JPH0416937B2 - - Google Patents

Info

Publication number
JPH0416937B2
JPH0416937B2 JP57181179A JP18117982A JPH0416937B2 JP H0416937 B2 JPH0416937 B2 JP H0416937B2 JP 57181179 A JP57181179 A JP 57181179A JP 18117982 A JP18117982 A JP 18117982A JP H0416937 B2 JPH0416937 B2 JP H0416937B2
Authority
JP
Japan
Prior art keywords
substrate
plasma
back surface
processed
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57181179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5976427A (ja
Inventor
Shuzo Fujimura
Hiroshi Yano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18117982A priority Critical patent/JPS5976427A/ja
Publication of JPS5976427A publication Critical patent/JPS5976427A/ja
Publication of JPH0416937B2 publication Critical patent/JPH0416937B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP18117982A 1982-10-14 1982-10-14 プラズマ処理装置 Granted JPS5976427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18117982A JPS5976427A (ja) 1982-10-14 1982-10-14 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18117982A JPS5976427A (ja) 1982-10-14 1982-10-14 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS5976427A JPS5976427A (ja) 1984-05-01
JPH0416937B2 true JPH0416937B2 (enExample) 1992-03-25

Family

ID=16096252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18117982A Granted JPS5976427A (ja) 1982-10-14 1982-10-14 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS5976427A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2705117B2 (ja) * 1988-06-21 1998-01-26 松下電器産業株式会社 焦電材料のドライエッチング装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135934A (en) * 1980-03-27 1981-10-23 Chiyou Lsi Gijutsu Kenkyu Kumiai Dry etching device
JPS5770278A (en) * 1980-10-22 1982-04-30 Nec Kyushu Ltd Plasma etching apparatus
JPS57143827A (en) * 1981-03-02 1982-09-06 Tokyo Ohka Kogyo Co Ltd Parallel, flat electrode

Also Published As

Publication number Publication date
JPS5976427A (ja) 1984-05-01

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