JPH0559924B2 - - Google Patents

Info

Publication number
JPH0559924B2
JPH0559924B2 JP57205351A JP20535182A JPH0559924B2 JP H0559924 B2 JPH0559924 B2 JP H0559924B2 JP 57205351 A JP57205351 A JP 57205351A JP 20535182 A JP20535182 A JP 20535182A JP H0559924 B2 JPH0559924 B2 JP H0559924B2
Authority
JP
Japan
Prior art keywords
polymer
beads
layer
water
styrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57205351A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5898319A (ja
Inventor
Moorisu Chimuruman Danieru
Jozefu Purian Jan
Jansan Uiruerumu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Publication of JPS5898319A publication Critical patent/JPS5898319A/ja
Publication of JPH0559924B2 publication Critical patent/JPH0559924B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F267/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00
    • C08F267/02—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00 on to polymers of acids or salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/89—Macromolecular substances therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/95—Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132—Anti-ultraviolet fading
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
JP57205351A 1981-11-23 1982-11-22 重合体ビーズの安定水性分散液の製造法 Granted JPS5898319A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8135262 1981-11-23
GB8135262 1981-11-23

Publications (2)

Publication Number Publication Date
JPS5898319A JPS5898319A (ja) 1983-06-11
JPH0559924B2 true JPH0559924B2 (en, 2012) 1993-09-01

Family

ID=10526079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57205351A Granted JPS5898319A (ja) 1981-11-23 1982-11-22 重合体ビーズの安定水性分散液の製造法

Country Status (5)

Country Link
US (2) US4614708A (en, 2012)
EP (1) EP0080225B1 (en, 2012)
JP (1) JPS5898319A (en, 2012)
CA (1) CA1206657A (en, 2012)
DE (1) DE3265276D1 (en, 2012)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0080225B1 (en) * 1981-11-23 1985-08-07 Agfa-Gevaert N.V. Method for the preparation of stable aqueous dispersions of polymer beads and the use of these dispersions in photographic elements
US4745019A (en) * 1983-05-16 1988-05-17 American Hoechst Corporation Graphic film having a copolyester primed polyester film as its substrate
DE3331542A1 (de) * 1983-09-01 1985-03-21 Agfa-Gevaert Ag, 5090 Leverkusen Photographisches silberhalogenidaufzeichnungsmaterial
JPH0666029B2 (ja) * 1984-03-09 1994-08-24 富士写真フイルム株式会社 写真感光材料
DE3663750D1 (en) * 1986-04-08 1989-07-06 Agfa Gevaert Nv Photographic protective layer comprising beads of resinous material and water-insoluble wax
JPH0830862B2 (ja) * 1987-05-21 1996-03-27 富士写真フイルム株式会社 ハロゲン化銀写真感光材料
EP0307855B1 (en) * 1987-09-18 1993-07-14 EASTMAN KODAK COMPANY (a New Jersey corporation) Gelatin-grafted polymer particles
US4855219A (en) * 1987-09-18 1989-08-08 Eastman Kodak Company Photographic element having polymer particles covalently bonded to gelatin
US5238977A (en) * 1987-12-12 1993-08-24 Bayer Aktiengesellschaft Graft polymer dispersions
GB8809327D0 (en) * 1988-04-20 1988-05-25 Ciba Geigy Ag Anti-block layers
US4914011A (en) * 1988-11-21 1990-04-03 Eastman Kodak Company Process for forming anti-halation layers of polyester photographic film supports
GB8911859D0 (en) * 1989-05-23 1989-07-12 Ilford Ltd Polymer particles
DE3930141A1 (de) * 1989-09-09 1991-03-21 Bayer Ag Vernetzte perlpolymerisate und ihre herstellung
JP2704311B2 (ja) * 1989-10-03 1998-01-26 富士写真フイルム株式会社 写真印画紙用支持体
US5026632A (en) * 1990-03-22 1991-06-25 Eastman Kodak Company Use of gelatin-grafted and case-hardened gelatin-grafted polymer particles for relief from pressure sensitivity of photographic products
US5066572A (en) * 1990-03-22 1991-11-19 Eastman Kodak Company Control of pressure-fog with gelatin-grafted and case-hardened gelatin-grafted soft polymer latex particles
DE69018628T2 (de) * 1990-07-20 1995-10-05 Agfa Gevaert Nv Verfahren zur Herstellung von lösungsmittelfesten Polymerperlen.
DE69029944T2 (de) * 1990-11-02 1997-09-04 Agfa Gevaert Nv Verfahren zur Herstellung lithographischer Aluminium-Offset-Druckplatten
JP2727137B2 (ja) * 1991-03-19 1998-03-11 富士写真フイルム株式会社 感光性転写材料及び多色画像形成方法
JP2740986B2 (ja) * 1991-04-25 1998-04-15 富士写真フイルム株式会社 ハロゲン化銀写真感光材料
US5225474A (en) * 1992-08-18 1993-07-06 Isp Investments Inc. Emulsion polymerization composition
US5238736A (en) * 1992-09-18 1993-08-24 Minnesota Mining And Manufacturing Company Polymeric microspheres for low-friction surfaces
EP0618490A1 (en) * 1993-03-30 1994-10-05 Minnesota Mining And Manufacturing Company Silver halide photographic material having improved antistatic properties
EP0643326B1 (en) * 1993-09-09 1999-12-01 Agfa-Gevaert N.V. New type of polymer latex and its use as plasticizer in a photographic material
US5455320A (en) * 1993-11-15 1995-10-03 Eastman Kodak Company Method of making polymeric particles
JPH0854697A (ja) * 1994-04-14 1996-02-27 Agfa Gevaert Nv 放射線画像を印刷するための材料及び方法
EP0698817A1 (en) 1994-08-22 1996-02-28 Agfa-Gevaert N.V. Assortment of silver halide photographic industrial X-ray films and method of processing said assortment
EP0698625B1 (en) * 1994-08-24 1998-11-18 Agfa-Gevaert N.V. A method for the preparation of polymeric spacing particles
JP3435469B2 (ja) * 1995-01-20 2003-08-11 日本油脂Ｂａｓｆコーティングス株式会社 水性塗料組成物
DE69629734D1 (de) * 1995-02-08 2003-10-09 Agfa Gevaert Nv Partikel für Abstandskontrolle enthaltendes photographisches Silberhalogenidmaterial
EP0726490B1 (en) * 1995-02-08 2003-09-03 Agfa-Gevaert Silver halide photographic material comprising spacing particles
EP0779539B1 (en) 1995-11-27 2002-07-17 Agfa-Gevaert Thermographic material with outermost organic antistatic layer
US5709986A (en) * 1996-01-30 1998-01-20 Eastman Kodak Company Photographic elements employing polymeric particles
DE69608266T2 (de) * 1996-07-04 2000-11-02 Agfa-Gevaert N.V., Mortsel Bildelement zur Herstellung einer verbesserten Druckplatte nach dem Silbersalz-Diffusionsübertragungsverfahren
US5695919A (en) * 1996-08-12 1997-12-09 Eastman Kodak Company Coating compositions containing lubricant-loaded, nonaqueous dispersed polymer particles
US5942559A (en) * 1996-08-26 1999-08-24 Ivoclar Ag Dental light-curing opaquer
DE19710355A1 (de) 1997-03-13 1998-09-17 Bayer Ag Alkoximinomethyldioxazinderivate
US5902846A (en) * 1997-09-08 1999-05-11 Elf Atochem S.A. High-performance overprint varnishes comprising composite SMA latices
US6277933B1 (en) 1998-04-03 2001-08-21 Solutia Inc. Polyacrylonitrile particles by surfmer polymerization and sodium removal by chemical exchange
US6143835A (en) * 1998-04-03 2000-11-07 Solutia Inc. Polyacrylonitrile polymer treatment
DE19848896A1 (de) * 1998-10-23 2000-04-27 Bayer Ag Copolymerisate für Rapid Prototyping
DE19848897A1 (de) 1998-10-23 2000-04-27 Agfa Gevaert Ag Herstellung monodisperser kugelförmiger Polymerisate
US6177239B1 (en) * 1998-12-28 2001-01-23 Eastman Kodak Company Imaging element
US6174661B1 (en) 1998-12-28 2001-01-16 Eastman Kodak Company Silver halide photographic elements
US6048678A (en) * 1998-12-28 2000-04-11 Eastman Kodak Company Protective overcoat coating compositions
US6740409B1 (en) 2000-11-15 2004-05-25 Board Of Trustees Of University Of Illinois Polymer films
BR0206601B1 (pt) * 2001-01-18 2012-09-18 composição adesiva.
KR20080008421A (ko) * 2005-05-12 2008-01-23 이 아이 듀폰 디 네모아 앤드 캄파니 폴리아미드 수지 조성물
WO2007104713A1 (de) * 2006-03-16 2007-09-20 Basf Se Effektstoffe enthaltende polymerdispersionen und ihre verwendung
US10513914B1 (en) * 2015-02-02 2019-12-24 James A. Rose Casing hanger assembly
CN108730770A (zh) 2017-04-13 2018-11-02 通用电气公司 用于油的防蜡剂以及用防蜡剂来减少油产生蜡沉积的方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2548318A (en) * 1948-05-01 1951-04-10 Monsanto Chemicals Process for preparing polystyrene dispersions
GB1155997A (en) * 1966-09-30 1969-06-25 Bexford Ltd Antistatic Agents and Their Use.
US3516832A (en) * 1966-11-25 1970-06-23 Eastman Kodak Co Photographic articles and materials useful in their manufacture
FR1545262A (fr) * 1966-11-25 1968-11-08 Eastman Kodak Co Nouveau produit photographique et nouvelle composition de couchage utile pour sa préparation
DE1917090C3 (de) * 1968-04-06 1980-04-24 Sekisui Kagaku Kogyo K.K., Osaka (Japan) Verfahren zur Herstellung von Styrolpolymerteilchen mit einheitlichen Größen
FR1594318A (en, 2012) * 1968-12-11 1970-06-01
US3856530A (en) * 1969-10-29 1974-12-24 Agfa Gevaert Photographic polyester film material comprising antistatic layer
BE757467A (en, 2012) * 1969-10-29 1971-04-14 Agfa Gevaert Nv
GB1293189A (en) * 1970-06-04 1972-10-18 Agfa Gevaert Photographic silver halide element
GB1452478A (en) * 1972-11-22 1976-10-13 Agfa Gevaert Process for homogeneously dispersing polymer particles in aqueous medium
JPS5321646B2 (en, 2012) * 1973-04-27 1978-07-04
JPS5232757B2 (en, 2012) * 1973-08-14 1977-08-23
US4187113A (en) * 1975-11-05 1980-02-05 Imperial Chemical Industries Limited Voided films of polyester with polyolefin particles
GB1591924A (en) * 1976-10-25 1981-07-01 Berger Jenson & Nicholson Ltd Polymer aggregates
JPS5427008A (en) * 1977-07-30 1979-03-01 Japan Synthetic Rubber Co Ltd Paper coating agent
JPS6059242B2 (ja) * 1977-08-24 1985-12-24 日本純薬株式会社 一液硬化型乳化重合体の製造方法
JPS55721A (en) * 1978-06-19 1980-01-07 Showa Denko Kk Aqueous dispersion of water-soluble high polymer complex
EP0011190B1 (de) * 1978-11-14 1983-02-16 Bayer Ag Füllstoffhaltige, vernetzte Perlpolymerisate
ZA796171B (en) * 1978-12-07 1980-11-26 Ici Ltd Manufacture of polymer dispersions and coating compositions derived from them
DE2919822A1 (de) * 1979-05-16 1980-11-27 Agfa Gevaert Ag Verfahren zur herstellung von mattierungsschichten
DE3008748A1 (de) * 1980-03-07 1981-09-24 Bayer Ag, 5090 Leverkusen Verfahren zur herstellung von ethylen-venylester-pfropfpolymerisatdispersionen
US4482671A (en) * 1980-03-21 1984-11-13 Scm Corporation Base for a graft polymer, novel graft polymer compositions, solvent and water-reducible coatings incorporating the novel graft polymers, and processes for making them
JPS5714835A (en) * 1980-07-01 1982-01-26 Fuji Photo Film Co Ltd Photographic sensitive silver halide material
DE3105779A1 (de) * 1981-02-17 1982-09-02 Bayer Ag, 5090 Leverkusen Waessrige dispersionen, ihre herstellung und verwendung
JPS57139151A (en) * 1981-02-24 1982-08-27 Sekisui Chem Co Ltd Production of water-dispersed resin
JPS57139152A (en) * 1981-02-24 1982-08-27 Sekisui Chem Co Ltd Production of water-dispersed resin
DE3269599D1 (en) * 1981-06-29 1986-04-10 Dulux Australia Ltd Stable aqueous film-forming dispersions
EP0080225B1 (en) * 1981-11-23 1985-08-07 Agfa-Gevaert N.V. Method for the preparation of stable aqueous dispersions of polymer beads and the use of these dispersions in photographic elements
GB2120261B (en) * 1982-05-20 1985-10-30 Ici Plc Polymerisation process
FR2528436B1 (fr) * 1982-06-10 1985-12-20 Rhone Poulenc Spec Chim Latex de polymeres pour applications biologiques et procede de preparation
EP0099179A3 (en) * 1982-06-22 1987-01-21 Imperial Chemical Industries Plc Particulate dispersions
GB8300773D0 (en) * 1983-01-12 1983-02-16 Ici Plc Coating compositions
DE3319340A1 (de) * 1983-05-27 1984-11-29 Röhm GmbH, 6100 Darmstadt Verfahren zur herstellung bi- oder polymodaler waessriger kunststoffdispersionen
DE3485826T2 (de) * 1983-11-25 1992-12-10 Allied Colloids Ltd Herstellung und verwendung polymerer kugeln.
AU557547B2 (en) * 1984-08-29 1986-12-24 National Starch & Chemical Corporation Aqueous coating for meatllised paper
EP0190495B1 (en) * 1984-12-06 1992-04-01 Japan Exlan Company, Ltd. Polymer gel and use thereof for separating components from liquid resulting from desulfurization and decyanization process
JPS61266420A (ja) * 1985-05-21 1986-11-26 Mitsui Petrochem Ind Ltd 水性分散組成物
JPH0615598B2 (ja) * 1985-09-17 1994-03-02 日本合成ゴム株式会社 共重合体の製造方法

Also Published As

Publication number Publication date
EP0080225A1 (en) 1983-06-01
CA1206657A (en) 1986-06-24
DE3265276D1 (en) 1985-09-12
US4861818A (en) 1989-08-29
US4614708A (en) 1986-09-30
EP0080225B1 (en) 1985-08-07
JPS5898319A (ja) 1983-06-11

Similar Documents

Publication Publication Date Title
JPH0559924B2 (en, 2012)
DE69323831T2 (de) Photographisches Hilfsmaterial mit einer antistatischen Schicht und einer hitzeverdickenden Sperrschicht
DE69026071T2 (de) Blatt- oder bahnförmiges Material mit antistatischen Eigenschaften
JPS6051693B2 (ja) 写真要素
DE69107072T2 (de) Vernetzte leitende polymere und diese enthaltende antistatische beschichtungen.
EP0114868B1 (en) Vinyl acetate copolymers, latex compositions containing same and their use
JPH10509255A (ja) 帯電防止層を含む写真要素および帯電防止性を有する要素の製造方法
US4609617A (en) Polyester film support having epoxy copolymer coating for photographic use
EP0477670B1 (en) Silver halide photographic light-sensitive material
DE69200658T2 (de) Fotografisches lichtempfindliches Silberhalogenidmaterial.
US5202223A (en) Silver halide light-sensitive film material subjected to antistatic treatment
JPH05506473A (ja) 架橋導電性ポリマー及びそれを使用する帯電防止被膜
US6048678A (en) Protective overcoat coating compositions
JPS63235314A (ja) 弗素を含む粒状重合体
DE69603344T2 (de) Photopgraphische Hochkontrastmaterialien geschützt gegen Aufhelleffekte
JP3508082B2 (ja) 複合高分子微粒子及びこれを用いた画像記録材料
US6407160B2 (en) Non-aqueous composite wax particle dispersion
EP0626615B1 (en) Method of preparing antistatic layers for photographic elements
US5698385A (en) Silver halide photosensitive material
JPH05297505A (ja) ハロゲン化銀写真感光材料
JPH10115900A (ja) イメージング要素のためのコーティング組成物
JP2003057783A (ja) 銀色調を改良した光熱写真画像形成材料
JP3240537B2 (ja) ハロゲン化銀写真感光材料
JPH0728194A (ja) ハロゲン化銀写真感光材料
JPH0118408B2 (en, 2012)