JPH0348854U - - Google Patents
Info
- Publication number
- JPH0348854U JPH0348854U JP10879989U JP10879989U JPH0348854U JP H0348854 U JPH0348854 U JP H0348854U JP 10879989 U JP10879989 U JP 10879989U JP 10879989 U JP10879989 U JP 10879989U JP H0348854 U JPH0348854 U JP H0348854U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- irradiating
- utility
- registration request
- ground potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005468 ion implantation Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000012212 insulator Substances 0.000 description 1
Description
第１図は、この考案の一実施例に係るイオン注
入装置を示す断面図である。第２図ないし第４図
は、それぞれ、試料台周りの他の例を示す断面図
である。 ２……イオン源、１４……イオンビーム、１６
……真空容器、１８……試料、２０……試料台、
２２，２４……絶縁物。
入装置を示す断面図である。第２図ないし第４図
は、それぞれ、試料台周りの他の例を示す断面図
である。 ２……イオン源、１４……イオンビーム、１６
……真空容器、１８……試料、２０……試料台、
２２，２４……絶縁物。
Claims (1)
- 加速されたイオンビームを試料に照射してイオ
ン注入を行う装置において、前記試料を、その周
辺の大地電位にある金属部から電気的に浮遊させ
たことを特徴とするイオン注入装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989108799U JPH0737231Y2 (ja) | 1989-09-18 | 1989-09-18 | イオン注入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989108799U JPH0737231Y2 (ja) | 1989-09-18 | 1989-09-18 | イオン注入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0348854U true JPH0348854U (ja) | 1991-05-10 |
| JPH0737231Y2 JPH0737231Y2 (ja) | 1995-08-23 |
Family
ID=31657418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989108799U Expired - Fee Related JPH0737231Y2 (ja) | 1989-09-18 | 1989-09-18 | イオン注入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0737231Y2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1040856A (ja) * | 1996-07-25 | 1998-02-13 | Nissin Electric Co Ltd | イオン注入装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52119177A (en) * | 1976-03-31 | 1977-10-06 | Nec Corp | Target for charged particle |
| JPS5652860A (en) * | 1979-10-01 | 1981-05-12 | Mitsubishi Electric Corp | Ion injection device |
-
1989
- 1989-09-18 JP JP1989108799U patent/JPH0737231Y2/ja not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52119177A (en) * | 1976-03-31 | 1977-10-06 | Nec Corp | Target for charged particle |
| JPS5652860A (en) * | 1979-10-01 | 1981-05-12 | Mitsubishi Electric Corp | Ion injection device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1040856A (ja) * | 1996-07-25 | 1998-02-13 | Nissin Electric Co Ltd | イオン注入装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0737231Y2 (ja) | 1995-08-23 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |