JPH052711B2 - - Google Patents
Info
- Publication number
- JPH052711B2 JPH052711B2 JP2527383A JP2527383A JPH052711B2 JP H052711 B2 JPH052711 B2 JP H052711B2 JP 2527383 A JP2527383 A JP 2527383A JP 2527383 A JP2527383 A JP 2527383A JP H052711 B2 JPH052711 B2 JP H052711B2
- Authority
- JP
- Japan
- Prior art keywords
- indium
- transparent conductive
- organic
- tin
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 14
- 229910052738 indium Inorganic materials 0.000 claims description 13
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 12
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 230000000737 periodic effect Effects 0.000 claims description 10
- 238000010304 firing Methods 0.000 claims description 9
- 150000002894 organic compounds Chemical class 0.000 claims description 9
- 239000004480 active ingredient Substances 0.000 claims description 6
- 239000012298 atmosphere Substances 0.000 claims description 5
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 2
- 239000010408 film Substances 0.000 description 30
- 239000000976 ink Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 19
- 239000011521 glass Substances 0.000 description 12
- -1 organic acid antimony salts Chemical class 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 10
- 150000003606 tin compounds Chemical class 0.000 description 7
- 150000002472 indium compounds Chemical class 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 150000001463 antimony compounds Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- ZREIPSZUJIFJNP-UHFFFAOYSA-K bismuth subsalicylate Chemical compound C1=CC=C2O[Bi](O)OC(=O)C2=C1 ZREIPSZUJIFJNP-UHFFFAOYSA-K 0.000 description 2
- 229960000782 bismuth subsalicylate Drugs 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000881 depressing effect Effects 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 150000007524 organic acids Chemical group 0.000 description 2
- 150000007519 polyprotic acids Polymers 0.000 description 2
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 2
- 229910000067 stibane Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- OAHAQNQHAKJAPK-UHFFFAOYSA-J C(C(=C)CC(=O)[O-])(=O)[O-].[Sn+4].C(C(=C)CC(=O)[O-])(=O)[O-] Chemical compound C(C(=C)CC(=O)[O-])(=O)[O-].[Sn+4].C(C(=C)CC(=O)[O-])(=O)[O-] OAHAQNQHAKJAPK-UHFFFAOYSA-J 0.000 description 1
- AJDTZVRPEPFODZ-UHFFFAOYSA-J C(C=CC(=O)[O-])(=O)[O-].[Sn+4].C(C=CC(=O)[O-])(=O)[O-] Chemical compound C(C=CC(=O)[O-])(=O)[O-].[Sn+4].C(C=CC(=O)[O-])(=O)[O-] AJDTZVRPEPFODZ-UHFFFAOYSA-J 0.000 description 1
- SFXCZIKWLKDENS-UHFFFAOYSA-H C(CCCCC(=O)[O-])(=O)[O-].[In+3].C(CCCCC(=O)[O-])(=O)[O-].C(CCCCC(=O)[O-])(=O)[O-].[In+3] Chemical compound C(CCCCC(=O)[O-])(=O)[O-].[In+3].C(CCCCC(=O)[O-])(=O)[O-].C(CCCCC(=O)[O-])(=O)[O-].[In+3] SFXCZIKWLKDENS-UHFFFAOYSA-H 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- AJDTZVRPEPFODZ-PAMPIZDHSA-J [Sn+4].[O-]C(=O)\C=C/C([O-])=O.[O-]C(=O)\C=C/C([O-])=O Chemical compound [Sn+4].[O-]C(=O)\C=C/C([O-])=O.[O-]C(=O)\C=C/C([O-])=O AJDTZVRPEPFODZ-PAMPIZDHSA-J 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 150000001462 antimony Chemical class 0.000 description 1
- 150000001495 arsenic compounds Chemical class 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ISIWESOCSUDPQO-UHFFFAOYSA-H bis(4,6-dioxo-1,3,2-dioxaindiginan-2-yl) propanedioate Chemical compound [In+3].C(CC(=O)[O-])(=O)[O-].C(CC(=O)[O-])(=O)[O-].C(CC(=O)[O-])(=O)[O-].[In+3] ISIWESOCSUDPQO-UHFFFAOYSA-H 0.000 description 1
- WXZVPVPFZSPZRV-UHFFFAOYSA-H bis(4,7-dioxo-1,3,2-dioxaindigepan-2-yl) butanedioate Chemical compound C(CCC(=O)[O-])(=O)[O-].[In+3].C(CCC(=O)[O-])(=O)[O-].C(CCC(=O)[O-])(=O)[O-].[In+3] WXZVPVPFZSPZRV-UHFFFAOYSA-H 0.000 description 1
- 150000001622 bismuth compounds Chemical class 0.000 description 1
- JAONZGLTYYUPCT-UHFFFAOYSA-K bismuth subgallate Chemical compound OC(=O)C1=CC(O)=C2O[Bi](O)OC2=C1 JAONZGLTYYUPCT-UHFFFAOYSA-K 0.000 description 1
- 229960000199 bismuth subgallate Drugs 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- VBXWCGWXDOBUQZ-UHFFFAOYSA-K diacetyloxyindiganyl acetate Chemical compound [In+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VBXWCGWXDOBUQZ-UHFFFAOYSA-K 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 229940093920 gynecological arsenic compound Drugs 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- SKWCWFYBFZIXHE-UHFFFAOYSA-K indium acetylacetonate Chemical compound CC(=O)C=C(C)O[In](OC(C)=CC(C)=O)OC(C)=CC(C)=O SKWCWFYBFZIXHE-UHFFFAOYSA-K 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000011833 salt mixture Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001880 stiboryl group Chemical group *[Sb](*)(*)=O 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- PIILXFBHQILWPS-UHFFFAOYSA-N tributyltin Chemical compound CCCC[Sn](CCCC)CCCC PIILXFBHQILWPS-UHFFFAOYSA-N 0.000 description 1
- CPRPKIMXLHBUGA-UHFFFAOYSA-N triethyltin Chemical compound CC[Sn](CC)CC CPRPKIMXLHBUGA-UHFFFAOYSA-N 0.000 description 1
- BPLUKJNHPBNVQL-UHFFFAOYSA-N triphenylarsine Chemical compound C1=CC=CC=C1[As](C=1C=CC=CC=1)C1=CC=CC=C1 BPLUKJNHPBNVQL-UHFFFAOYSA-N 0.000 description 1
- NSPWVJAKNXJHEP-UHFFFAOYSA-N tripropyltin Chemical compound CCC[Sn](CCC)CCC NSPWVJAKNXJHEP-UHFFFAOYSA-N 0.000 description 1
- LDXFCCZPPSEDCI-UHFFFAOYSA-N tris(2-methylphenyl)stibane Chemical compound CC1=CC=CC=C1[Sb](C=1C(=CC=CC=1)C)C1=CC=CC=C1C LDXFCCZPPSEDCI-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58025273A JPS59149963A (ja) | 1983-02-16 | 1983-02-16 | 透明導電膜の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58025273A JPS59149963A (ja) | 1983-02-16 | 1983-02-16 | 透明導電膜の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59149963A JPS59149963A (ja) | 1984-08-28 |
| JPH052711B2 true JPH052711B2 (ko) | 1993-01-13 |
Family
ID=12161419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58025273A Granted JPS59149963A (ja) | 1983-02-16 | 1983-02-16 | 透明導電膜の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59149963A (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101302314B1 (ko) * | 2013-03-08 | 2013-08-30 | 주식회사 엔이에이 | 와인딩 와이어 및 그 제조 방법 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS565354A (en) * | 1979-06-21 | 1981-01-20 | Alps Electric Co Ltd | Paste for forming transparent conductive film |
| JPS5767674A (en) * | 1980-10-13 | 1982-04-24 | Tokyo Denshi Kagaku Kabushiki | Solution forming transparent electro-conductive film |
-
1983
- 1983-02-16 JP JP58025273A patent/JPS59149963A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS565354A (en) * | 1979-06-21 | 1981-01-20 | Alps Electric Co Ltd | Paste for forming transparent conductive film |
| JPS5767674A (en) * | 1980-10-13 | 1982-04-24 | Tokyo Denshi Kagaku Kabushiki | Solution forming transparent electro-conductive film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101302314B1 (ko) * | 2013-03-08 | 2013-08-30 | 주식회사 엔이에이 | 와인딩 와이어 및 그 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59149963A (ja) | 1984-08-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5854089B2 (ja) | 透明導電膜の形成方法 | |
| JPS612202A (ja) | 鑞付容易な電気伝導性組成物、その製法、該組成物が適用される基材の処理法および該組成物が適用されたプリント回路板 | |
| JP3338966B2 (ja) | 透明導電膜形成用塗布液 | |
| JPH052711B2 (ko) | ||
| JPS5889666A (ja) | 透明導電性被膜形成用ペ−スト及びその製造方法 | |
| JP6737874B2 (ja) | はんだ付け可能なポリイミド系ポリマー厚膜導電体を形成するためのペースト及びプロセス | |
| JPH043042B2 (ko) | ||
| JP4470383B2 (ja) | 酸化マグネシウム薄膜形成用水系塗布液 | |
| JP5413708B2 (ja) | 透明導電膜、透明導電基板及びそれを用いたデバイス並びに透明導電膜の製造方法 | |
| JP3049890B2 (ja) | 透明導電膜の形成方法 | |
| TWI844075B (zh) | 透明軟板元件及其製造方法 | |
| US4929390A (en) | Conductive composition and method of use | |
| JP4365918B2 (ja) | 透明導電膜形成用塗布液およびこれを使用した透明導電膜形成方法 | |
| US4980225A (en) | Conductive composition and method of use | |
| JP2001270736A (ja) | 低融点ガラスペースト及びそれから得られるガラス被膜 | |
| JPS59101706A (ja) | 透明導電膜を有する耐熱性基板の製造方法 | |
| JPS6222312A (ja) | 透明導電性被膜の形成方法 | |
| JPH0676622A (ja) | 機能性薄膜形成用ペースト組成物および機能性薄膜の作製法 | |
| JP2702713B2 (ja) | 卑金属薄膜の製造方法 | |
| JPS59138009A (ja) | 透明導電膜を有する耐熱性基板の製造方法 | |
| JPS593047A (ja) | 透明な金属酸化物皮膜を有するガラス板の製造方法 | |
| JPH11228175A (ja) | ガラス着色剤組成物及びガラス着色膜の製造方法 | |
| JPS5927961A (ja) | 透明被膜形成用ペ−ストおよび透明被膜 | |
| JPH06115946A (ja) | マンガンニッケル系酸化物薄膜の形成方法 | |
| JPH043901A (ja) | 酸化ルテニウム系薄膜抵抗体及びその製造方法 |