JPH0481858B2 - - Google Patents

Info

Publication number
JPH0481858B2
JPH0481858B2 JP59255947A JP25594784A JPH0481858B2 JP H0481858 B2 JPH0481858 B2 JP H0481858B2 JP 59255947 A JP59255947 A JP 59255947A JP 25594784 A JP25594784 A JP 25594784A JP H0481858 B2 JPH0481858 B2 JP H0481858B2
Authority
JP
Japan
Prior art keywords
chemical
chemical liquid
tank
cleaning
chemical solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59255947A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61133633A (ja
Inventor
Akihiro Sasahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP25594784A priority Critical patent/JPS61133633A/ja
Publication of JPS61133633A publication Critical patent/JPS61133633A/ja
Publication of JPH0481858B2 publication Critical patent/JPH0481858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP25594784A 1984-12-03 1984-12-03 半導体ウエ−ハの洗浄装置 Granted JPS61133633A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25594784A JPS61133633A (ja) 1984-12-03 1984-12-03 半導体ウエ−ハの洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25594784A JPS61133633A (ja) 1984-12-03 1984-12-03 半導体ウエ−ハの洗浄装置

Publications (2)

Publication Number Publication Date
JPS61133633A JPS61133633A (ja) 1986-06-20
JPH0481858B2 true JPH0481858B2 (zh) 1992-12-25

Family

ID=17285786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25594784A Granted JPS61133633A (ja) 1984-12-03 1984-12-03 半導体ウエ−ハの洗浄装置

Country Status (1)

Country Link
JP (1) JPS61133633A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2522805B2 (ja) * 1987-11-20 1996-08-07 三井石油化学工業株式会社 洗浄方法
DE19926462C1 (de) * 1999-02-18 2000-11-30 Steag Micro Tech Gmbh Verfahren und Vorrichtung zum Behandeln von Substraten
KR100891067B1 (ko) 2007-12-03 2009-03-31 주식회사 동부하이텍 웨트 스테이션 장치
KR101099737B1 (ko) 2010-01-05 2011-12-28 세메스 주식회사 고온의 약액을 공급하는 장치
JP2018018990A (ja) * 2016-07-28 2018-02-01 株式会社カネカ エッチング処理装置、およびエッチング処理方法
CN111370294B (zh) * 2020-03-17 2023-04-07 长江存储科技有限责任公司 采用化学试剂对晶圆处理的方法、装置和存储介质

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57148480U (zh) * 1981-03-12 1982-09-17
JPS587830A (ja) * 1981-07-08 1983-01-17 Hitachi Ltd 薄片状物品の洗浄方法及び装置
JPS5981030U (ja) * 1982-11-24 1984-05-31 日本電気ホームエレクトロニクス株式会社 半導体製造装置
JPS59123581A (ja) * 1982-12-28 1984-07-17 株式会社東芝 洗浄装置

Also Published As

Publication number Publication date
JPS61133633A (ja) 1986-06-20

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