JPH0419697B2 - - Google Patents
Info
- Publication number
- JPH0419697B2 JPH0419697B2 JP57054285A JP5428582A JPH0419697B2 JP H0419697 B2 JPH0419697 B2 JP H0419697B2 JP 57054285 A JP57054285 A JP 57054285A JP 5428582 A JP5428582 A JP 5428582A JP H0419697 B2 JPH0419697 B2 JP H0419697B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photosensitive resin
- resin film
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920005989 resin Polymers 0.000 claims description 59
- 239000011347 resin Substances 0.000 claims description 59
- 239000000758 substrate Substances 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 19
- 239000004065 semiconductor Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000010408 film Substances 0.000 description 78
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 230000018109 developmental process Effects 0.000 description 19
- 235000012239 silicon dioxide Nutrition 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5428582A JPS58171818A (ja) | 1982-03-31 | 1982-03-31 | 半導体装置の製造方法および半導体装置の製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5428582A JPS58171818A (ja) | 1982-03-31 | 1982-03-31 | 半導体装置の製造方法および半導体装置の製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58171818A JPS58171818A (ja) | 1983-10-08 |
JPH0419697B2 true JPH0419697B2 (es) | 1992-03-31 |
Family
ID=12966286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5428582A Granted JPS58171818A (ja) | 1982-03-31 | 1982-03-31 | 半導体装置の製造方法および半導体装置の製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58171818A (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6236823A (ja) * | 1985-08-10 | 1987-02-17 | Fujitsu Ltd | レジストパタ−ン形成方法 |
JPH0263056A (ja) * | 1988-04-05 | 1990-03-02 | Mitsubishi Kasei Corp | レジストパターン形成方法 |
US4904564A (en) * | 1988-06-16 | 1990-02-27 | International Business Machines Corporation | Process for imaging multi-layer resist structure |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51129190A (en) * | 1975-05-02 | 1976-11-10 | Fujitsu Ltd | Manufacturing method of semiconductor |
JPS5580323A (en) * | 1978-12-12 | 1980-06-17 | Nec Corp | Pattern forming method for photoresist-film |
JPS57100428A (en) * | 1980-12-16 | 1982-06-22 | Matsushita Electronics Corp | Method for photomechanical process |
JPS58132926A (ja) * | 1982-02-03 | 1983-08-08 | Matsushita Electric Ind Co Ltd | パタ−ン形成方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5411701U (es) * | 1977-06-23 | 1979-01-25 |
-
1982
- 1982-03-31 JP JP5428582A patent/JPS58171818A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51129190A (en) * | 1975-05-02 | 1976-11-10 | Fujitsu Ltd | Manufacturing method of semiconductor |
JPS5580323A (en) * | 1978-12-12 | 1980-06-17 | Nec Corp | Pattern forming method for photoresist-film |
JPS57100428A (en) * | 1980-12-16 | 1982-06-22 | Matsushita Electronics Corp | Method for photomechanical process |
JPS58132926A (ja) * | 1982-02-03 | 1983-08-08 | Matsushita Electric Ind Co Ltd | パタ−ン形成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS58171818A (ja) | 1983-10-08 |
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