestrahltem Korrekturlicht |
| CN102540416B (zh) * | 2010-12-10 | 2014-09-17 | 上海微电子装备有限公司 | 大视场大工作距投影光刻物镜 |
| CN104813214B (zh) | 2012-10-31 | 2017-03-22 | 大族激光科技产业集团股份有限公司 | 一种近红外激光聚焦镜头及激光印刷设备 |
| CN104808313A (zh) * | 2015-05-07 | 2015-07-29 | 中国科学院光电技术研究所 | 一种用于光刻精密工件台的针孔检测镜头 |
| WO2017191777A1 (ja) * | 2016-05-06 | 2017-11-09 | 株式会社ニコン | ビーム走査装置および描画装置 |
| CN114859515B (zh) * | 2022-05-23 | 2024-01-12 | 张家港中贺自动化科技有限公司 | 一种用于投影光刻的折反式物镜光学系统及投影光刻系统 |
| CN118068543B (zh) * | 2024-04-19 | 2024-06-25 | 南京信息工程大学 | 一种长工作距高分辨率物方远心镜头 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3458250A (en) * | 1965-04-22 | 1969-07-29 | Ednalite Corp | Seven-element lens system for electrophotographic reproduction of fluorescent images |
| US3504961A (en) * | 1968-04-01 | 1970-04-07 | Perkin Elmer Corp | Modified double gauss objective |
| US3897138A (en) * | 1971-11-24 | 1975-07-29 | Canon Kk | Projection lens for mask pattern printing |
| JPS5336326B2 (enExample) * | 1972-12-26 | 1978-10-02 | ||
| JPS58147708A (ja) * | 1982-02-26 | 1983-09-02 | Nippon Kogaku Kk <Nikon> | 照明用光学装置 |
| US4666273A (en) * | 1983-10-05 | 1987-05-19 | Nippon Kogaku K. K. | Automatic magnification correcting system in a projection optical apparatus |
| GB2153543B (en) * | 1983-12-28 | 1988-09-01 | Canon Kk | A projection exposure apparatus |
| US4811055A (en) * | 1984-02-27 | 1989-03-07 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| US4772107A (en) * | 1986-11-05 | 1988-09-20 | The Perkin-Elmer Corporation | Wide angle lens with improved flat field characteristics |
| JPH0812329B2 (ja) * | 1986-11-06 | 1996-02-07 | 株式会社シグマ | 投影レンズ |
| US4770477A (en) * | 1986-12-04 | 1988-09-13 | The Perkin-Elmer Corporation | Lens usable in the ultraviolet |
| JPH01193809A (ja) * | 1988-01-29 | 1989-08-03 | Canon Inc | ズームレンズ |
| US4918583A (en) * | 1988-04-25 | 1990-04-17 | Nikon Corporation | Illuminating optical device |
| US5105075A (en) * | 1988-09-19 | 1992-04-14 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| JPH02232613A (ja) * | 1989-03-07 | 1990-09-14 | Konica Corp | コンパクトなズームレンズ |
| JP3041939B2 (ja) * | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
| JP3353902B2 (ja) * | 1990-12-12 | 2002-12-09 | オリンパス光学工業株式会社 | 投影レンズ系 |
| JPH04369209A (ja) * | 1991-06-17 | 1992-12-22 | Nikon Corp | 露光用照明装置 |
| US5420417A (en) * | 1991-10-08 | 1995-05-30 | Nikon Corporation | Projection exposure apparatus with light distribution adjustment |
| JP3298131B2 (ja) * | 1991-10-24 | 2002-07-02 | 株式会社ニコン | 縮小投影レンズ |
| US5335044A (en) * | 1992-02-26 | 1994-08-02 | Nikon Corporation | Projection type exposure apparatus and method of exposure |
| US5329336A (en) * | 1992-07-06 | 1994-07-12 | Nikon Corporation | Exposure method and apparatus |
| JP3747951B2 (ja) * | 1994-11-07 | 2006-02-22 | 株式会社ニコン | 反射屈折光学系 |
| JPH06313845A (ja) * | 1993-04-28 | 1994-11-08 | Olympus Optical Co Ltd | 投影レンズ系 |
-
1996
- 1996-09-30 US US08/724,167 patent/US5852490A/en not_active Expired - Fee Related
-
1997
- 1997-09-18 JP JP9253982A patent/JPH10172904A/ja not_active Withdrawn
- 1997-09-30 DE DE19743236A patent/DE19743236A1/de not_active Withdrawn
-
1998
- 1998-08-21 US US09/138,302 patent/US5920379A/en not_active Expired - Fee Related
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000033138A1 (de) * | 1998-11-30 | 2000-06-08 | Carl Zeiss | Hochaperturiges projektionsobjektiv mit minimalem blendenfehler |
| EP1006389A3 (de) * | 1998-11-30 | 2002-03-20 | Carl Zeiss | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
| EP1006387A3 (de) * | 1998-11-30 | 2002-05-02 | Carl Zeiss | Projektionsobjektiv für die Mikrolithographie |
| US6522484B1 (en) | 1998-11-30 | 2003-02-18 | Carl-Zeiss-Stiftung | Projection objective |
| US8355201B2 (en) | 2004-01-14 | 2013-01-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8416490B2 (en) | 2004-01-14 | 2013-04-09 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8208199B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8289619B2 (en) | 2004-01-14 | 2012-10-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8339701B2 (en) | 2004-01-14 | 2012-12-25 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8730572B2 (en) | 2004-01-14 | 2014-05-20 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8804234B2 (en) | 2004-01-14 | 2014-08-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective including an aspherized plate |
| US8908269B2 (en) | 2004-01-14 | 2014-12-09 | Carl Zeiss Smt Gmbh | Immersion catadioptric projection objective having two intermediate images |
| US9772478B2 (en) | 2004-01-14 | 2017-09-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with parallel, offset optical axes |
| US9019596B2 (en) | 2004-05-17 | 2015-04-28 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9134618B2 (en) | 2004-05-17 | 2015-09-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9726979B2 (en) | 2004-05-17 | 2017-08-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
Also Published As
| Publication number | Publication date |
|---|---|
| US5852490A (en) | 1998-12-22 |
| JPH10172904A (ja) | 1998-06-26 |
| US5920379A (en) | 1999-07-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8141 | Disposal/no request for examination |