JPH09512665A - 高水素希釈低温プラズマ沈着によって製造される非晶質珪素ベースの器具の向上せしめられた安定化特性 - Google Patents
高水素希釈低温プラズマ沈着によって製造される非晶質珪素ベースの器具の向上せしめられた安定化特性Info
- Publication number
- JPH09512665A JPH09512665A JP7525183A JP52518395A JPH09512665A JP H09512665 A JPH09512665 A JP H09512665A JP 7525183 A JP7525183 A JP 7525183A JP 52518395 A JP52518395 A JP 52518395A JP H09512665 A JPH09512665 A JP H09512665A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- junction
- solar cell
- deposition
- glow discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
- H01L31/076—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
- H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System
- H01L31/03767—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System presenting light-induced characteristic variations, e.g. Staebler-Wronski effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
- H01L31/204—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System including AIVBIV alloys, e.g. SiGe, SiC
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B10/00—Integration of renewable energy sources in buildings
- Y02B10/10—Photovoltaic [PV]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.非晶質珪素の少なくとも一部を低温高圧プラズマ促進化学蒸着により製作す ることにより非晶質珪素を含む装置の安定性を改良する段階を含み、該温度が実 質的に250℃より低く且つ実質的に80℃より高く、そして該圧力が少なくと も0.5トールである方法。 2.該安定性の改良が光誘発性変性の減少を含み、該装置が非晶質珪素を含む反 射コーテイングを有する光電気装置、太陽電池、太陽モジュール、太陽パネル、 太陽屋根、建物窓、およびガラスパネルよりなる群から選択される、請求の範囲 第1項記載の方法。 3.該装置が薄膜電界トランジスター、半導体、ダイオード、テレビジョン、コ ンピューターディスプレイ、マトリックスアドレスアレイ、イメージセンサーア レイ、活性マトリックス液晶ディスプレイ、医学用x線撮影装置、光受容器、光 複写機、光学式走査器、ファクシミリ機、レーザープリンター、光学センサー、 および光偏向器よりなる群から選択され、そして 該装置の該安定性の該改良段階が電流誘発性変性の減少を含む、請求の範囲第1 項記載の方法。 4.該プラズマ促進化学蒸着が無線周波数グロー放電を含み、該圧力が約2トー ル−約50トールの範囲であり、そして該温度が実質的に220℃より低い、請 求の範囲第1項記載の方法。 5.該プラズマ促進化学蒸着が直流グロー放電を含み、そして該圧力が約20ト ールより低い、請求の範囲第1項記載の方法。 6.該プラズマ促進化学蒸着が水素、重水素およびそれらの組み合わせよりなる 群から選択される希釈剤気体で高度に希釈された原料の沈着を含む、請求の範囲 第1項記載の方法。 7.該希釈剤気体対該原料の希釈比が約10:1−約10,000:1の範囲であ る、請求の範囲第6項記載の方法。 8.該原料がシラン、ジシラン、テトラメチルシラン、SiF4、SiHF3、S iH2Cl4、および一般式SiNH2N+2-MYM [式中、 Si=珪素、 H=水素または重水素 Y=ハロゲン N=>1の正の整数 M=正の整数、および 2N+2−M>0] を有する沈着気体よりなる群の少なくとも1つの員を含む、請求の範囲第6項記 載の方法。 9.該装置が非晶質珪素炭素を含みそして該原料がシラン、メタン、メチルシラ ン、シリルメタン、トリシリルメタン、アセチレン、エチレン、プロパン、ブタ ン、炭化水素気体、ハロカーボン気体、および一般式CHN(SiH3)4-N[式中 、Nは0−4の範囲の整数である]を有する沈着気体よりなる群から選択される 1種もしくはそれ以上の員を含む、請求の範囲第6項記載の方法。 10.請求の範囲第1項の方法に従い製造される装置。 11.真性層、p−i界面、およびi−n界面よりなる群から選択される非晶質 珪素活性領域を太陽電池中でグロー放電により予め選択された飽和露光時間後に 該領域の光誘発性変性の飽和を引き起こすのに十分な温度および圧力において沈 着させることにより、該太陽電池への露光後に太陽電池の光誘発性変性を実質的 に防止することを含む方法。 12.約100−200時間の自然または模擬日光への飽和露光時間後に光誘発 性飽和を引き起こすことにより100−200時間の露光後に該太陽電池の光誘 発性変性を実質的に防止することを含む方法。 13.該太陽電池が単独−接合太陽電池を含み、そして該非晶質珪素領域が該飽 和時間前に1000オングストロームの厚さ当たり実質的に15%より少なく変 性する、請求の範囲第11項記載の方法。 14.該非晶質珪素領域が該飽和時間前に1000オングストロームの厚さ当た り約10%より少なく変性する、請求の範囲第13項記載の方法。 15.該太陽電池が単独−接合太陽電池を含み、該領域が非晶質珪素炭素を含み 、 そしてそして該領域が該飽和時間前に1500オングストロームの厚さ当たり実 質的に55%より少なく変性する、請求の範囲第11項記載の方法。 16.該非晶質珪素炭素領域が該飽和時間前には1500オングストロームの厚 さ当たり約5%−約30%変性する、請求の範囲第15項記載の方法。 17.該グロー放電が約80℃−約220℃の範囲の温度における約0.1トール −約10トールの範囲の圧力におけるDCグロー放電を含む、請求の範囲第11 項記載の方法。 18.該グロー放電が水素、重水素およびそれらの組み合わせよりなる群から選 択される希釈剤による原料の希釈を含み、該原料が約10:1−約10,000 :1の範囲の希釈剤対原料の比に希釈され、そして該原料がシラン、ジシラン、 テトラメチルシラン、SiF4、SiHF3、SiH2Cl4、および一般式SiN H2N+2-MYM [式中、 Si=珪素、 H=水素または重水素 Y=ハロゲン N=>1の正の整数 M=正の整数、および 2N+2−M>0] を有する沈着気体よりなる群の少なくとも1つの員を含む、請求の範囲第17項 記載の方法。 19.該グロー放電が約80℃−約220℃の範囲の温度におけるそして約1ト ール−約50トールの範囲の圧力におけるRFグロー放電を含む、請求の範囲第 11項記載の方法。 20.該装置が非晶質珪素炭素を含み、該RFグロー放電が水素、重水素および それらの組み合わせよりなる群から選択される希釈剤による原料の希釈を含み、 該原料が約20:1−約10,000:1の範囲の希釈剤対原料の比に希釈され 、そして該原料がシラン、メタン、メチルシラン、シリルメタン、トリシリルメ タン、アセチレン、エチレン、プロパン、ブタン、炭化水素気体、ハロカーボン 気体、 一般式CHN(SiH3)4-N[式中、Nは0−4の範囲の整数である]を有する沈 着気体よりなる群から選択される1種もしくはそれ以上の員を含む、請求の範囲 第19項記載の方法。 21.0.9ボルトより大きい開路電圧および0.7より大きい充填係数を有する 太陽電池の製造を含む方法。 22.非晶質珪素または非晶質珪素炭素を含む活性領域のグロー放電沈着による 1.0ボルトより大きい開路電圧を有する太陽電池の製造を含む、請求の範囲第 21項記載の方法。 23.該グロー放電沈着が約80℃以上−約220℃の範囲の温度における約2 トール−約20トールの範囲の圧力における無線周波数グロー放電を含む、請求 の範囲第22項記載の方法。 24.非晶質珪素、非晶質珪素炭素および非晶質珪素ゲルマニウムよりなる群か ら選択される水素化された化合物を含む活性領域の直流グロー放電により9%よ り多くない変換効率を有する太陽電池の製造を含む、請求の範囲第21項記載の 方法。 25.該直流グロー放電が約80℃以上−約220℃の範囲の温度においてそし て約2トール−約20トールの範囲の圧力において起きる、請求の範囲第24項 記載の方法。 26.11%より大きい変換効率を有する太陽電池の製造を含む、請求の範囲第 21項記載の方法。 27.0.9ボルトより大きい開路電圧および0.7より大きい充填係数を有する 単独接合太陽電池を製造するのに十分な沈着温度、圧力および希釈比において希 釈剤気体で希釈された沈着気体のプラズマ沈着により太陽電池を製作する段階を 含み、該温度が実質的に250℃より低く且つ実質的に80℃より高く、そして 該圧力が少なくとも0.5トールである方法。 28.該太陽電池が1.8eVより大きい広い光学帯間隙を有し、そして該プラズ マ沈着が陰極DCグロー放電、陽極DCグロー放電、RFグロー放電、VHFグ ロー放電、ACグロー放電およびマイクロ波沈着よりなる群から選択されるグロ ー放電を含む、請求の範囲第27項記載の方法。 29.該沈着温度が約80℃−約220℃の範囲であり、該圧力が約0.1トール −約10トールの範囲であり、そして該希釈比が約10:1−約200:1の範 囲である、請求の範囲第27項記載の方法。 30.該プラズマ沈着温度が約120℃−約180℃の範囲であり、該圧力が約 2トール−約50トールの範囲であり、そして該希釈比が約20:1−約100 0:1の範囲である、請求の範囲第27項記載の方法。 31.該層が水素化された非晶質珪素ゲルマニウムを含む、請求の範囲第27項 記載の方法。 32.該層が水素化された非晶質珪素炭素を含み、該希釈剤が水素、重水素、お よびそれらの組み合わせよりなる群から選択され、そして該沈着気体がシラン、 ジシラン、テトラメチルシラン、 SiF4、SiHF3、SiH2Cl4、および一般式SiNH2N+2-MYM [式中、 Si=珪素、 H=水素または重水素 Y=ハロゲン N=>1の正の整数 M=正の整数、および 2N+2−M>0] を有する沈着気体よりなる群の少なくとも1つの員の原料を含む、請求の範囲第 27項記載の方法。 33.該層が水素化された非晶質珪素炭素を含み、該希釈剤が水素、重水素、お よびそれらの組み合わせよりなる群から選択され、そして該沈着気体がシラン、 メタン、メチルシラン、シリルメタン、トリシリルメタン、アセチレン、エチレ ン、プロパン、ブタン、炭化水素気体、ハロカーボン気体、および一般式CHN( SiH3)4-N[式中、Nは0−4の範囲の整数である]を有する沈着気体よりな る原料群を含む、請求の範囲第27項記載の方法。 34.該層と操作的に関連する少なくとも1つの接合の製造を含み、該接合が半 導 体接合、p−i−n接合、n−i−p接合、タンデム接合、単独接合、二重接合 、三重接合、多重接合、異質接合、組み換え接合、整流接合、トンネル接合およ びショッツキーバリアを含むバリア接合よりなる群から選択される、請求の範囲 第27項記載の方法。 35.該沈着気体がシランを含みそして該希釈剤気体が水素を含む、請求の範囲 第27項記載の方法。 36.希釈比を該沈着温度におけるしきい値まで増加させることにより光吸収の 飽和期間後に該太陽電池の光誘発性変性を実質的に最少にすることによる該太陽 電池の安定性の改良を含む、請求の範囲第27項記載の方法。 37.該飽和期間が約100時間−約200時間の範囲であり、該しきい値が約 10:1でありそして該沈着温度が約210℃である、請求の範囲第36項記載 の方法。 38.該飽和期間が約100時間−約200時間の範囲であり、該しきい値が約 30:1でありそして該沈着温度が約150℃である、請求の範囲第36項記載 の方法。 39.該圧力および該プラズマ沈着力が相対的に低い、請求の範囲第36項記載 の方法。 40.該活性層の成長速度の減少を含む、請求の範囲第36項記載の方法。 41.請求の範囲第36項の方法により製造される太陽電池。 42.非晶質珪素を含みそして0.9ボルトより大きい開路電圧および0.7より 大きい充填係数を有する太陽電池。 43.9%より大きい変換効率および約1.8eVより大きい光学帯間隙を有する 、請求の範囲第42項記載の太陽電池。 44.11%より大きい変換効率を有する、請求の範囲第42項記載の太陽電池 。 45.該領域が活性層であり、該太陽電池が該活性層と操作可能式に連結された 少なくとも1つの接合を含み、そして 該接合が半導体接合、p−i−n接合、n−i−p接合、タンデム接合、単独接 合、二重接合、三重接合、多重接合、異質接合、組み換え接合、整流接合、トン ネル接合およびショッツキーバリアを含むバリア接合よりなる群から選択される 、 請求の範囲第42項記載の太陽電池。 46.該領域が真性層、p−i界面、およびi−n界面よりなる群から選択され る、請求の範囲第45項記載の太陽電池。 47.該非晶質珪素が水素化された非晶質珪素、水素化された非晶質珪素炭素、 および水素化された非晶質珪素ゲルマニウムよりなる群から選択される、請求の 範囲第42項記載の太陽電池。 48.該領域が光吸収した飽和領域を含む、請求の範囲第42項記載の太陽電池 。 49.該領域が予め選択された時間の期間にわたる露光後に光誘発性変性が実質 的に防止されるような安定な層もさらに含む、請求の範囲第48項記載の太陽電 池。 50.太陽電池を1500時間より少ない時間の期間にわたり露光した後に該太 陽電池の光誘発性変性を実質的に防止するための急速光−飽和可能な非晶質珪素 −含有領域を含む太陽電池。 51.該時間の期間が約100時間−約500時間の範囲である、請求の範囲第 50項記載の太陽電池。 52.該領域が光吸収された飽和領域を含む、請求の範囲第51項記載の太陽電 池。 53.該珪素−含有領域が水素化された非晶質珪素、水素化された非晶質珪素炭 素、および水素化された非晶質珪素ゲルマニウムよりなる群から選択される活性 層を含む、請求の範囲第50項記載の太陽電池。 54.該領域が真性層を含む、請求の範囲第50項記載の太陽電池。 55.該領域がp−i界面を含む、請求の範囲第50項記載の太陽電池。 56.該領域が0.9ボルトより大きい開路電圧および0.7より大きい充填係数 を有する高電圧領域を含む、請求の範囲第50項記載の太陽電池。 57.該高電圧領域が1ボルトより大きい開路電圧を有する、請求の範囲第56 項記載の太陽電池。 58.該高電圧領域が9%より大きい変換効率を有する、請求の範囲第56項記 載の太陽電池。 59.該領域が11%より大きい変換効率を有する、請求の範囲第56項記載の 太陽電池。 60.1.8eVより大きい光学帯間隙を有する、請求の範囲第56項記載の太陽 電池。
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-
1995
- 1995-03-09 DE DE19581590T patent/DE19581590T1/de not_active Withdrawn
- 1995-03-09 GB GB9619784A patent/GB2301939B/en not_active Expired - Fee Related
- 1995-03-09 JP JP7525183A patent/JPH09512665A/ja active Pending
- 1995-03-09 CN CNB951922882A patent/CN1135635C/zh not_active Expired - Fee Related
- 1995-03-09 WO PCT/US1995/003119 patent/WO1995026571A1/en active Application Filing
- 1995-03-24 FR FR9503516A patent/FR2721754B1/fr not_active Expired - Fee Related
- 1995-03-24 IT IT95RM000184A patent/IT1278061B1/it active IP Right Grant
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- 1996-02-09 US US08/600,154 patent/US5646050A/en not_active Expired - Lifetime
-
1997
- 1997-03-12 US US08/820,431 patent/US5942049A/en not_active Expired - Lifetime
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2005
- 2005-10-26 JP JP2005311931A patent/JP2006080557A/ja active Pending
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Cited By (3)
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JP2006080557A (ja) * | 1994-03-25 | 2006-03-23 | Amoco Enron Solar | 高水素希釈低温プラズマ蒸着によって製造されるアモルファスシリコン系素子の向上せしめられた安定化特性 |
JP2008153646A (ja) * | 1994-03-25 | 2008-07-03 | Bp Corp North America Inc | 半導体素子の製造方法 |
US6326304B1 (en) | 1999-02-26 | 2001-12-04 | Kaneka Corporation | Method of manufacturing amorphous silicon based thin film photoelectric conversion device |
Also Published As
Publication number | Publication date |
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DE19581590T1 (de) | 1997-04-17 |
FR2721754B1 (fr) | 1997-12-05 |
US5646050A (en) | 1997-07-08 |
GB2301939A (en) | 1996-12-18 |
IT1278061B1 (it) | 1997-11-17 |
JP2006080557A (ja) | 2006-03-23 |
US5942049A (en) | 1999-08-24 |
JP2008153646A (ja) | 2008-07-03 |
ITRM950184A0 (it) | 1995-03-24 |
FR2721754A1 (fr) | 1995-12-29 |
WO1995026571A1 (en) | 1995-10-05 |
CN1135635C (zh) | 2004-01-21 |
GB9619784D0 (en) | 1996-11-06 |
GB2301939B (en) | 1998-10-21 |
CN1144573A (zh) | 1997-03-05 |
ITRM950184A1 (it) | 1996-09-24 |
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