JPH0376586B2 - - Google Patents

Info

Publication number
JPH0376586B2
JPH0376586B2 JP59181916A JP18191684A JPH0376586B2 JP H0376586 B2 JPH0376586 B2 JP H0376586B2 JP 59181916 A JP59181916 A JP 59181916A JP 18191684 A JP18191684 A JP 18191684A JP H0376586 B2 JPH0376586 B2 JP H0376586B2
Authority
JP
Japan
Prior art keywords
resist
film
electrode
forming
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59181916A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6159824A (ja
Inventor
Masahiko Shimazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59181916A priority Critical patent/JPS6159824A/ja
Publication of JPS6159824A publication Critical patent/JPS6159824A/ja
Publication of JPH0376586B2 publication Critical patent/JPH0376586B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/00
    • H10W10/01

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
JP59181916A 1984-08-31 1984-08-31 半導体素子の製造方法 Granted JPS6159824A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59181916A JPS6159824A (ja) 1984-08-31 1984-08-31 半導体素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59181916A JPS6159824A (ja) 1984-08-31 1984-08-31 半導体素子の製造方法

Publications (2)

Publication Number Publication Date
JPS6159824A JPS6159824A (ja) 1986-03-27
JPH0376586B2 true JPH0376586B2 (cg-RX-API-DMAC10.html) 1991-12-05

Family

ID=16109144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59181916A Granted JPS6159824A (ja) 1984-08-31 1984-08-31 半導体素子の製造方法

Country Status (1)

Country Link
JP (1) JPS6159824A (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4892842A (en) * 1987-10-29 1990-01-09 Tektronix, Inc. Method of treating an integrated circuit
US4923825A (en) * 1989-05-01 1990-05-08 Tektronix, Inc. Method of treating a semiconductor body
JP3374880B2 (ja) * 1994-10-26 2003-02-10 三菱電機株式会社 半導体装置の製造方法、及び半導体装置

Also Published As

Publication number Publication date
JPS6159824A (ja) 1986-03-27

Similar Documents

Publication Publication Date Title
US4104672A (en) High power gallium arsenide schottky barrier field effect transistor
JPS54154289A (en) Manufacture of thin-film transistor array
JPS6250987B2 (cg-RX-API-DMAC10.html)
US4004341A (en) Method of manufacturing field-effect transistors designed for operation at very high frequencies, using integrated techniques
JPH0376586B2 (cg-RX-API-DMAC10.html)
JPH0732257B2 (ja) モノリシック半導体構造
US4023258A (en) Method of manufacturing semiconductor diodes for use in millimeter-wave circuits
JPH03198342A (ja) 半導体装置の製造方法
JPS5627972A (en) Manufacture of compound semiconductor device
US3856591A (en) Method for making beam lead device
JP3028799B2 (ja) 半導体装置の製造方法
JPS5627973A (en) Manufacture of compound semiconductor device
GB2064868A (en) Schottky barrier gate field-effect transistor
JPS5852351B2 (ja) 半導体装置の製造方法
KR100304869B1 (ko) 전계효과트랜지스터의제조방법
JPS59130479A (ja) シヨツトキ障壁ゲ−ト型電界効果トランジスタの製造方法
JPH07107906B2 (ja) 半導体装置の製造方法
JPS5627974A (en) Manufacture of compound semiconductor device
JP2867169B2 (ja) 半導体装置の製造方法
JPS6169176A (ja) 半導体装置の製造方法
JPS61216375A (ja) 半導体発光装置の製造方法
JP2863216B2 (ja) 半導体装置の製造方法
JPS63181477A (ja) 半導体装置の製造方法
JPS616870A (ja) 電界効果トランジスタの製造方法
JPS6051263B2 (ja) 半導体装置の製造方法