JPH0313304B2 - - Google Patents
Info
- Publication number
- JPH0313304B2 JPH0313304B2 JP55099956A JP9995680A JPH0313304B2 JP H0313304 B2 JPH0313304 B2 JP H0313304B2 JP 55099956 A JP55099956 A JP 55099956A JP 9995680 A JP9995680 A JP 9995680A JP H0313304 B2 JPH0313304 B2 JP H0313304B2
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- pattern
- mask
- thin
- reinforcing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9995680A JPS5726163A (en) | 1980-07-23 | 1980-07-23 | Mask for forming thin film and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9995680A JPS5726163A (en) | 1980-07-23 | 1980-07-23 | Mask for forming thin film and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5726163A JPS5726163A (en) | 1982-02-12 |
JPH0313304B2 true JPH0313304B2 (enrdf_load_stackoverflow) | 1991-02-22 |
Family
ID=14261136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9995680A Granted JPS5726163A (en) | 1980-07-23 | 1980-07-23 | Mask for forming thin film and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5726163A (enrdf_load_stackoverflow) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58170074A (ja) * | 1982-03-31 | 1983-10-06 | Hoxan Corp | 太陽電池のダイレクトマスキング方式による表面電極蒸着形成方法とその蒸着形成用具 |
JP4364957B2 (ja) * | 1998-10-22 | 2009-11-18 | 北陸電気工業株式会社 | 蒸着マスク |
KR100469252B1 (ko) * | 2002-04-12 | 2005-02-02 | 엘지전자 주식회사 | 쉐도우 마스크 및 그를 이용한 풀칼라 유기 el 표시소자 |
KR100813832B1 (ko) * | 2002-05-31 | 2008-03-17 | 삼성에스디아이 주식회사 | 증착용 마스크 프레임 조립체와 이의 제조방법 |
JP4126648B2 (ja) * | 2002-07-01 | 2008-07-30 | 日立金属株式会社 | メタルマスク用部材の製造方法 |
JP4170179B2 (ja) * | 2003-01-09 | 2008-10-22 | 株式会社 日立ディスプレイズ | 有機elパネルの製造方法および有機elパネル |
JP4547130B2 (ja) * | 2003-01-30 | 2010-09-22 | 株式会社アルバック | 蒸着マスクの製造方法 |
JP2008041327A (ja) * | 2006-08-02 | 2008-02-21 | Showa Denko Kk | マスクおよびマスクを使用した表示素子ならびにマスクを使用した表示素子の製造方法 |
JP5379717B2 (ja) * | 2010-02-24 | 2013-12-25 | 株式会社アルバック | 蒸着用マスク |
US9246101B2 (en) | 2010-03-09 | 2016-01-26 | Sharp Kabushiki Kaisha | Deposition mask, deposition apparatus, and deposition method |
JP6051876B2 (ja) * | 2013-01-11 | 2016-12-27 | 大日本印刷株式会社 | メタルマスクおよびメタルマスクの製造方法 |
JP6468480B2 (ja) * | 2014-01-31 | 2019-02-13 | 大日本印刷株式会社 | 蒸着マスクの製造方法および蒸着マスク |
JP6515520B2 (ja) * | 2014-12-15 | 2019-05-22 | 大日本印刷株式会社 | 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク |
KR101674506B1 (ko) * | 2015-08-10 | 2016-11-10 | 에이피시스템 주식회사 | 복합 가공 방법을 이용한 섀도우 마스크의 제조방법 및 이에 의해 제조된 섀도우 마스크 |
CN109844974B (zh) * | 2016-09-13 | 2024-03-15 | Lg伊诺特有限公司 | 沉积掩模用金属板以及沉积掩模及其制造方法 |
US11773477B2 (en) | 2018-12-25 | 2023-10-03 | Dai Nippon Printing Co., Ltd. | Deposition mask |
TWI809235B (zh) * | 2018-12-25 | 2023-07-21 | 日商大日本印刷股份有限公司 | 蒸鍍罩 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4313689Y1 (enrdf_load_stackoverflow) * | 1965-10-28 | 1968-06-11 | ||
JPS4727897U (enrdf_load_stackoverflow) * | 1971-04-15 | 1972-11-29 |
-
1980
- 1980-07-23 JP JP9995680A patent/JPS5726163A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5726163A (en) | 1982-02-12 |
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