JPH0324060B2 - - Google Patents
Info
- Publication number
- JPH0324060B2 JPH0324060B2 JP56158123A JP15812381A JPH0324060B2 JP H0324060 B2 JPH0324060 B2 JP H0324060B2 JP 56158123 A JP56158123 A JP 56158123A JP 15812381 A JP15812381 A JP 15812381A JP H0324060 B2 JPH0324060 B2 JP H0324060B2
- Authority
- JP
- Japan
- Prior art keywords
- forming
- insulating film
- photoresist film
- film
- resist mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Local Oxidation Of Silicon (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56158123A JPS5860574A (ja) | 1981-10-06 | 1981-10-06 | 電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56158123A JPS5860574A (ja) | 1981-10-06 | 1981-10-06 | 電界効果トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5860574A JPS5860574A (ja) | 1983-04-11 |
JPH0324060B2 true JPH0324060B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-04-02 |
Family
ID=15664794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56158123A Granted JPS5860574A (ja) | 1981-10-06 | 1981-10-06 | 電界効果トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5860574A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5873164A (ja) * | 1981-10-27 | 1983-05-02 | Sumitomo Electric Ind Ltd | シヨツトキゲ−ト電界効果トランジスタとその製造方法 |
JPS5892265A (ja) * | 1981-11-27 | 1983-06-01 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS5935479A (ja) * | 1982-08-24 | 1984-02-27 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS60194577A (ja) * | 1984-03-16 | 1985-10-03 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタの製造方法 |
JPS60194578A (ja) * | 1984-03-16 | 1985-10-03 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタの製造方法 |
JPS61105874A (ja) * | 1984-10-29 | 1986-05-23 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタの製法 |
JPS61188972A (ja) * | 1985-02-15 | 1986-08-22 | Sumitomo Electric Ind Ltd | シヨツトキゲ−ト電界効果トランジスタ、およびその製造方法 |
JPS61188971A (ja) * | 1985-02-15 | 1986-08-22 | Sumitomo Electric Ind Ltd | シヨツトキゲ−ト電界効果トランジスタ、およびその製造方法 |
JPS61219177A (ja) * | 1985-03-25 | 1986-09-29 | Sumitomo Electric Ind Ltd | シヨツトキ−ゲ−ト電界効果トランジスタ及びその製造方法 |
US4642259A (en) * | 1985-04-26 | 1987-02-10 | Triquint Semiconductors, Inc. | Source-side self-aligned gate process |
JPS62254470A (ja) * | 1986-04-28 | 1987-11-06 | Seiko Instr & Electronics Ltd | 接合型薄膜トランジスタの製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5646562A (en) * | 1979-09-25 | 1981-04-27 | Sony Corp | Semiconductor device |
-
1981
- 1981-10-06 JP JP56158123A patent/JPS5860574A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5860574A (ja) | 1983-04-11 |