JPH0560260B2 - - Google Patents

Info

Publication number
JPH0560260B2
JPH0560260B2 JP59230634A JP23063484A JPH0560260B2 JP H0560260 B2 JPH0560260 B2 JP H0560260B2 JP 59230634 A JP59230634 A JP 59230634A JP 23063484 A JP23063484 A JP 23063484A JP H0560260 B2 JPH0560260 B2 JP H0560260B2
Authority
JP
Japan
Prior art keywords
wafer
rollers
circular substrate
state
roller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59230634A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61108137A (ja
Inventor
Hiroshi Tanaka
Yukio Kakizaki
Hiromitsu Iwata
Takeshi Naraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP59230634A priority Critical patent/JPS61108137A/ja
Priority to US06/729,968 priority patent/US4655584A/en
Publication of JPS61108137A publication Critical patent/JPS61108137A/ja
Publication of JPH0560260B2 publication Critical patent/JPH0560260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Jigs For Machine Tools (AREA)
JP59230634A 1984-05-11 1984-11-01 円形基板の位置決め装置 Granted JPS61108137A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59230634A JPS61108137A (ja) 1984-11-01 1984-11-01 円形基板の位置決め装置
US06/729,968 US4655584A (en) 1984-05-11 1985-05-03 Substrate positioning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59230634A JPS61108137A (ja) 1984-11-01 1984-11-01 円形基板の位置決め装置

Publications (2)

Publication Number Publication Date
JPS61108137A JPS61108137A (ja) 1986-05-26
JPH0560260B2 true JPH0560260B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-09-01

Family

ID=16910860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59230634A Granted JPS61108137A (ja) 1984-05-11 1984-11-01 円形基板の位置決め装置

Country Status (1)

Country Link
JP (1) JPS61108137A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2541177Y2 (ja) * 1991-06-11 1997-07-09 株式会社明電舎 着脱用架台

Also Published As

Publication number Publication date
JPS61108137A (ja) 1986-05-26

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term