JPH0587016B2 - - Google Patents

Info

Publication number
JPH0587016B2
JPH0587016B2 JP61071129A JP7112986A JPH0587016B2 JP H0587016 B2 JPH0587016 B2 JP H0587016B2 JP 61071129 A JP61071129 A JP 61071129A JP 7112986 A JP7112986 A JP 7112986A JP H0587016 B2 JPH0587016 B2 JP H0587016B2
Authority
JP
Japan
Prior art keywords
oxide film
thermal oxide
island region
forming
crystal defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61071129A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62229934A (ja
Inventor
Shinichi Shimada
Hideki Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP7112986A priority Critical patent/JPS62229934A/ja
Publication of JPS62229934A publication Critical patent/JPS62229934A/ja
Publication of JPH0587016B2 publication Critical patent/JPH0587016B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP7112986A 1986-03-31 1986-03-31 半導体装置の製造方法 Granted JPS62229934A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7112986A JPS62229934A (ja) 1986-03-31 1986-03-31 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7112986A JPS62229934A (ja) 1986-03-31 1986-03-31 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS62229934A JPS62229934A (ja) 1987-10-08
JPH0587016B2 true JPH0587016B2 (enrdf_load_stackoverflow) 1993-12-15

Family

ID=13451653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7112986A Granted JPS62229934A (ja) 1986-03-31 1986-03-31 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62229934A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2729309B2 (ja) * 1988-12-05 1998-03-18 三菱電機株式会社 半導体装置の製造方法
JP2626275B2 (ja) * 1991-02-28 1997-07-02 富士通株式会社 イオン注入モニタリング方法
JP2776272B2 (ja) * 1994-11-02 1998-07-16 日本電気株式会社 半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5238385A (en) * 1975-09-23 1977-03-24 Osamu Nakagawa Accelerateefiring device for casttangling
JPS55102227A (en) * 1979-01-29 1980-08-05 Hitachi Ltd Ion implantation

Also Published As

Publication number Publication date
JPS62229934A (ja) 1987-10-08

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