JPH0329474B2 - - Google Patents
Info
- Publication number
- JPH0329474B2 JPH0329474B2 JP60090998A JP9099885A JPH0329474B2 JP H0329474 B2 JPH0329474 B2 JP H0329474B2 JP 60090998 A JP60090998 A JP 60090998A JP 9099885 A JP9099885 A JP 9099885A JP H0329474 B2 JPH0329474 B2 JP H0329474B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- cleaned
- cleaning
- main surface
- cleaning machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60090998A JPS61249582A (ja) | 1985-04-30 | 1985-04-30 | 洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60090998A JPS61249582A (ja) | 1985-04-30 | 1985-04-30 | 洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61249582A JPS61249582A (ja) | 1986-11-06 |
| JPH0329474B2 true JPH0329474B2 (en, 2012) | 1991-04-24 |
Family
ID=14014164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60090998A Granted JPS61249582A (ja) | 1985-04-30 | 1985-04-30 | 洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61249582A (en, 2012) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6428990U (en, 2012) * | 1987-08-10 | 1989-02-21 | ||
| US5345639A (en) * | 1992-05-28 | 1994-09-13 | Tokyo Electron Limited | Device and method for scrubbing and cleaning substrate |
| JPH08188249A (ja) * | 1995-01-05 | 1996-07-23 | Murata Mach Ltd | パレットへの物品の段積装置 |
| JP2564661Y2 (ja) * | 1995-01-11 | 1998-03-09 | 株式会社エンヤシステム | 貼付板洗浄装置 |
| JP5950759B2 (ja) * | 2012-08-27 | 2016-07-13 | Hoya株式会社 | 基板の製造方法及び基板洗浄装置 |
| JP6492473B2 (ja) * | 2014-09-12 | 2019-04-03 | 大日本印刷株式会社 | カード洗浄装置およびカード作成システム |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS583683A (ja) * | 1981-06-30 | 1983-01-10 | 富士通株式会社 | デイスク連続洗浄装置 |
| JPS59153923U (ja) * | 1983-03-30 | 1984-10-16 | コニカ株式会社 | 板状体の搬送装置 |
-
1985
- 1985-04-30 JP JP60090998A patent/JPS61249582A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61249582A (ja) | 1986-11-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0699348A (ja) | ウェーハ研磨装置 | |
| JP2001096245A (ja) | 洗浄方法および洗浄装置 | |
| JPH0329474B2 (en, 2012) | ||
| JP2003112951A (ja) | ガラス板洗浄装置 | |
| US20120111360A1 (en) | Method and Apparatus for Cleaning a Substrate | |
| WO1999036196A1 (en) | A cleaning/buffing apparatus for use in a wafer processing device | |
| JPH07161670A (ja) | ウェーハハンドリング装置 | |
| KR102320081B1 (ko) | 처리 장치, 이것을 구비한 도금 장치, 반송 장치, 및 처리 방법 | |
| KR101610003B1 (ko) | 화학 기계적 연마 공정이 행해진 웨이퍼의 다단계 세정 장치 | |
| KR100470230B1 (ko) | 화학기계적 연마장치 | |
| JPH0446195B2 (en, 2012) | ||
| JPS5947457B2 (ja) | 半導体ウェファ−の洗浄方法 | |
| JPS6143430A (ja) | カセツト洗浄装置 | |
| JP2512015B2 (ja) | 基板の洗浄装置 | |
| JPH07241534A (ja) | 基板洗浄装置 | |
| JPS6180156A (ja) | 洗浄装置 | |
| JPH11216430A (ja) | 洗浄装置 | |
| JP2001150336A (ja) | 平板状基板の製造方法および研磨方法 | |
| JPS6176262A (ja) | 研磨装置 | |
| JP3537875B2 (ja) | 基板洗浄装置 | |
| JP3818333B2 (ja) | 基板洗浄装置 | |
| JP2020136488A (ja) | 洗浄部材用洗浄装置及び基板処理装置 | |
| JPH10309656A (ja) | 磁気ディスク基板の研磨装置 | |
| JP3682121B2 (ja) | 洗浄装置 | |
| JPS63224332A (ja) | 半導体ウエハの両面洗浄装置 |