JPH052227B2 - - Google Patents

Info

Publication number
JPH052227B2
JPH052227B2 JP60218561A JP21856185A JPH052227B2 JP H052227 B2 JPH052227 B2 JP H052227B2 JP 60218561 A JP60218561 A JP 60218561A JP 21856185 A JP21856185 A JP 21856185A JP H052227 B2 JPH052227 B2 JP H052227B2
Authority
JP
Japan
Prior art keywords
acid
diazo
photosensitive
polymer
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60218561A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6278544A (ja
Inventor
Nobuyuki Kita
Masanori Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP60218561A priority Critical patent/JPS6278544A/ja
Priority to US06/908,303 priority patent/US4845009A/en
Priority to DE3633456A priority patent/DE3633456C2/de
Publication of JPS6278544A publication Critical patent/JPS6278544A/ja
Publication of JPH052227B2 publication Critical patent/JPH052227B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP60218561A 1985-10-01 1985-10-01 感光性組成物 Granted JPS6278544A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP60218561A JPS6278544A (ja) 1985-10-01 1985-10-01 感光性組成物
US06/908,303 US4845009A (en) 1985-10-01 1986-09-17 Photosensitive composition comprising a polymer with maleimido group in side chain and a diazo resin
DE3633456A DE3633456C2 (de) 1985-10-01 1986-10-01 Lichtempfindliches Gemisch mit einem Diazoharz

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60218561A JPS6278544A (ja) 1985-10-01 1985-10-01 感光性組成物

Publications (2)

Publication Number Publication Date
JPS6278544A JPS6278544A (ja) 1987-04-10
JPH052227B2 true JPH052227B2 (enEXAMPLES) 1993-01-12

Family

ID=16721871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60218561A Granted JPS6278544A (ja) 1985-10-01 1985-10-01 感光性組成物

Country Status (3)

Country Link
US (1) US4845009A (enEXAMPLES)
JP (1) JPS6278544A (enEXAMPLES)
DE (1) DE3633456C2 (enEXAMPLES)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62294238A (ja) * 1986-06-13 1987-12-21 Fuji Photo Film Co Ltd 感光性組成物
US4931379A (en) * 1986-10-23 1990-06-05 International Business Machines Corporation High sensitivity resists having autodecomposition temperatures greater than about 160° C.
GB8720424D0 (en) * 1987-08-28 1987-10-07 Horsell Graphic Ind Ltd Pre-sensitized lithographic printing plate production
JP2613789B2 (ja) * 1988-05-12 1997-05-28 富士写真フイルム株式会社 感光性平版印刷版
DE3819457A1 (de) * 1988-06-08 1989-12-14 Basf Ag Lichtempfindliche, negativ arbeitende offset-druckplatten
JP2598994B2 (ja) * 1988-11-14 1997-04-09 富士写真フイルム株式会社 感光性組性物
EP0368327B1 (en) * 1988-11-11 1995-02-15 Fuji Photo Film Co., Ltd. Light-sensitive composition
GB8827812D0 (en) * 1988-11-29 1988-12-29 Vickers Plc Improvements in/relating to polymeric compounds
JP2522694B2 (ja) * 1988-12-09 1996-08-07 富士写真フイルム株式会社 感光性組成物
JP2639722B2 (ja) * 1989-01-18 1997-08-13 富士写真フイルム株式会社 感光性組成物
JP2652804B2 (ja) * 1989-04-27 1997-09-10 富士写真フイルム株式会社 感光性平版印刷版
US5112743A (en) * 1989-05-24 1992-05-12 Fuji Photo Film Co., Ltd. Light-sensitive composition and presensitized plate for use in making lithographic printing plates
JP2639734B2 (ja) * 1989-08-03 1997-08-13 富士写真フイルム株式会社 感光性組成物
JP2599003B2 (ja) * 1989-10-16 1997-04-09 富士写真フイルム株式会社 感光性組成物
JPH03240060A (ja) * 1990-02-19 1991-10-25 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2627565B2 (ja) * 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版
JP2736933B2 (ja) * 1990-04-05 1998-04-08 富士写真フイルム株式会社 感光性平版印刷版
JPH0425845A (ja) * 1990-05-21 1992-01-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2709532B2 (ja) * 1991-03-01 1998-02-04 富士写真フイルム株式会社 感光性平版印刷版
JPH05165206A (ja) * 1991-12-17 1993-07-02 Fuji Photo Film Co Ltd 感光性組成物
JPH0659453A (ja) * 1992-08-07 1994-03-04 Nippon Oil Co Ltd ポジ型感光性樹脂組成物
JP3278286B2 (ja) * 1994-04-25 2002-04-30 富士写真フイルム株式会社 感光性平版印刷版
JPH0962005A (ja) * 1995-06-14 1997-03-07 Fuji Photo Film Co Ltd ネガ型感光性組成物
JPH1060214A (ja) * 1996-08-22 1998-03-03 Nippon Oil Co Ltd カラーフィルター用アクリル樹脂組成物
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
DE19936333A1 (de) * 1999-08-02 2001-03-15 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen für Druckplatten zur Steigerung der Chemikalien- und Entwicklerresistenz
DE19936332A1 (de) * 1999-08-02 2001-03-15 Kodak Polychrome Graphics Gmbh Druckplatten mit hoher Chemikalien-Entwicklerresistenz
DE60014536T2 (de) 1999-08-02 2005-03-24 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen für Druckplatten mit verbesserter chemischer Beständigkeit und Entwickler-Beständigkeit und mit diesen Zusammensetzungen hergestellte Druckplatten
JP4152559B2 (ja) 2000-03-06 2008-09-17 富士フイルム株式会社 ネガ型感光性平版印刷版
JP4054161B2 (ja) * 2000-04-05 2008-02-27 富士フイルム株式会社 感光性平版印刷版
US6270938B1 (en) 2000-06-09 2001-08-07 Kodak Polychrome Graphics Llc Acetal copolymers and use thereof in photosensitive compositions
US6458503B1 (en) 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
US7399574B2 (en) * 2001-09-28 2008-07-15 Dai Nippon Printing Co., Ltd. Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
US20040198859A1 (en) * 2003-04-03 2004-10-07 Nguyen Chau K. Photopolymerization systems and their use
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US9360759B2 (en) * 2014-09-12 2016-06-07 Eastman Kodak Company Forming conductive metal patterns using water-soluble polymers

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3988157A (en) * 1972-07-17 1976-10-26 Agfa-Gevaert N.V. Process for adhering hydrophilic layers to dimensionally stable polyester films
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
US4079041A (en) * 1975-06-18 1978-03-14 Ciba-Geigy Corporation Crosslinkable polymeric compounds
US4220700A (en) * 1978-02-03 1980-09-02 Eastman Kodak Company Continuous-tone dyed diazo imaging elements
NL8001085A (nl) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg Fotogevoelige materialen en voorwerpen.
DE3069448D1 (en) * 1979-05-18 1984-11-22 Ciba Geigy Ag Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures
SU974326A1 (ru) * 1980-09-17 1982-11-15 Предприятие П/Я В-2913 Светочувствительна композици дл изготовлени печатных форм
US4416975A (en) * 1981-02-04 1983-11-22 Ciba-Geigy Corporation Photopolymerization process employing compounds containing acryloyl groups and maleimide groups
DE3130987A1 (de) * 1981-08-05 1983-02-24 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
US4614701A (en) * 1984-09-28 1986-09-30 Sekisui Fine Chemical Co., Ltd. Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist

Also Published As

Publication number Publication date
US4845009A (en) 1989-07-04
DE3633456C2 (de) 1995-06-01
JPS6278544A (ja) 1987-04-10
DE3633456A1 (de) 1987-04-02

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Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term