JPH09507613A - ウエハ洗浄物質の再循環 - Google Patents
ウエハ洗浄物質の再循環Info
- Publication number
- JPH09507613A JPH09507613A JP7519013A JP51901395A JPH09507613A JP H09507613 A JPH09507613 A JP H09507613A JP 7519013 A JP7519013 A JP 7519013A JP 51901395 A JP51901395 A JP 51901395A JP H09507613 A JPH09507613 A JP H09507613A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- vapor pressure
- water
- low vapor
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/07—Purification ; Separation
- C01B7/0706—Purification ; Separation of hydrogen chloride
- C01B7/0712—Purification ; Separation of hydrogen chloride by distillation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
- B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/20—Nitrogen oxides; Oxyacids of nitrogen; Salts thereof
- C01B21/38—Nitric acid
- C01B21/46—Purification; Separation ; Stabilisation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/09—Bromine; Hydrogen bromide
- C01B7/093—Hydrogen bromide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
- C01B7/195—Separation; Purification
- C01B7/196—Separation; Purification by distillation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S159/00—Concentrating evaporators
- Y10S159/19—Acid
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.塩酸、フッ化水素酸、臭化水素酸および硝酸からなる群から選択される酸を 酸および水からなる液体混合物から分離するための方法であって、 a.酸−水混合物に予め決められた量の低蒸気圧物質を添加して反応混合物を形 成し、 b.該反応混合物を分離して前記低蒸気圧物質の水性溶液と酸および水蒸気から なるガスとを形成し、そして c.該ガスを再構成して酸を形成する、 工程からなる前記方法。 2.上記低蒸気圧物質が水性硫酸およびリン酸からなる群から選択される請求項 1記載の方法。 3.上記分離が蒸留により行われる請求項1記載の方法。 4.上記分離が不活性ガスパージにより行われる請求項1記載の方法。 5.上記分離が蒸留および不活性ガスパージにより行われる請求項1記載の方法 。 6.上記予め決められた量の低蒸気圧物質が0.4:1ないし2:1の低蒸気圧 物質:上記酸−水混合物の容量比を生じる請求項1記載の方法。 7.上記予め決められた量の低蒸気圧物質が分あたりの上記酸−水混合物の容量 あたりの低蒸気圧物質の容量0.1ないし10.0の間(0.1ないし10.0 の間の容量の低蒸気圧物質/上記酸−水混合物の容量/分)の予め決められた速 度で酸−水混合物に添加される請求 項1記載の方法。 8.上記反応混合物が予め決められた温度に保持される請求項1記載の方法。 9.上記不活性ガスが上記酸−水混合物のガス/ミリリットルの約0.02ない し0.4ミリリットル/分で添加される請求項4記載の方法。 10.上記不活性ガスが上記反応混合物を介してパージされる請求項4記載の方 法。 11.上記不活性ガスが上記反応混合物の表面を横切ってパージされる請求項4 記載の方法。 12.上記再構成工程が水での吸収により行われる請求項1記載の方法。 13.上記再構成工程が凝縮により行われる請求項1記載の方法。 14.0.4規定と4.5規定の間の水性酸を生じるのに十分な予め決められた 量の水が上記吸収工程で使用される請求項12記載の方法。 15.上記吸収工程が少なくとも20時間操作される請求項12記載の方法。 16.上記吸収工程が冷却器に連結された吸収カラムを介して行われる請求項1 2記載の方法。 17.半導体回路の製造において使用される洗浄コンパウンドを再循環するため の閉鎖ループプロセスにおいて使用される請求項1記載の方法。 18.上記低蒸気圧物質が蒸留および過剰な水および混 入物の除去を介して閉鎖ループプロセスから獲得される請求項17記載の方法。 19.塩酸、フッ化水素酸、臭化水素酸および硝酸からなる群から選択される水 性酸を酸、水および混入物からなる液体混合物から精製するための方法であって 、 a.酸−水混合物に、硫酸およびリン酸からなる群から選択される予め決められ た量の液体低蒸気圧物質を予め決められた速度で添加して、0.4:1と2:1 の間の低蒸気圧物質:酸の容量比の反応混合物を形成し、 b.該反応混合物を分離して前記低蒸気圧物質の水性溶液と酸および水蒸気から なるガスとを形成し、そして c.水を有する前記ガスを再構成して水性状態にある酸を形成する、 工程からなる前記方法。 20.塩酸およびフッ化水素酸からなる群から選択される酸を含有する液体洗浄 コンパウンドをそれらの使用のポイントで酸、水および混入物からなる液体混合 物から再循環するための方法であって、該方法は集積回路の製造のための閉鎖ル ーププロセスにおける使用に適用され得、 a.酸−水混合物に、硫酸およびリン酸からなる群から選択される予め決められ た量の液体低蒸気圧物質を添加して、0.4:1と2:1の間の低蒸気圧物質: 酸の容量比の反応混合物を形成し、 b.該反応混合物の温度を制御し、 c.該反応混合物を分離して前記低蒸気圧物質の水性溶液と酸および水蒸気から なるガスとを形成し、そして d.該ガスを水に吸収して水性状態にある酸を形成する、 工程からなる前記方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/180,546 US5632866A (en) | 1994-01-12 | 1994-01-12 | Point-of-use recycling of wafer cleaning substances |
US08/180,546 | 1994-01-12 | ||
PCT/US1994/012750 WO1995019211A1 (en) | 1994-01-12 | 1994-11-14 | Recycling of wafer cleaning substances |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09507613A true JPH09507613A (ja) | 1997-07-29 |
JP3600834B2 JP3600834B2 (ja) | 2004-12-15 |
Family
ID=22660849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51901395A Expired - Fee Related JP3600834B2 (ja) | 1994-01-12 | 1994-11-14 | ウエハ洗浄物質の再循環 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5632866A (ja) |
EP (1) | EP0739228B1 (ja) |
JP (1) | JP3600834B2 (ja) |
AU (1) | AU1254395A (ja) |
DE (1) | DE69430706T2 (ja) |
WO (1) | WO1995019211A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008150236A (ja) * | 2006-12-15 | 2008-07-03 | Stella Chemifa Corp | フッ酸及び塩酸の回収方法 |
JP2008189483A (ja) * | 2007-02-01 | 2008-08-21 | Morita Kagaku Kogyo Kk | フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5785820A (en) * | 1994-01-07 | 1998-07-28 | Startec Ventures, Inc. | On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing |
US6350425B2 (en) * | 1994-01-07 | 2002-02-26 | Air Liquide America Corporation | On-site generation of ultra-high-purity buffered-HF and ammonium fluoride |
US6004433A (en) | 1997-02-03 | 1999-12-21 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes George Claude | Purification of electronic specialty gases by vapor phase transfilling |
US6310017B1 (en) | 1999-02-01 | 2001-10-30 | Ct Associates, Inc. | Cleaner composition, method for making and using same |
SG92720A1 (en) * | 1999-07-14 | 2002-11-19 | Nisso Engineering Co Ltd | Method and apparatus for etching silicon |
DE19948206A1 (de) * | 1999-10-07 | 2001-04-12 | Merck Patent Gmbh | Verfahren zur Herstellung hochreiner Salzsäure |
US6423290B1 (en) | 2000-05-31 | 2002-07-23 | International Business Machines Corporation | Method for recovering an organic solvent from an acidic waste stream such as in integrated chip manufacturing |
US6551412B1 (en) | 2001-07-16 | 2003-04-22 | Taiwan Semiconductor Manufacturing Company | Non-tubular type recycle system of wet bench tank |
US6737034B2 (en) * | 2001-08-02 | 2004-05-18 | The United States Of America As Represented By The Secretary Of The Army | Nitric acid production |
US20060196541A1 (en) * | 2005-03-04 | 2006-09-07 | David Gerken | Control of fluid conditions in bulk fluid distribution systems |
US7810516B2 (en) * | 2005-03-04 | 2010-10-12 | Air Liquide Electronics U.S. Lp | Control of fluid conditions in bulk fluid distribution systems |
US20060266737A1 (en) * | 2005-05-27 | 2006-11-30 | Hanestad Ronald J | Process for removal of metals and alloys from a substrate |
CN101028919B (zh) * | 2006-02-27 | 2011-07-20 | 三菱化学工程株式会社 | 氟酸的回收方法 |
CN101028918B (zh) * | 2006-02-27 | 2012-03-28 | 三菱化学工程株式会社 | 氟酸的回收方法 |
US7743783B2 (en) * | 2006-04-04 | 2010-06-29 | Air Liquide Electronics U.S. Lp | Method and apparatus for recycling process fluids |
US20070251585A1 (en) * | 2006-04-28 | 2007-11-01 | David Paul Edwards | Fluid distribution system |
US20110079250A1 (en) * | 2009-10-01 | 2011-04-07 | Mt Systems, Inc. | Post-texturing cleaning method for photovoltaic silicon substrates |
US9102604B1 (en) * | 2010-02-15 | 2015-08-11 | Baxter International Inc. | Methods for cleaning distilling columns |
US20120091099A1 (en) * | 2010-10-18 | 2012-04-19 | Applied Materials, Inc. | Methods and apparatus for recovery and reuse of reagents |
US9298521B1 (en) * | 2013-04-29 | 2016-03-29 | Seagate Technology Llc | Command sets and functions |
RU2601007C2 (ru) * | 2013-10-29 | 2016-10-27 | Общество с ограниченной ответственностью "Новые химические продукты" | Способ извлечения фтористого водорода из его водных растворов |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4686965A (en) * | 1985-02-08 | 1987-08-18 | Richard Wolf Gmbh | Instrument for endoscopic operations |
US5176699A (en) * | 1991-06-05 | 1993-01-05 | Harold Markham | Surgical device with double jaw actuation |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3394056A (en) * | 1965-08-31 | 1968-07-23 | Exxon Research Engineering Co | Recovery of anhydrous hci from aqueous azeotropes by plural stage distillation |
DE1914579A1 (de) * | 1969-03-21 | 1970-09-24 | Sigri Elektrographit Gmbh | Verfahren und Vorrichtung zur vollstaendigen Zerlegung waessriger Salzsaeure |
US3635664A (en) * | 1969-08-20 | 1972-01-18 | Daido Chem Eng Corp | REGENERATION OF HYDROCHLORIC ACID PICKLING WASTE BY H{11 SO{11 {0 ADDITION, DISTILLATION AND FeSO{11 {0 Precipitation |
US4261791A (en) * | 1979-09-25 | 1981-04-14 | Rca Corporation | Two step method of cleaning silicon wafers |
FI67409C (fi) * | 1983-01-25 | 1985-03-11 | Outokumpu Oy | Foerfarande foer regenerering av betningssyror |
US4778532A (en) * | 1985-06-24 | 1988-10-18 | Cfm Technologies Limited Partnership | Process and apparatus for treating wafers with process fluids |
US4911761A (en) * | 1984-05-21 | 1990-03-27 | Cfm Technologies Research Associates | Process and apparatus for drying surfaces |
JPS62235218A (ja) * | 1986-04-04 | 1987-10-15 | Unitika Ltd | ウランおよびフツ酸の分離回収法 |
US4855023A (en) * | 1986-10-06 | 1989-08-08 | Athens, Inc. | Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids used in semiconductor wafer cleaning |
DE3728693A1 (de) * | 1987-08-27 | 1989-03-09 | Wacker Chemitronic | Verfahren und vorrichtung zum aetzen von halbleiteroberflaechen |
US5061348A (en) * | 1988-08-12 | 1991-10-29 | Alameda Instruments | Sulfuric acid reprocessor with continuous purge of second distillation vessel |
US4980032A (en) * | 1988-08-12 | 1990-12-25 | Alameda Instruments, Inc. | Distillation method and apparatus for reprocessing sulfuric acid |
US4936955A (en) * | 1988-08-12 | 1990-06-26 | Alameda Instruments, Inc. | Hydrofluoric acid reprocessing for semiconductor standards |
US5288333A (en) * | 1989-05-06 | 1994-02-22 | Dainippon Screen Mfg. Co., Ltd. | Wafer cleaning method and apparatus therefore |
JP2787788B2 (ja) * | 1990-09-26 | 1998-08-20 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 残留物除去方法 |
US5089084A (en) * | 1990-12-03 | 1992-02-18 | Micron Technology, Inc. | Hydrofluoric acid etcher and cascade rinser |
CA2059841A1 (en) * | 1991-01-24 | 1992-07-25 | Ichiro Hayashida | Surface treating solutions and cleaning method |
US5174865A (en) * | 1991-01-25 | 1992-12-29 | Dow Deutschland Inc. | Process for purifying crude hydrochloric acid |
US5185111A (en) * | 1991-02-13 | 1993-02-09 | Polypore, Inc. | Method of producing elastomeric open cell structures |
US5242468A (en) * | 1991-03-19 | 1993-09-07 | Startec Ventures, Inc. | Manufacture of high precision electronic components with ultra-high purity liquids |
US5188986A (en) * | 1991-05-17 | 1993-02-23 | United Microelectronics Corporation | Hydrogen peroxide in basic solution to clean polycrystalline silicon after phosphorous diffusion |
JP3085549B2 (ja) * | 1991-06-29 | 2000-09-11 | アサカ理研工業株式会社 | 塩化銅廃液からの塩酸及び硫酸銅の回収方法 |
US5164093A (en) * | 1991-11-29 | 1992-11-17 | Motorola, Inc. | Apparatus and method for removing metallic contamination from fluids using silicon beads |
US5277715A (en) * | 1992-06-04 | 1994-01-11 | Micron Semiconductor, Inc. | Method of reducing particulate concentration in process fluids |
-
1994
- 1994-01-12 US US08/180,546 patent/US5632866A/en not_active Expired - Lifetime
- 1994-11-14 EP EP95903515A patent/EP0739228B1/en not_active Expired - Lifetime
- 1994-11-14 AU AU12543/95A patent/AU1254395A/en not_active Abandoned
- 1994-11-14 WO PCT/US1994/012750 patent/WO1995019211A1/en active IP Right Grant
- 1994-11-14 JP JP51901395A patent/JP3600834B2/ja not_active Expired - Fee Related
- 1994-11-14 DE DE69430706T patent/DE69430706T2/de not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4686965A (en) * | 1985-02-08 | 1987-08-18 | Richard Wolf Gmbh | Instrument for endoscopic operations |
US5176699A (en) * | 1991-06-05 | 1993-01-05 | Harold Markham | Surgical device with double jaw actuation |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008150236A (ja) * | 2006-12-15 | 2008-07-03 | Stella Chemifa Corp | フッ酸及び塩酸の回収方法 |
JP2008189483A (ja) * | 2007-02-01 | 2008-08-21 | Morita Kagaku Kogyo Kk | フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置 |
Also Published As
Publication number | Publication date |
---|---|
EP0739228A4 (en) | 1998-05-20 |
EP0739228A1 (en) | 1996-10-30 |
WO1995019211A1 (en) | 1995-07-20 |
DE69430706D1 (de) | 2002-07-04 |
DE69430706T2 (de) | 2002-09-12 |
US5632866A (en) | 1997-05-27 |
EP0739228B1 (en) | 2002-05-29 |
AU1254395A (en) | 1995-08-01 |
JP3600834B2 (ja) | 2004-12-15 |
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