JPS6159824A - 半導体素子の製造方法 - Google Patents

半導体素子の製造方法

Info

Publication number
JPS6159824A
JPS6159824A JP59181916A JP18191684A JPS6159824A JP S6159824 A JPS6159824 A JP S6159824A JP 59181916 A JP59181916 A JP 59181916A JP 18191684 A JP18191684 A JP 18191684A JP S6159824 A JPS6159824 A JP S6159824A
Authority
JP
Japan
Prior art keywords
substrate
resist
resist film
film
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59181916A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0376586B2 (cg-RX-API-DMAC10.html
Inventor
Masahiko Shimazaki
島崎　政彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59181916A priority Critical patent/JPS6159824A/ja
Publication of JPS6159824A publication Critical patent/JPS6159824A/ja
Publication of JPH0376586B2 publication Critical patent/JPH0376586B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/00—
    • H10W10/01—

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
JP59181916A 1984-08-31 1984-08-31 半導体素子の製造方法 Granted JPS6159824A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59181916A JPS6159824A (ja) 1984-08-31 1984-08-31 半導体素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59181916A JPS6159824A (ja) 1984-08-31 1984-08-31 半導体素子の製造方法

Publications (2)

Publication Number Publication Date
JPS6159824A true JPS6159824A (ja) 1986-03-27
JPH0376586B2 JPH0376586B2 (cg-RX-API-DMAC10.html) 1991-12-05

Family

ID=16109144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59181916A Granted JPS6159824A (ja) 1984-08-31 1984-08-31 半導体素子の製造方法

Country Status (1)

Country Link
JP (1) JPS6159824A (cg-RX-API-DMAC10.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4892842A (en) * 1987-10-29 1990-01-09 Tektronix, Inc. Method of treating an integrated circuit
US4923825A (en) * 1989-05-01 1990-05-08 Tektronix, Inc. Method of treating a semiconductor body
US5872396A (en) * 1994-10-26 1999-02-16 Mitsubishi Denki Kabushiki Kaisha Semiconductor device with plated heat sink

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4892842A (en) * 1987-10-29 1990-01-09 Tektronix, Inc. Method of treating an integrated circuit
US4923825A (en) * 1989-05-01 1990-05-08 Tektronix, Inc. Method of treating a semiconductor body
US5872396A (en) * 1994-10-26 1999-02-16 Mitsubishi Denki Kabushiki Kaisha Semiconductor device with plated heat sink
US5998238A (en) * 1994-10-26 1999-12-07 Mitsubishi Denki Kabushiki Kaisha Method of fabricating semiconductor device

Also Published As

Publication number Publication date
JPH0376586B2 (cg-RX-API-DMAC10.html) 1991-12-05

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