JPH0324066B2 - - Google Patents
Info
- Publication number
- JPH0324066B2 JPH0324066B2 JP56156664A JP15666481A JPH0324066B2 JP H0324066 B2 JPH0324066 B2 JP H0324066B2 JP 56156664 A JP56156664 A JP 56156664A JP 15666481 A JP15666481 A JP 15666481A JP H0324066 B2 JPH0324066 B2 JP H0324066B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- concentration
- film
- phosphorus
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15666481A JPS5857738A (ja) | 1981-10-01 | 1981-10-01 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15666481A JPS5857738A (ja) | 1981-10-01 | 1981-10-01 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5857738A JPS5857738A (ja) | 1983-04-06 |
JPH0324066B2 true JPH0324066B2 (enrdf_load_stackoverflow) | 1991-04-02 |
Family
ID=15632598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15666481A Granted JPS5857738A (ja) | 1981-10-01 | 1981-10-01 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5857738A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2606315B2 (ja) * | 1988-09-08 | 1997-04-30 | 日本電気株式会社 | 半導体装置の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5157296A (en) * | 1974-11-15 | 1976-05-19 | Tokyo Shibaura Electric Co | Handotaisoshino seizohoho |
JPS5658247A (en) * | 1979-10-17 | 1981-05-21 | Fujitsu Ltd | Production of semiconductor device |
-
1981
- 1981-10-01 JP JP15666481A patent/JPS5857738A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5857738A (ja) | 1983-04-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3128811B2 (ja) | 半導体装置の製造方法 | |
JP3626773B2 (ja) | 半導体デバイスの導電層、mosfet及びそれらの製造方法 | |
JPH01255264A (ja) | 半導体装置の製造方法 | |
JPH0638496B2 (ja) | 半導体装置 | |
JP3450262B2 (ja) | 回路製造方法、回路装置 | |
JPS6364057B2 (enrdf_load_stackoverflow) | ||
JPH0324066B2 (enrdf_load_stackoverflow) | ||
JPS6228591B2 (enrdf_load_stackoverflow) | ||
JPS58106847A (ja) | 半導体装置の製造方法 | |
JPS6240746A (ja) | 半導体装置 | |
JP3158486B2 (ja) | 半導体装置の製造方法 | |
JPH0586653B2 (enrdf_load_stackoverflow) | ||
JPS6160580B2 (enrdf_load_stackoverflow) | ||
JPS6068656A (ja) | 半導体装置の製造方法 | |
JPS61247073A (ja) | 半導体装置の製造方法 | |
JPS6218719A (ja) | 半導体装置の製造方法 | |
JPS5889869A (ja) | 半導体装置の製造方法 | |
JPS61135156A (ja) | 半導体装置およびその製造方法 | |
JPH0574735A (ja) | 半導体装置 | |
JPH05183156A (ja) | 半導体装置及びその製造方法 | |
JPH03214735A (ja) | 半導体装置の製造方法 | |
JP2707538B2 (ja) | 半導体装置の製造方法 | |
JPS6150385B2 (enrdf_load_stackoverflow) | ||
JPS6244854B2 (enrdf_load_stackoverflow) | ||
JPS6148778B2 (enrdf_load_stackoverflow) |